HK1210545A1 - 曝光設備、曝光方法、設備生産方法、程序及記錄介質 - Google Patents

曝光設備、曝光方法、設備生産方法、程序及記錄介質

Info

Publication number
HK1210545A1
HK1210545A1 HK15111253.2A HK15111253A HK1210545A1 HK 1210545 A1 HK1210545 A1 HK 1210545A1 HK 15111253 A HK15111253 A HK 15111253A HK 1210545 A1 HK1210545 A1 HK 1210545A1
Authority
HK
Hong Kong
Prior art keywords
exposure
program
recording medium
production method
device production
Prior art date
Application number
HK15111253.2A
Other languages
English (en)
Inventor
Sato Shinji
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1210545A1 publication Critical patent/HK1210545A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
HK15111253.2A 2012-10-12 2015-11-13 曝光設備、曝光方法、設備生産方法、程序及記錄介質 HK1210545A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012227051 2012-10-12
PCT/JP2013/077313 WO2014057926A1 (ja) 2012-10-12 2013-10-08 露光装置、露光方法、デバイス製造方法、プログラム、及び記録媒体

Publications (1)

Publication Number Publication Date
HK1210545A1 true HK1210545A1 (zh) 2016-04-22

Family

ID=50477393

Family Applications (2)

Application Number Title Priority Date Filing Date
HK15111253.2A HK1210545A1 (zh) 2012-10-12 2015-11-13 曝光設備、曝光方法、設備生産方法、程序及記錄介質
HK16100428.4A HK1212512A1 (zh) 2012-10-12 2016-01-15 曝光裝置、曝光方法、器件製造方法、程序及記錄介質

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK16100428.4A HK1212512A1 (zh) 2012-10-12 2016-01-15 曝光裝置、曝光方法、器件製造方法、程序及記錄介質

Country Status (8)

Country Link
US (6) US9568828B2 (zh)
EP (1) EP2908331A4 (zh)
JP (3) JP6341090B2 (zh)
KR (1) KR102219386B1 (zh)
CN (2) CN108205243B (zh)
HK (2) HK1210545A1 (zh)
TW (2) TWI696044B (zh)
WO (1) WO2014057926A1 (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2003226A (en) 2008-08-19 2010-03-09 Asml Netherlands Bv Lithographic apparatus, drying device, metrology apparatus and device manufacturing method.
NL2009692A (en) 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) * 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
JP6369472B2 (ja) 2013-10-08 2018-08-08 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法
NL2017344A (en) * 2015-10-01 2017-04-11 Asml Netherlands Bv A lithography apparatus, a method of manufacturing a device and a control program
JP6757849B2 (ja) 2016-09-12 2020-09-23 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置のための流体ハンドリング構造
WO2019115197A1 (en) 2017-12-15 2019-06-20 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure

Family Cites Families (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE404906T1 (de) 1996-11-28 2008-08-15 Nikon Corp Ausrichtvorrichtung und belichtungsverfahren
JP3626504B2 (ja) 1997-03-10 2005-03-09 アーエスエム リソグラフィ ベスローテン フェンノートシャップ ２個の物品ホルダを有する位置決め装置
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
US6452292B1 (en) 2000-06-26 2002-09-17 Nikon Corporation Planar motor with linear coil arrays
JP2002025886A (ja) * 2000-07-03 2002-01-25 Canon Inc ステップ＆スキャン式投影露光装置、その保守方法並びに同装置を用いた半導体デバイス製造方法および半導体製造工場
JP4714403B2 (ja) 2001-02-27 2011-06-29 エーエスエムエル ユーエス，インコーポレイテッド デュアルレチクルイメージを露光する方法および装置
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
TWI242691B (en) 2002-08-23 2005-11-01 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
CN1245668C (zh) * 2002-10-14 2006-03-15 台湾积体电路制造股份有限公司 曝光系统及其曝光方法
KR20180120816A (ko) * 2003-08-21 2018-11-06 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
EP1660925B1 (en) 2003-09-03 2015-04-29 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR20190006080A (ko) 2004-06-09 2019-01-16 가부시키가이샤 니콘 기판 유지 장치 및 그것을 구비하는 노광 장치, 노광 방법, 디바이스 제조 방법, 그리고 발액 플레이트
US7057702B2 (en) * 2004-06-23 2006-06-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG155929A1 (en) 2004-09-17 2009-10-29 Nikon Corp Exposure apparatus, exposure method, and method for manufacturing device
JP2006106832A (ja) * 2004-09-30 2006-04-20 Nohmi Bosai Ltd トンネル防災設備
JP2011258999A (ja) * 2005-01-31 2011-12-22 Nikon Corp 露光装置及びデバイス製造方法
JP4844186B2 (ja) 2005-03-18 2011-12-28 株式会社ニコン プレート部材、基板保持装置、露光装置及び露光方法、並びにデバイス製造方法
US20070011201A1 (en) * 2005-06-30 2007-01-11 Yerramalli Subramaniam Interface method and system for genetic analysis data
JP4567651B2 (ja) 2005-11-16 2010-10-20 エーエスエムエル ネザーランズ ビー．ブイ． 露光装置及びデバイス製造方法
US7656501B2 (en) * 2005-11-16 2010-02-02 Asml Netherlands B.V. Lithographic apparatus
US7804577B2 (en) * 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
US7864292B2 (en) * 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI538012B (zh) 2006-01-19 2016-06-11 尼康股份有限公司 移動體驅動方法及移動體驅動系統、圖案形成方法及圖案形成裝置、曝光方法及曝光裝置、以及元件製造方法
JP2007194484A (ja) * 2006-01-20 2007-08-02 Toshiba Corp 液浸露光方法
CN101438385B (zh) 2006-05-10 2011-02-16 尼康股份有限公司 曝光装置及元件制造方法
US7656502B2 (en) * 2006-06-22 2010-02-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4357514B2 (ja) * 2006-09-29 2009-11-04 株式会社東芝 液浸露光方法
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
JP2008227007A (ja) * 2007-03-09 2008-09-25 Toshiba Corp 液浸露光方法及び液浸露光装置
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8068209B2 (en) 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
US8610873B2 (en) * 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
US8289497B2 (en) 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
JP2009289896A (ja) * 2008-05-28 2009-12-10 Toshiba Corp 液浸露光方法
US9176393B2 (en) * 2008-05-28 2015-11-03 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
US8896806B2 (en) 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP2221669A3 (en) * 2009-02-19 2011-02-09 ASML Netherlands B.V. A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method
EP2523210A1 (en) 2010-01-08 2012-11-14 Nikon Corporation Liquid-immersion member, exposing device, exposing method, and device manufacturing method
JP2011258602A (ja) * 2010-06-04 2011-12-22 Nikon Corp 移動制御方法、露光方法、ステージ装置、露光装置、プログラム、記録媒体、及びデバイス製造方法
US20120162619A1 (en) * 2010-12-27 2012-06-28 Nikon Corporation Liquid immersion member, immersion exposure apparatus, exposing method, device fabricating method, program, and storage medium
NL2008183A (en) * 2011-02-25 2012-08-28 Asml Netherlands Bv A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method.
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
JP2013251311A (ja) 2012-05-30 2013-12-12 Nikon Corp 露光装置、露光方法、デバイス製造方法、プログラム、及び記録媒体
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) * 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US10261422B2 (en) * 2014-08-07 2019-04-16 Asml Netherlands B.V. Lithography apparatus and method of manufacturing a device

Also Published As

Publication number Publication date
TWI696044B (zh) 2020-06-11
JPWO2014057926A1 (ja) 2016-09-05
US20140307235A1 (en) 2014-10-16
CN108205243B (zh) 2020-06-02
JP6583478B2 (ja) 2019-10-02
US10444634B2 (en) 2019-10-15
WO2014057926A1 (ja) 2014-04-17
KR102219386B1 (ko) 2021-02-23
US9910365B2 (en) 2018-03-06
US9568828B2 (en) 2017-02-14
US20150286142A1 (en) 2015-10-08
JP2018142015A (ja) 2018-09-13
CN104838471A (zh) 2015-08-12
US20180052399A1 (en) 2018-02-22
TW201820056A (zh) 2018-06-01
TW201418899A (zh) 2014-05-16
CN104838471B (zh) 2018-03-20
KR20150066578A (ko) 2015-06-16
JP2019219685A (ja) 2019-12-26
US10678141B2 (en) 2020-06-09
US20170075235A1 (en) 2017-03-16
US20200041912A1 (en) 2020-02-06
EP2908331A4 (en) 2017-05-03
JP6341090B2 (ja) 2018-06-13
US9857700B2 (en) 2018-01-02
US9507265B2 (en) 2016-11-29
CN108205243A (zh) 2018-06-26
US20170139331A1 (en) 2017-05-18
HK1212512A1 (zh) 2016-06-10
TWI625600B (zh) 2018-06-01
EP2908331A1 (en) 2015-08-19

Similar Documents

Publication Publication Date Title
HK1212512A1 (zh) 曝光裝置、曝光方法、器件製造方法、程序及記錄介質
EP2897013A4 (en) MONITORING DEVICE, MONITORING PROCEDURE, PROGRAM AND RECORDING MEDIUM
EP2711887A4 (en) INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, INFORMATION PROCESSING PROGRAM, AND RECORDING MEDIUM
GB2500972B (en) Electronic apparatus, control method and recording medium
EP2869492A4 (en) COMMUNICATION PROGRAM, RECORDING MEDIUM, COMMUNICATION DEVICE AND COMMUNICATION PROCESS
EP2887349A4 (en) CODING METHOD, CODING DEVICE, PROGRAM AND RECORDING MEDIUM
EP2717217A4 (en) INFORMATION PROVIDING DEVICE, INFORMATION PROVIDING METHOD, INFORMATION PROVIDING PROGRAM, AND RECORDING MEDIUM
EP2804060A4 (en) SIMULATION DEVICE, SIMULATION METHOD, PROGRAM, AND RECORDING MEDIUM
EP2800012A4 (en) SEARCH, SEARCH, SEARCH, AND RECORDING MEDIUM
EP3044765A4 (en) Rendering apparatus, rendering method thereof, program and recording medium
EP2672395A4 (en) TRANSLITTERATION DEVICE, PROGRAM, RECORDING MEDIUM, AND METHOD
EP2957357A4 (en) AIR FLUSHING PROCESS, AIR FLUSHING DEVICE, PROGRAM AND RECORDING MEDIUM
ZA201402595B (en) Playback device, playback method, and program
MY166198A (en) Control device, control method, program, and recording medium
EP2665004A4 (en) INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, INFORMATION PROCESSING DEVICE PROGRAM, AND RECORDING MEDIUM
EP2682880A4 (en) ASSEMBLY EXTENSION DEVICE, ASSEMBLY EXTENSION METHOD, PROGRAM, AND NON-TRANSIENT STORAGE MEDIUM
EP2916317A4 (en) READING APPARATUS, SETTING APPARATUS, READING METHOD, AND PROGRAM
EP2827328A4 (en) CODING METHOD, CODING DEVICE, PROGRAM AND RECORDING MEDIUM
EP2750074A4 (en) ANONYLATION DEVICE, ANONYLATION METHOD AND RECORDING CARRIER FOR PROGRAM STORAGE THEREFOR
EP2899074A4 (en) TROUBLESHOOTING DEVICE AND TROUBLESHOOTING METHOD
EP2860959A4 (en) CONTROL DEVICE, CONTROL METHOD, AND RECORDING MEDIUM
HK1214406A1 (zh) 曝光設備、曝光方法、設備製造方法、程序和記錄介質
EP2981059A4 (en) PICTURE RECORDING DEVICE, IMAGE RECORDING PROCESS AND PROGRAM
SG11201503823UA (en) Image recognition device, image recognition method, program, and recording medium
EP2765555A4 (en) IMAGE APPRAISAL DEVICE, IMAGE SELECTION DEVICE, IMAGE APPRAISAL PROCEDURE, RECORDING MEDIUM AND PROGRAM