HK1201645A1 - Ceramic thermally-compensated resonator - Google Patents
Ceramic thermally-compensated resonatorInfo
- Publication number
- HK1201645A1 HK1201645A1 HK15102082.8A HK15102082A HK1201645A1 HK 1201645 A1 HK1201645 A1 HK 1201645A1 HK 15102082 A HK15102082 A HK 15102082A HK 1201645 A1 HK1201645 A1 HK 1201645A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- compensated resonator
- ceramic thermally
- thermally
- ceramic
- resonator
- Prior art date
Links
- 239000000919 ceramic Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/20—Compensation of mechanisms for stabilising frequency
- G04B17/22—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
- H03H9/131—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials consisting of a multilayered structure
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/20—Compensation of mechanisms for stabilising frequency
- G04B17/22—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature
- G04B17/227—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature composition and manufacture of the material used
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/20—Compensation of mechanisms for stabilising frequency
- G04B17/24—Compensation of mechanisms for stabilising frequency for the effect of variations of atmospheric pressure
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/0072—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
- H03H3/0075—Arrangements or methods specially adapted for testing microelecro-mechanical resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/0072—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
- H03H3/0076—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks for obtaining desired frequency or temperature coefficients
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02244—Details of microelectro-mechanical resonators
- H03H9/02433—Means for compensation or elimination of undesired effects
- H03H9/02448—Means for compensation or elimination of undesired effects of temperature influence
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/21—Crystal tuning forks
- H03H9/215—Crystal tuning forks consisting of quartz
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
- H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
- H03H9/2468—Tuning fork resonators
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H2003/027—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks being of the microelectro-mechanical [MEMS] type
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
- H03H2003/0407—Temperature coefficient
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Acoustics & Sound (AREA)
- General Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Micromachines (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP11187854.2A EP2590325A1 (de) | 2011-11-04 | 2011-11-04 | Thermokompensierter Resonator aus Keramik |
PCT/EP2012/070129 WO2013064351A1 (fr) | 2011-11-04 | 2012-10-11 | Résonateur thermocompensé en céramique |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1201645A1 true HK1201645A1 (en) | 2015-09-04 |
Family
ID=47008611
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK15102082.8A HK1201645A1 (en) | 2011-11-04 | 2015-03-02 | Ceramic thermally-compensated resonator |
HK18103810.2A HK1244359A1 (zh) | 2011-11-04 | 2018-03-19 | 陶瓷溫度補償諧振器 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK18103810.2A HK1244359A1 (zh) | 2011-11-04 | 2018-03-19 | 陶瓷溫度補償諧振器 |
Country Status (7)
Country | Link |
---|---|
US (1) | US10310451B2 (de) |
EP (2) | EP2590325A1 (de) |
JP (3) | JP2015501591A (de) |
CN (3) | CN107276557A (de) |
HK (2) | HK1201645A1 (de) |
RU (1) | RU2573275C2 (de) |
WO (1) | WO2013064351A1 (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2781968A1 (de) * | 2013-03-19 | 2014-09-24 | Nivarox-FAR S.A. | Resonator, der weniger empfindlich gegenüber klimatischen Schwankungen ist |
EP3100120A1 (de) | 2014-01-29 | 2016-12-07 | Cartier International AG | Wärmekompensierte spiralfeder aus keramik mit silicium in der zusammensetzung davon und verfahren zu anpassung davon |
EP2985659B1 (de) * | 2014-03-05 | 2020-04-29 | Nivarox-FAR S.A. | Spirale, die mit einer federscheibe gesichert werden muss |
EP2952972B1 (de) * | 2014-06-03 | 2017-01-25 | The Swatch Group Research and Development Ltd. | Herstellungsverfahren einer Ausgleichsspiralfeder aus Verbundmaterial |
EP2952979B1 (de) * | 2014-06-03 | 2017-03-01 | Nivarox-FAR S.A. | Uhrkomponente aus fotostrukturierbarem glas |
EP3002638B1 (de) | 2014-09-08 | 2021-08-18 | Richemont International S.A. | Herstellungsverfahren einer thermokompensierten spiralfeder |
CN107005223B (zh) * | 2014-10-03 | 2021-06-04 | 芬兰国家技术研究中心股份公司 | 温度补偿梁谐振器 |
WO2016051023A1 (en) * | 2014-10-03 | 2016-04-07 | Teknologian Tutkimuskeskus Vtt Oy | Temperature compensated compound resonator |
WO2016199039A1 (fr) | 2015-06-08 | 2016-12-15 | Richemont International Sa | Résonateur horloger thermocompensé et méthode pour réaliser un tel résonateur |
EP3106931A1 (de) * | 2015-06-16 | 2016-12-21 | Nivarox-FAR S.A. | Werkstück mit entkoppelter schweissoberfläche |
EP3181938B1 (de) | 2015-12-18 | 2019-02-20 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Herstellungsverfahren einer spiralfeder mit einer vorbestimmten steifigkeit durch wegnahme von material |
EP3181940B2 (de) | 2015-12-18 | 2023-07-05 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Herstellungsverfahren einer spiralfeder mit einer vorbestimmten steifigkeit durch lokalisierte wegnahme von material |
EP3181939B1 (de) | 2015-12-18 | 2019-02-20 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Herstellungsverfahren einer spiralfeder mit einer vorbestimmten steifigkeit durch zugabe von material |
EP3190095B1 (de) | 2016-01-08 | 2023-08-02 | Richemont International SA | Wärmekompensierter resonator, der ein glas umfasst |
JP7182616B2 (ja) * | 2018-04-19 | 2022-12-02 | シチズン時計株式会社 | ひげぜんまいおよび調速機 |
EP3667433B1 (de) * | 2018-12-12 | 2023-02-01 | Nivarox-FAR S.A. | Spiralfeder und ihr herstellungsverfahren |
EP3839644A1 (de) * | 2019-12-20 | 2021-06-23 | Nivarox-FAR S.A. | Flexible uhrwerkskomponente, insbesondere für oszillationsmechanismus, und eine solche komponente umfassendes uhrwerk |
Family Cites Families (39)
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US4456898A (en) * | 1982-02-11 | 1984-06-26 | General Electric Company | Thermal compensators for magnetic circuits |
JPS61195013A (ja) * | 1985-02-25 | 1986-08-29 | Yasuhiko Nakagawa | 零温度係数をもつ弾性表面波材料 |
AT401837B (de) * | 1993-03-04 | 1996-12-27 | Avl Verbrennungskraft Messtech | Piezoelektrisches kristallelement |
CH693049A5 (fr) * | 1998-02-27 | 2003-01-31 | Rado Montres Sa | Procédé de réalisation d'étanchéité dans une montre. |
US6351056B1 (en) * | 1999-10-01 | 2002-02-26 | Ngk Insulators, Ltd. | Piezoelectric/electrostrictive device having mutually opposing thin plate portions |
EP1239588A2 (de) * | 2001-03-04 | 2002-09-11 | Kazuhiko Yamanouchi | Akustisches Oberflächenwellensubstrat und akustischer Oberflächenwellenfunktionsbaustein |
JP3961267B2 (ja) * | 2001-11-13 | 2007-08-22 | 京セラ株式会社 | 水晶デバイス |
FR2842313B1 (fr) * | 2002-07-12 | 2004-10-22 | Gideon Levingston | Oscilliateur mecanique (systeme balancier et ressort spiral) en materiaux permettant d'atteindre un niveau superieur de precision, applique a un mouvement d'horlogerie ou autre instrument de precision |
DE60206939T2 (de) | 2002-11-25 | 2006-07-27 | Csem Centre Suisse D'electronique Et De Microtechnique S.A. | Spiraluhrwerkfeder und Verfahren zu deren Herstellung |
US8358053B2 (en) * | 2003-06-30 | 2013-01-22 | Piedek Technical Laboratory | Unit, oscillator having unit and electronic apparatus having oscillator |
US7768179B2 (en) * | 2003-06-30 | 2010-08-03 | Piedek Technical Laboratory | Quartz crystal unit, quartz crystal oscillator having quartz crystal unit and electronic apparatus having quartz crystal oscillator |
GB0324439D0 (en) * | 2003-10-20 | 2003-11-19 | Levingston Gideon R | Minimal thermal variation and temperature compensating non-magnetic balance wheels and methods of production of these and their associated balance springs |
US7068125B2 (en) * | 2004-03-04 | 2006-06-27 | Robert Bosch Gmbh | Temperature controlled MEMS resonator and method for controlling resonator frequency |
JP5057644B2 (ja) * | 2004-03-22 | 2012-10-24 | 京セラ株式会社 | ガラスセラミック組成物およびガラスセラミック焼結体の製造方法 |
JP2005318366A (ja) * | 2004-04-30 | 2005-11-10 | Seiko Epson Corp | 圧電薄膜共振子、フィルタ及び圧電薄膜共振子の製造方法 |
EP1605182B8 (de) * | 2004-06-08 | 2010-07-14 | CSEM Centre Suisse d'Electronique et de Microtechnique S.A. - Recherche et Développement | Unruh-Spiralfeder-Oszillator mit Temperaturkompensation |
EP2426785A2 (de) * | 2004-10-01 | 2012-03-07 | L. Pierre De Rochemont | Keramisches Antennenmodul und Herstellungsverfahren dafür |
FR2889374A1 (fr) * | 2005-07-29 | 2007-02-02 | Michelin Soc Tech | Structure resonnante hybride pour verifier des parametres d'un pneumatique |
JP2007123371A (ja) * | 2005-10-26 | 2007-05-17 | Kyocera Corp | 多数個取り電子装置およびその製造方法 |
EP1791039A1 (de) * | 2005-11-25 | 2007-05-30 | The Swatch Group Research and Development Ltd. | Spiralfeder aus athermisches Glas für ein Uhrwerk und Herstellungsverfahren dafür |
US7847649B2 (en) * | 2005-12-23 | 2010-12-07 | Nxp B.V. | MEMS resonator, a method of manufacturing thereof, and a MEMS oscillator |
EP1857891A1 (de) * | 2006-05-17 | 2007-11-21 | Patek Philippe Sa | Spiralfeder-Spiralrollegesamtheit für ein Uhrwerk |
CH700716B1 (fr) | 2006-10-09 | 2010-10-15 | Suisse Electronique Microtech | Résonateur en silicium de type diapason. |
JP2008155333A (ja) * | 2006-12-25 | 2008-07-10 | Japan Science & Technology Agency | 金属ガラスを用いたマイクロマシン及びそれを用いたセンサ並びにその製造方法 |
CH714952B1 (fr) * | 2007-05-08 | 2019-10-31 | Patek Philippe Sa Geneve | Composant horloger, son procédé de fabrication et application de ce procédé. |
JP5122888B2 (ja) * | 2007-08-27 | 2013-01-16 | セイコーインスツル株式会社 | 発振子、発振子の製造方法、及び発振器 |
JP4539708B2 (ja) * | 2007-11-02 | 2010-09-08 | エプソントヨコム株式会社 | 圧電振動片、圧電振動子および加速度センサ |
CH699494B1 (fr) * | 2007-11-28 | 2010-09-30 | Manuf Et Fabrique De Montres E | Oscillateur mécanique présentant un coefficient thermoélastique optimisé et procédé de fabrication d'un tel oscillateur. |
CH698962B1 (fr) * | 2008-06-10 | 2014-10-31 | Rolex Sa | Ressort de barillet et procédé pour sa mise en forme. |
CH699780B1 (fr) * | 2008-10-22 | 2014-02-14 | Richemont Int Sa | Ressort spiral de montre autocompensé. |
JP2010219992A (ja) * | 2009-03-18 | 2010-09-30 | Seiko Epson Corp | 振動片および振動子 |
CN101551283B (zh) * | 2009-05-14 | 2010-10-20 | 上海交通大学 | 表面横波压力和温度传感器 |
EP2264553B1 (de) * | 2009-06-19 | 2016-10-26 | Nivarox-FAR S.A. | Thermokompensierte Feder und ihr Herstellungsverfahren |
EP2284629A1 (de) * | 2009-08-13 | 2011-02-16 | ETA SA Manufacture Horlogère Suisse | Thermokompensierter mechanischer Resonator |
CH702151A1 (fr) * | 2009-11-10 | 2011-05-13 | Cartier Creation Studio Sa | Procede de realisation de pieces micromecaniques, notamment en verre ceramique. |
TWI398097B (zh) * | 2009-11-18 | 2013-06-01 | Wafer Mems Co Ltd | 音叉型石英晶體諧振器 |
EP2337221A1 (de) * | 2009-12-15 | 2011-06-22 | The Swatch Group Research and Development Ltd. | Thermokompensierter Resonator mindestens ersten und zweiten Grades |
US8283835B2 (en) * | 2010-04-30 | 2012-10-09 | Epcos Ag | Guided bulk acoustic wave device having reduced height and method for manufacturing |
EP2395661A1 (de) * | 2010-06-10 | 2011-12-14 | The Swatch Group Research and Development Ltd. | Temperaturkompensierter Resonator mit reduzierten Temperaturkoeffizienten erster und zweiter Ordnung |
-
2011
- 2011-11-04 EP EP11187854.2A patent/EP2590325A1/de not_active Withdrawn
-
2012
- 2012-10-11 CN CN201710421696.9A patent/CN107276557A/zh active Pending
- 2012-10-11 WO PCT/EP2012/070129 patent/WO2013064351A1/fr active Application Filing
- 2012-10-11 EP EP12770138.1A patent/EP2774268B1/de active Active
- 2012-10-11 JP JP2014537552A patent/JP2015501591A/ja active Pending
- 2012-10-11 US US14/355,945 patent/US10310451B2/en active Active
- 2012-10-11 RU RU2014122532/08A patent/RU2573275C2/ru not_active IP Right Cessation
- 2012-10-11 CN CN201280054128.5A patent/CN104025453A/zh active Pending
- 2012-10-11 CN CN201910585469.9A patent/CN110474615A/zh active Pending
-
2015
- 2015-03-02 HK HK15102082.8A patent/HK1201645A1/xx unknown
-
2016
- 2016-06-21 JP JP2016122394A patent/JP2016191711A/ja active Pending
-
2018
- 2018-03-19 HK HK18103810.2A patent/HK1244359A1/zh unknown
-
2019
- 2019-03-26 JP JP2019057949A patent/JP6893525B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
RU2573275C2 (ru) | 2016-01-20 |
CN104025453A (zh) | 2014-09-03 |
JP2019124699A (ja) | 2019-07-25 |
CN107276557A (zh) | 2017-10-20 |
CN110474615A (zh) | 2019-11-19 |
HK1244359A1 (zh) | 2018-08-03 |
RU2014122532A (ru) | 2015-12-10 |
JP6893525B2 (ja) | 2021-06-23 |
US10310451B2 (en) | 2019-06-04 |
JP2016191711A (ja) | 2016-11-10 |
EP2774268A1 (de) | 2014-09-10 |
EP2774268B1 (de) | 2019-01-23 |
EP2590325A1 (de) | 2013-05-08 |
US20140313866A1 (en) | 2014-10-23 |
WO2013064351A1 (fr) | 2013-05-10 |
JP2015501591A (ja) | 2015-01-15 |
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