HK1188179A1 - 超聲波清洗方法和裝置 - Google Patents

超聲波清洗方法和裝置

Info

Publication number
HK1188179A1
HK1188179A1 HK14101329.4A HK14101329A HK1188179A1 HK 1188179 A1 HK1188179 A1 HK 1188179A1 HK 14101329 A HK14101329 A HK 14101329A HK 1188179 A1 HK1188179 A1 HK 1188179A1
Authority
HK
Hong Kong
Prior art keywords
cleaning method
ultrasonic cleaning
ultrasonic
cleaning
Prior art date
Application number
HK14101329.4A
Other languages
English (en)
Inventor
江田幸雄
伊林敏成
栗村启之
Original Assignee
電化株式會社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 電化株式會社 filed Critical 電化株式會社
Publication of HK1188179A1 publication Critical patent/HK1188179A1/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/328—Partly or completely removing a coating
HK14101329.4A 2011-01-18 2014-02-13 超聲波清洗方法和裝置 HK1188179A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011007986 2011-01-18
PCT/JP2012/050868 WO2012099126A1 (ja) 2011-01-18 2012-01-17 超音波洗浄方法及び装置

Publications (1)

Publication Number Publication Date
HK1188179A1 true HK1188179A1 (zh) 2014-04-25

Family

ID=46515749

Family Applications (1)

Application Number Title Priority Date Filing Date
HK14101329.4A HK1188179A1 (zh) 2011-01-18 2014-02-13 超聲波清洗方法和裝置

Country Status (8)

Country Link
US (1) US9643221B2 (zh)
EP (1) EP2666550A4 (zh)
JP (1) JP5894088B2 (zh)
KR (1) KR20140005241A (zh)
CN (1) CN103313804B (zh)
HK (1) HK1188179A1 (zh)
TW (1) TWI565536B (zh)
WO (1) WO2012099126A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140127857A1 (en) * 2012-11-07 2014-05-08 Taiwan Semiconductor Manufacturing Company, Ltd. Carrier Wafers, Methods of Manufacture Thereof, and Packaging Methods
JP6009350B2 (ja) * 2012-12-28 2016-10-19 花王株式会社 電子部品が接合した回路基板の製造方法
JP2015000911A (ja) * 2013-06-14 2015-01-05 Dic株式会社 反応性ホットメルト樹脂用剥離剤、剥離方法及び基材
CN104588349A (zh) * 2014-11-26 2015-05-06 成都川硬合金材料有限责任公司 一种适用于铜表面的超声波清洗工艺
TWI654218B (zh) 2018-01-08 2019-03-21 財團法人工業技術研究院 樹脂組合物與導熱材料的形成方法
KR102087731B1 (ko) * 2018-08-09 2020-03-11 주식회사 오럼머티리얼 마스크 지지 템플릿과 그의 제조 방법 및 프레임 일체형 마스크의 제조 방법
CN109047244A (zh) * 2018-09-05 2018-12-21 蓝思科技股份有限公司 一种光学玻璃表面超净清洁方法
CN111715615B (zh) * 2020-06-29 2022-04-15 晶科绿能(上海)管理有限公司 一种超声波清洁装置及切割设备

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4294729A (en) 1979-12-17 1981-10-13 International Business Machines Corporation Composition containing alcohol and use thereof for epoxy removal
MY118065A (en) * 1989-10-26 2004-08-30 Toshiba Silicone Cleaning compositions
US5330582A (en) * 1989-11-08 1994-07-19 Arakawa Chemical Industries, Ltd. Method for cleaning rosin-base solder flux
JPH05259144A (ja) 1992-03-11 1993-10-08 Fujitsu Ltd 基板洗浄方法
JP3390245B2 (ja) * 1993-06-01 2003-03-24 富士通株式会社 洗浄液及び洗浄方法
JPH08141527A (ja) 1994-11-21 1996-06-04 Otsuka Giken Kogyo Kk 超音波洗浄装置
JP2002530480A (ja) 1998-11-16 2002-09-17 ザ、プロクター、エンド、ギャンブル、カンパニー 音波または超音波を使用する洗浄製品
JP2001276759A (ja) * 2000-03-30 2001-10-09 Hitachi Plant Eng & Constr Co Ltd ガラス基板の洗浄液及び洗浄方法
TWI259202B (en) * 2000-06-01 2006-08-01 Asahi Kasei Corp Cleaning method and cleaning apparatus
JP2002256295A (ja) 2001-02-28 2002-09-11 Nippon Zeon Co Ltd 洗浄方法
JP4213456B2 (ja) * 2002-12-10 2009-01-21 花王株式会社 樹脂剥離剤組成物
US7052556B1 (en) * 2003-03-10 2006-05-30 Montie-Targosz Enterprises, Llc Process for removal of paint from plastic substrates
CN100412183C (zh) * 2003-08-27 2008-08-20 化研科技株式会社 除去助焊剂用洗涤剂及助焊剂的洗涤方法
CN100560705C (zh) * 2005-12-29 2009-11-18 比亚迪股份有限公司 一种液晶清洗剂组合物及其制备方法
KR101251594B1 (ko) * 2006-03-23 2013-04-08 주식회사 동진쎄미켐 레지스트 스트리퍼 제거용 케미칼 린스 조성물
MY149144A (en) 2006-08-10 2013-07-15 Denki Kagaku Kogyo Kk Adhesive composition and temporary fixing method of member using it
JP2008243342A (ja) 2007-03-29 2008-10-09 Hoya Corp 磁気ディスク用ガラス基板の超音波洗浄装置および超音波洗浄方法、磁気ディスク製造方法ならびに磁気ディスク
CN101286016A (zh) * 2007-04-13 2008-10-15 安集微电子（上海）有限公司 低蚀刻性光刻胶清洗剂
US7524808B2 (en) * 2007-06-12 2009-04-28 Rhodia Inc. Hard surface cleaning composition with hydrophilizing agent and method for cleaning hard surfaces
KR20100029703A (ko) * 2008-09-08 2010-03-17 라이온 가부시키가이샤 액정 제거용 세제 조성물 및 액정 패널의 세정 방법

Also Published As

Publication number Publication date
US20130298941A1 (en) 2013-11-14
CN103313804A (zh) 2013-09-18
EP2666550A4 (en) 2014-10-29
JPWO2012099126A1 (ja) 2014-06-30
WO2012099126A1 (ja) 2012-07-26
KR20140005241A (ko) 2014-01-14
EP2666550A1 (en) 2013-11-27
JP5894088B2 (ja) 2016-03-23
US9643221B2 (en) 2017-05-09
TWI565536B (zh) 2017-01-11
CN103313804B (zh) 2016-08-10
TW201235122A (en) 2012-09-01

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210122