HK1136004A1 - Printable medium for etching of oxidic, transparent and conducting layers - Google Patents

Printable medium for etching of oxidic, transparent and conducting layers

Info

Publication number
HK1136004A1
HK1136004A1 HK10100218.4A HK10100218A HK1136004A1 HK 1136004 A1 HK1136004 A1 HK 1136004A1 HK 10100218 A HK10100218 A HK 10100218A HK 1136004 A1 HK1136004 A1 HK 1136004A1
Authority
HK
Hong Kong
Prior art keywords
oxidic
etching
transparent
conducting layers
printable medium
Prior art date
Application number
HK10100218.4A
Other languages
English (en)
Inventor
Werner Stockum
Kuebelbeck Armin
Original Assignee
Merck Patent Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent Gmbh filed Critical Merck Patent Gmbh
Publication of HK1136004A1 publication Critical patent/HK1136004A1/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • C09K13/04Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/06Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • C09K13/04Etching, surface-brightening or pickling compositions containing an inorganic acid
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00Surface treatment of glass, not in the form of fibres or filaments, by etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604Chemical etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1884Manufacture of transparent electrodes, e.g. TCO, ITO
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • General Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Weting (AREA)
  • Photovoltaic Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
HK10100218.4A 2006-10-30 2010-01-08 Printable medium for etching of oxidic, transparent and conducting layers HK1136004A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102006051735A DE102006051735A1 (de) 2006-10-30 2006-10-30 Druckfähiges Medium zur Ätzung von oxidischen, transparenten, leitfähigen Schichten
PCT/EP2007/008663 WO2008052637A1 (de) 2006-10-30 2007-10-05 Druckfähiges medium zum ätzen von oxidischen, transparenten und leitfähigen schichten

Publications (1)

Publication Number Publication Date
HK1136004A1 true HK1136004A1 (en) 2010-06-18

Family

ID=38984085

Family Applications (1)

Application Number Title Priority Date Filing Date
HK10100218.4A HK1136004A1 (en) 2006-10-30 2010-01-08 Printable medium for etching of oxidic, transparent and conducting layers

Country Status (12)

Country Link
US (1) US8795549B2 (ja)
EP (1) EP2089491B1 (ja)
JP (1) JP5190063B2 (ja)
KR (1) KR101465276B1 (ja)
CN (1) CN101600779B (ja)
DE (1) DE102006051735A1 (ja)
ES (1) ES2416310T3 (ja)
HK (1) HK1136004A1 (ja)
MY (1) MY149959A (ja)
PL (1) PL2089491T3 (ja)
TW (1) TWI425079B (ja)
WO (1) WO2008052637A1 (ja)

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CN102097536B (zh) * 2009-12-11 2012-12-12 杜邦太阳能有限公司 制造一体化光伏模块的方法
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US9214576B2 (en) * 2010-06-09 2015-12-15 Solarcity Corporation Transparent conducting oxide for photovoltaic devices
EP2596081A1 (en) * 2010-06-14 2013-05-29 Merck Patent GmbH Cross-linking and multi-phase etch pastes for high resolution feature patterning
US9773928B2 (en) 2010-09-10 2017-09-26 Tesla, Inc. Solar cell with electroplated metal grid
US9800053B2 (en) 2010-10-08 2017-10-24 Tesla, Inc. Solar panels with integrated cell-level MPPT devices
WO2012083082A1 (en) 2010-12-15 2012-06-21 Sun Chemical Corporation Printable etchant compositions for etching silver nanoware-based transparent, conductive film
US9054256B2 (en) 2011-06-02 2015-06-09 Solarcity Corporation Tunneling-junction solar cell with copper grid for concentrated photovoltaic application
KR20140058563A (ko) * 2011-07-18 2014-05-14 메르크 파텐트 게엠베하 대전방지 및 반사방지 코팅들 그리고 대응하는 적층된 층들의 구조화
CN102603211B (zh) * 2012-01-12 2013-10-30 福耀玻璃工业集团股份有限公司 一种在玻璃上制作标识的方法
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US9865754B2 (en) 2012-10-10 2018-01-09 Tesla, Inc. Hole collectors for silicon photovoltaic cells
JP6136186B2 (ja) * 2012-10-16 2017-05-31 日立化成株式会社 液状組成物
US9281436B2 (en) 2012-12-28 2016-03-08 Solarcity Corporation Radio-frequency sputtering system with rotary target for fabricating solar cells
US10074755B2 (en) 2013-01-11 2018-09-11 Tesla, Inc. High efficiency solar panel
US9219174B2 (en) 2013-01-11 2015-12-22 Solarcity Corporation Module fabrication of solar cells with low resistivity electrodes
US9412884B2 (en) 2013-01-11 2016-08-09 Solarcity Corporation Module fabrication of solar cells with low resistivity electrodes
US9624595B2 (en) 2013-05-24 2017-04-18 Solarcity Corporation Electroplating apparatus with improved throughput
CN103508677A (zh) * 2013-09-24 2014-01-15 苏州诺维克光伏新材料有限公司 一种膏体材料及其应用
CN103980905B (zh) * 2014-05-07 2017-04-05 佛山市中山大学研究院 一种用于氧化物材料体系的蚀刻液及其蚀刻方法和应用
US9324899B2 (en) 2014-06-09 2016-04-26 Natcore Technology, Inc. Emitter diffusion conditions for black silicon
US10309012B2 (en) 2014-07-03 2019-06-04 Tesla, Inc. Wafer carrier for reducing contamination from carbon particles and outgassing
JP6359394B2 (ja) * 2014-09-18 2018-07-18 国立研究開発法人産業技術総合研究所 半導体装置とその製造方法
US9899546B2 (en) 2014-12-05 2018-02-20 Tesla, Inc. Photovoltaic cells with electrodes adapted to house conductive paste
US9947822B2 (en) 2015-02-02 2018-04-17 Tesla, Inc. Bifacial photovoltaic module using heterojunction solar cells
KR101629852B1 (ko) 2015-03-23 2016-06-14 주식회사 해나라 휠 가드 제조 시스템
US9761744B2 (en) 2015-10-22 2017-09-12 Tesla, Inc. System and method for manufacturing photovoltaic structures with a metal seed layer
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CN106280680A (zh) * 2016-08-09 2017-01-04 上海交通大学 一种水溶性含磷油墨及其制备方法
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TWI776196B (zh) * 2020-07-29 2022-09-01 國立虎尾科技大學 低溫製造微型發電機的製程方法
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Also Published As

Publication number Publication date
ES2416310T3 (es) 2013-07-31
US20100068890A1 (en) 2010-03-18
US8795549B2 (en) 2014-08-05
MY149959A (en) 2013-11-15
CN101600779A (zh) 2009-12-09
KR101465276B1 (ko) 2014-11-26
TWI425079B (zh) 2014-02-01
JP5190063B2 (ja) 2013-04-24
EP2089491A1 (de) 2009-08-19
KR20090087016A (ko) 2009-08-14
WO2008052637A1 (de) 2008-05-08
JP2010508664A (ja) 2010-03-18
EP2089491B1 (de) 2013-04-10
DE102006051735A1 (de) 2008-05-08
TW200827431A (en) 2008-07-01
PL2089491T3 (pl) 2013-08-30
CN101600779B (zh) 2013-06-26

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20171005