HK1221235A1 - 光固化性樹脂組合物和圖像顯示裝置的製造方法 - Google Patents

光固化性樹脂組合物和圖像顯示裝置的製造方法

Info

Publication number
HK1221235A1
HK1221235A1 HK16109230.3A HK16109230A HK1221235A1 HK 1221235 A1 HK1221235 A1 HK 1221235A1 HK 16109230 A HK16109230 A HK 16109230A HK 1221235 A1 HK1221235 A1 HK 1221235A1
Authority
HK
Hong Kong
Prior art keywords
display device
resin composition
image display
production method
photocurable resin
Prior art date
Application number
HK16109230.3A
Other languages
English (en)
Inventor
岩田瑞生
植松武
川端和人
林直樹
Original Assignee
Dexerials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dexerials Corp filed Critical Dexerials Corp
Publication of HK1221235A1 publication Critical patent/HK1221235A1/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04—Polymers provided for in subclasses C08C or C08F
    • C08F290/048—Polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/062—Polyethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/067—Polyurethanes; Polyureas
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Wood Science & Technology (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Theoretical Computer Science (AREA)
  • Laminated Bodies (AREA)
HK16109230.3A 2013-06-06 2016-08-03 光固化性樹脂組合物和圖像顯示裝置的製造方法 HK1221235A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013120198A JP6127745B2 (ja) 2013-06-06 2013-06-06 光硬化性樹脂組成物、及び画像表示装置の製造方法
PCT/JP2014/063418 WO2014196355A1 (ja) 2013-06-06 2014-05-21 光硬化性樹脂組成物、及び画像表示装置の製造方法

Publications (1)

Publication Number Publication Date
HK1221235A1 true HK1221235A1 (zh) 2017-05-26

Family

ID=52008007

Family Applications (1)

Application Number Title Priority Date Filing Date
HK16109230.3A HK1221235A1 (zh) 2013-06-06 2016-08-03 光固化性樹脂組合物和圖像顯示裝置的製造方法

Country Status (8)

Country Link
US (1) US10025184B2 (zh)
EP (1) EP3006475B1 (zh)
JP (1) JP6127745B2 (zh)
KR (3) KR102379033B1 (zh)
CN (1) CN105308082B (zh)
HK (1) HK1221235A1 (zh)
TW (1) TWI624514B (zh)
WO (1) WO2014196355A1 (zh)

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EP3212724B1 (en) 2014-10-27 2022-07-27 Ctech Adhesives LLC Assembly processes using uv curable pressure sensitive adhesives (psa) or stageable psa systems
JP6528063B2 (ja) * 2015-02-26 2019-06-12 協立化学産業株式会社 電池モジュールの製造方法
JP6512892B2 (ja) * 2015-03-26 2019-05-15 株式会社日本触媒 硬化性樹脂組成物及びこれを用いた硬化物
JP6528103B2 (ja) * 2015-04-06 2019-06-12 協立化学産業株式会社 光硬化型接着組成物
JP6700004B2 (ja) * 2015-08-04 2020-05-27 デクセリアルズ株式会社 光学部材の製造方法
JP6689051B2 (ja) 2015-09-01 2020-04-28 デクセリアルズ株式会社 光硬化性樹脂組成物、及び画像表示装置の製造方法
TWI625542B (zh) 2016-04-12 2018-06-01 Ｌｇ化學股份有限公司 用於光學用途的黏著劑組成物
JP6623121B2 (ja) * 2016-06-08 2019-12-18 デクセリアルズ株式会社 光硬化性樹脂組成物、並びに画像表示装置、及びその製造方法
JP6898715B2 (ja) * 2016-08-01 2021-07-07 デクセリアルズ株式会社 光硬化性樹脂組成物、画像表示装置、及び画像表示装置の製造方法
JP6905325B2 (ja) * 2016-10-31 2021-07-21 デクセリアルズ株式会社 積層体の製造方法
JP6370967B1 (ja) * 2017-06-28 2018-08-08 デクセリアルズ株式会社 画像表示装置の製造方法、光硬化性樹脂組成物及び光透過性硬化樹脂層
KR101953367B1 (ko) * 2017-12-07 2019-05-24 삼성디스플레이 주식회사 광경화성 수지 조성물 및 이를 이용한 윈도우 부재의 제조 방법
JP7231986B2 (ja) * 2018-03-20 2023-03-02 三菱ケミカルインフラテック株式会社 樹脂組成物およびその硬化物
JP6602933B2 (ja) * 2018-10-17 2019-11-06 デクセリアルズ株式会社 光硬化性樹脂組成物、及び画像表示装置の製造方法
HUE065055T2 (hu) * 2018-12-26 2024-04-28 Dexerials Corp Fényre keményedõ gyantakészítmény és eljárás a képmegjelenítõ eszköz elõállítására
JP7244278B2 (ja) * 2019-01-02 2023-03-22 デクセリアルズ株式会社 光硬化性樹脂組成物、及び画像表示装置の製造方法
KR102229361B1 (ko) * 2019-02-22 2021-03-19 삼성디스플레이 주식회사 광경화성 수지 조성물 및 이를 이용한 윈도우 부재의 제조 방법
JP7329347B2 (ja) * 2019-03-27 2023-08-18 アイカ工業株式会社 光硬化性樹脂組成物
CN110003852A (zh) * 2019-04-18 2019-07-12 中山市安可玻璃防爆膜有限公司 一种uv粘贴胶水及其制作方法
US20230117061A1 (en) * 2020-03-13 2023-04-20 Basf Se Photo-curable composition for 3d printing, its preparation and use, and method of forming 3d-printed objects by using the same
EP4043502B1 (de) * 2021-02-11 2023-10-04 Xetos AG Photopolymerisierbare hoe-zusammensetzung

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Also Published As

Publication number Publication date
EP3006475A1 (en) 2016-04-13
TWI624514B (zh) 2018-05-21
KR20220043230A (ko) 2022-04-05
KR20160016820A (ko) 2016-02-15
JP2014237745A (ja) 2014-12-18
US10025184B2 (en) 2018-07-17
EP3006475A4 (en) 2016-12-21
CN105308082B (zh) 2017-12-29
KR20210021129A (ko) 2021-02-24
CN105308082A (zh) 2016-02-03
EP3006475B1 (en) 2019-09-11
US20160091791A1 (en) 2016-03-31
KR102435423B1 (ko) 2022-08-24
JP6127745B2 (ja) 2017-05-17
KR102379033B1 (ko) 2022-03-28
TW201512337A (zh) 2015-04-01
WO2014196355A1 (ja) 2014-12-11
KR102219043B1 (ko) 2021-02-23

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