HK1127099A1 - Crystalline chromium deposit - Google Patents

Crystalline chromium deposit

Info

Publication number
HK1127099A1
HK1127099A1 HK09106989.1A HK09106989A HK1127099A1 HK 1127099 A1 HK1127099 A1 HK 1127099A1 HK 09106989 A HK09106989 A HK 09106989A HK 1127099 A1 HK1127099 A1 HK 1127099A1
Authority
HK
Hong Kong
Prior art keywords
chromium deposit
crystalline chromium
crystalline
deposit
chromium
Prior art date
Application number
HK09106989.1A
Other languages
English (en)
Inventor
Craig V Bishop
Agnes Rousseau
Zoltan Mathe
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Publication of HK1127099A1 publication Critical patent/HK1127099A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/619—Amorphous layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/922—Static electricity metal bleed-off metallic stock
    • Y10S428/9335—Product by special process
    • Y10S428/934—Electrical process
    • Y10S428/935—Electroplating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
    • Y10T428/12826—Group VIB metal-base component
    • Y10T428/12847—Cr-base component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
HK09106989.1A 2006-03-31 2009-07-29 Crystalline chromium deposit HK1127099A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US78838706P 2006-03-31 2006-03-31
PCT/US2007/065345 WO2007115030A1 (en) 2006-03-31 2007-03-28 Crystalline chromium deposit

Publications (1)

Publication Number Publication Date
HK1127099A1 true HK1127099A1 (en) 2009-09-18

Family

ID=38325343

Family Applications (1)

Application Number Title Priority Date Filing Date
HK09106989.1A HK1127099A1 (en) 2006-03-31 2009-07-29 Crystalline chromium deposit

Country Status (11)

Country Link
US (2) US7887930B2 (xx)
EP (1) EP2010697B1 (xx)
JP (1) JP5050048B2 (xx)
KR (1) KR101367924B1 (xx)
CN (1) CN101410556B (xx)
BR (1) BRPI0710028B1 (xx)
CA (1) CA2647571C (xx)
ES (1) ES2669050T3 (xx)
HK (1) HK1127099A1 (xx)
TW (1) TWI435957B (xx)
WO (1) WO2007115030A1 (xx)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006035871B3 (de) * 2006-08-01 2008-03-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Abscheidung von Chromschichten als Hartverchromung, Galvanisierungsbad sowie hartverchromte Oberflächen und deren Verwendung
PL2217745T3 (pl) * 2007-10-02 2014-11-28 Atotech Deutschland Gmbh Krystaliczna powłoka ze stopu chromowego
US20090164012A1 (en) * 2007-12-21 2009-06-25 Howmedica Osteonics Corp. Medical implant component and method for fabricating same
DE102008024271A1 (de) * 2008-03-01 2009-09-10 Iss Innovative Solarsysteme Gmbh Verfahren zur Herstellung einer Chromschicht auf einem metallischen Träger
DE102008050034B4 (de) * 2008-10-01 2013-02-21 Voestalpine Stahl Gmbh Verfahren zum elektrolytischen Abscheiden von Chrom und Chromlegierungen
US10266957B2 (en) 2009-02-13 2019-04-23 Nissan Motor Co., Ltd. Chrome-plated part and manufacturing method of the same
US9765437B2 (en) * 2009-03-24 2017-09-19 Roderick D. Herdman Chromium alloy coating with enhanced resistance to corrosion in calcium chloride environments
FR2962450B1 (fr) * 2010-07-07 2014-10-31 Commissariat Energie Atomique Procede de preparation d'un materiau composite, materiau ainsi obtenu et ses utilisations
AT510422B1 (de) 2010-11-04 2012-04-15 Univ Wien Tech Verfahren zur abscheidung von hartchrom aus cr(vi)- freien elektrolyten
BR122019020336B1 (pt) 2011-05-03 2020-08-11 Atotech Deutschland Gmbh Banho de galvanização e método eletrodeposição de uma camada de cromo escuro em uma peça de trabalho
US9771661B2 (en) * 2012-02-06 2017-09-26 Honeywell International Inc. Methods for producing a high temperature oxidation resistant MCrAlX coating on superalloy substrates
US9758884B2 (en) 2012-02-16 2017-09-12 Stacey Hingley Color control of trivalent chromium deposits
US20130220819A1 (en) * 2012-02-27 2013-08-29 Faraday Technology, Inc. Electrodeposition of chromium from trivalent chromium using modulated electric fields
EP2899299A1 (en) * 2014-01-24 2015-07-29 COVENTYA S.p.A. Electroplating bath containing trivalent chromium and process for depositing chromium
US10087540B2 (en) 2015-02-17 2018-10-02 Honeywell International Inc. Surface modifiers for ionic liquid aluminum electroplating solutions, processes for electroplating aluminum therefrom, and methods for producing an aluminum coating using the same
CN107636206B (zh) * 2015-05-12 2019-09-17 日立汽车系统株式会社 镀铬零件的制造方法及镀铬装置
JP6295285B2 (ja) 2016-02-25 2018-03-14 株式会社豊田中央研究所 摺動システム
US11149851B2 (en) 2018-09-13 2021-10-19 Tenneco Inc. Piston ring with wear resistant coating
EP3665317B1 (en) * 2018-10-19 2020-12-09 ATOTECH Deutschland GmbH A method for electrolytically passivating a surface of silver, a silver alloy, gold, or a gold alloy
KR102012739B1 (ko) * 2018-10-31 2019-08-21 주식회사 에이엔씨코리아 3 가 크롬 도금액 및 이를 이용한 크랙프리 크롬도금공정
CN109371433B (zh) * 2018-10-31 2019-09-20 中国人民解放军陆军装甲兵学院 一种纳米晶三价铬复合镀层用镀液及复合镀层的制备方法
MX2021006934A (es) * 2018-12-11 2021-07-15 Atotech Deutschland Gmbh Metodo para la deposicion de una capa de cromo o de aleacion de cromo y un aparato de chapado.
CZ2021578A3 (cs) * 2019-06-26 2022-04-13 Hitachi Astemo, Ltd. Válcové zařízení, kovový kluzný komponent a způsob výroby kovového kluzného komponentu
FI129420B (en) * 2020-04-23 2022-02-15 Savroc Ltd AQUATIC ELECTRIC COATING BATH
EP4101947A1 (en) 2021-06-10 2022-12-14 Atotech Deutschland GmbH & Co. KG Method for electrodepositing a dark chromium layer, substrate comprising same, and electroplating bath thereof
EP4151779A1 (de) * 2021-09-15 2023-03-22 Trivalent Oberflächentechnik GmbH Chrom-indium-, chrom-bismut- und chrom-antimon-beschichtung, verfahren zur herstellung und verwendung
WO2024053668A1 (ja) * 2022-09-07 2024-03-14 日立Astemo株式会社 めっき部材およびその製造方法

Family Cites Families (75)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US900597A (en) 1908-01-16 1908-10-06 Franz Salzer Process for producing an electrolytic deposit of metallic chromium.
US1496845A (en) 1923-04-13 1924-06-10 Metal & Thermit Corp Process of producing pure chromium by electrolysis
US2470378A (en) 1944-06-07 1949-05-17 M M Warner Production of chromium ammonium chloride complexes
US2927066A (en) 1955-12-30 1960-03-01 Glenn R Schaer Chromium alloy plating
US2962428A (en) 1959-01-15 1960-11-29 Metal & Thermit Corp Process for chromium plating
BE652909A (xx) 1963-12-18 1964-12-31
FR1563847A (xx) 1968-01-30 1969-04-18
GB1378883A (en) 1971-02-23 1974-12-27 Albright & Wilson Electroplating
GB1368749A (en) 1971-09-30 1974-10-02 British Non Ferrous Metals Res Electrodeposition of chromium
US4054494A (en) 1973-12-13 1977-10-18 Albright & Wilson Ltd. Compositions for use in chromium plating
GB1455580A (en) 1973-12-13 1976-11-17 Albright & Wilson Electrodeposition of chromium
US4062737A (en) 1974-12-11 1977-12-13 International Business Machines Corporation Electrodeposition of chromium
US4054740A (en) * 1974-12-24 1977-10-18 Hoffmann-La Roche Inc. Hydroxybiotin
GB1558169A (en) 1975-07-03 1979-12-19 Albright & Wilson Chromium electroplating
US4161432A (en) 1975-12-03 1979-07-17 International Business Machines Corporation Electroplating chromium and its alloys
US4093521A (en) 1975-12-18 1978-06-06 Stanley Renton Chromium electroplating
DE2606852C2 (de) 1976-02-20 1977-09-15 Bauer, Wilhelm, Bauer, Hans, Dipl Chem, 3000 Hannover Bad zur galvanischen Direktverchromung von Kalanderwalzen
NL187439C (nl) 1976-08-06 1991-10-01 Montedison Spa Werkwijze voor het bereiden van fluorbevattende copolymeren, werkwijze voor het verknopen van copolymeren, membraan voor elektrolyse cel en werkwijze voor de bereiding van gefluoreerde alkenen.
JPS53106348A (en) 1977-02-28 1978-09-16 Toyo Soda Mfg Co Ltd Electrolytic bath for chromium plating
JPS53108042A (en) * 1977-02-28 1978-09-20 Toyo Soda Mfg Co Ltd Chromium electroplating bath
GB1552263A (en) * 1977-03-04 1979-09-12 Bnf Metals Tech Centre Trivalent chromium plating baths
US4167460A (en) 1978-04-03 1979-09-11 Oxy Metal Industries Corporation Trivalent chromium plating bath composition and process
GB2051861B (en) 1979-06-29 1983-03-09 Ibm Deposition of thick chromium films from trivalent chromium plating solutions
US4439285A (en) * 1980-11-10 1984-03-27 Omi International Corporation Trivalent chromium electrolyte and process employing neodymium reducing agent
US4477318A (en) 1980-11-10 1984-10-16 Omi International Corporation Trivalent chromium electrolyte and process employing metal ion reducing agents
GB2093861B (en) 1981-02-09 1984-08-22 Canning Materials W Ltd Bath for electrodeposition of chromium
WO1982003095A1 (en) 1981-03-09 1982-09-16 Battelle Development Corp High-rate chromium alloy plating
GB2109816B (en) 1981-11-18 1985-01-23 Ibm Electrodeposition of chromium
GB2109817B (en) 1981-11-18 1985-07-03 Ibm Electrodeposition of chromium
GB2110242B (en) 1981-11-18 1985-06-12 Ibm Electroplating chromium
GB2109815B (en) 1981-11-18 1985-09-04 Ibm Electrodepositing chromium
ATE33686T1 (de) 1982-02-09 1988-05-15 Ibm Elektrolytische abscheidung von chrom und seinen legierungen.
US4543167A (en) 1982-03-05 1985-09-24 M&T Chemicals Inc. Control of anode gas evolution in trivalent chromium plating bath
FR2529581A1 (fr) 1982-06-30 1984-01-06 Armines Bain d'electrolyse a base de chrome trivalent
US4450052A (en) 1982-07-28 1984-05-22 M&T Chemicals Inc. Zinc and nickel tolerant trivalent chromium plating baths
US4432843A (en) 1982-07-29 1984-02-21 Omi International Corporation Trivalent chromium electroplating baths and processes using thiazole addition agents
CA1244376A (en) 1983-05-12 1988-11-08 Thaddeus W. Tomaszewski Trivalent chromium electrolyte and process
US4461680A (en) 1983-12-30 1984-07-24 The United States Of America As Represented By The Secretary Of Commerce Process and bath for electroplating nickel-chromium alloys
GB8409073D0 (en) 1984-04-07 1984-05-16 Inter Metals & Minerals Sa Electrodeposition of chromium &c
JPS6156294A (ja) 1984-08-27 1986-03-20 Nippon Kokan Kk <Nkk> クロム合金メツキ浴
GB2171114A (en) 1985-02-06 1986-08-20 Canning W Materials Ltd Trivalent chromium electroplating baths and rejuvenation thereof
US4690735A (en) 1986-02-04 1987-09-01 University Of Florida Electrolytic bath compositions and method for electrodeposition of amorphous chromium
US4804446A (en) 1986-09-19 1989-02-14 The United States Of America As Represented By The Secretary Of Commerce Electrodeposition of chromium from a trivalent electrolyte
EP0285931B1 (en) 1987-03-31 1993-08-04 Nippon Steel Corporation Corrosion resistant plated steel strip and method for producing same
US4960735A (en) * 1988-11-03 1990-10-02 Kennametal Inc. Alumina-zirconia-silicon carbide-magnesia ceramics
US5770090A (en) 1989-07-28 1998-06-23 Lewis, Iii; Tom Method for recovery of heavy metal from waste water
JPH03255271A (ja) * 1990-03-06 1991-11-14 Teikoku Piston Ring Co Ltd ピストンリング
JPH03255270A (ja) * 1990-03-06 1991-11-14 Teikoku Piston Ring Co Ltd ピストンリング
US5269905A (en) 1990-04-30 1993-12-14 Elf Atochem North America, Inc. Apparatus and process to regenerate a trivalent chromium bath
ES2073649T3 (es) * 1990-11-17 1995-08-16 Nihon Nohyaku Co Ltd Derivados de hidrazona, procedimientos para su produccion, y usos de los mismos.
US5196109A (en) 1991-08-01 1993-03-23 Geoffrey Scott Trivalent chromium electrolytes and plating processes employing same
US5294326A (en) 1991-12-30 1994-03-15 Elf Atochem North America, Inc. Functional plating from solutions containing trivalent chromium ion
NO176157C (no) * 1992-03-24 2001-11-21 Geco As Fremgangsmåte og innretning til drift av utstyr anbragt i marine, seismiske slep
JPH05292300A (ja) 1992-04-16 1993-11-05 Canon Inc 画像形成装置
US5352266A (en) 1992-11-30 1994-10-04 Queen'university At Kingston Nanocrystalline metals and process of producing the same
US5433797A (en) 1992-11-30 1995-07-18 Queen's University Nanocrystalline metals
US5338433A (en) 1993-06-17 1994-08-16 Mcdonnell Douglas Corporation Chromium alloy electrodeposition and surface fixation of calcium phosphate ceramics
US5415763A (en) 1993-08-18 1995-05-16 The United States Of America As Represented By The Secretary Of Commerce Methods and electrolyte compositions for electrodepositing chromium coatings
ZA949293B (en) * 1993-12-08 1995-08-17 Nihon Nohyaku Co Ltd Hydrazine derivatives and uses thereof
CN1042753C (zh) * 1994-06-02 1999-03-31 北京科技大学 一种三价铬镀液
FR2726289B1 (fr) 1994-10-28 1997-03-28 Floquet Monopole Procede d'electrodeposition d'un revetement de chrome comportant des inclusions solides et bain mis en oeuvre dans ce procede
US5578167A (en) 1996-01-31 1996-11-26 Motorola, Inc. Substrate holder and method of use
US20010054557A1 (en) 1997-06-09 2001-12-27 E. Jennings Taylor Electroplating of metals using pulsed reverse current for control of hydrogen evolution
JP3918142B2 (ja) 1998-11-06 2007-05-23 株式会社日立製作所 クロムめっき部品、クロムめっき方法およびクロムめっき部品の製造方法
US6911068B2 (en) 2001-10-02 2005-06-28 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate
US6652731B2 (en) 2001-10-02 2003-11-25 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate
US6736954B2 (en) 2001-10-02 2004-05-18 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate
US6773573B2 (en) 2001-10-02 2004-08-10 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate
JP3332373B1 (ja) 2001-11-30 2002-10-07 ディップソール株式会社 亜鉛及び亜鉛合金めっき上に六価クロムフリー防錆皮膜を形成するための処理溶液、六価クロムフリー防錆皮膜及びその形成方法。
JP3332374B1 (ja) 2001-11-30 2002-10-07 ディップソール株式会社 亜鉛及び亜鉛合金めっき上に六価クロムフリー防錆皮膜を形成するための処理溶液、六価クロムフリー防錆皮膜及びその形成方法。
EP1467001A4 (en) * 2002-01-18 2007-02-21 Japan Science & Tech Agency METHOD FOR PRODUCING A COATING FILM FROM GALVANIZING Re OR Re-Cr ALLOYING
US7052592B2 (en) 2004-06-24 2006-05-30 Gueguine Yedigarian Chromium plating method
WO2008057123A1 (en) 2006-11-09 2008-05-15 Massachusetts Institute Of Technology Preparation and properties of cr-c-p hard coatings annealed at high temperature for high temperature applications
US20080169199A1 (en) 2007-01-17 2008-07-17 Chang Gung University Trivalent chromium electroplating solution and an electroplating process with the solution
PL2217745T3 (pl) 2007-10-02 2014-11-28 Atotech Deutschland Gmbh Krystaliczna powłoka ze stopu chromowego

Also Published As

Publication number Publication date
CA2647571A1 (en) 2007-10-11
ES2669050T3 (es) 2018-05-23
JP5050048B2 (ja) 2012-10-17
CN101410556B (zh) 2010-12-29
JP2009532580A (ja) 2009-09-10
BRPI0710028A2 (pt) 2011-08-02
KR20090017493A (ko) 2009-02-18
US20110132765A1 (en) 2011-06-09
TWI435957B (zh) 2014-05-01
BRPI0710028B1 (pt) 2018-02-14
WO2007115030A1 (en) 2007-10-11
EP2010697A1 (en) 2009-01-07
TW200806816A (en) 2008-02-01
US20070227895A1 (en) 2007-10-04
CA2647571C (en) 2015-02-17
EP2010697B1 (en) 2018-03-07
CN101410556A (zh) 2009-04-15
KR101367924B1 (ko) 2014-03-17
US7887930B2 (en) 2011-02-15

Similar Documents

Publication Publication Date Title
HK1127099A1 (en) Crystalline chromium deposit
PL2217745T3 (pl) Krystaliczna powłoka ze stopu chromowego
ZA201306383B (en) Crystalline anti-htnfalpha antibodies
HK1210689A1 (en) Intrauterine deposit
GB0707744D0 (en) No title
GB0613180D0 (en) Direct laser deposition
GB0714028D0 (en) No title
GB0708234D0 (en) No title
ZA200903614B (en) New crystalline forms
GB0608059D0 (en) No title
GB0621386D0 (en) Nickel substrates
GB0616962D0 (en) Pigeon Line
ZA200806859B (en) Novel crystalline compounds
GB0716413D0 (en) No title
GB0713478D0 (en) No title
GB0712015D0 (en) No title
GB0618082D0 (en) Growth factor
GB0718395D0 (en) No title
GB0613327D0 (en) Innovative deposition techniques
GB2454610B (en) Calendar
EG24146A (en) Auto-brake for not turning back
GB0519746D0 (en) Deposition
GB0611144D0 (en) Microbe inhibition
GB0713118D0 (en) Deposition process
PL378861A1 (pl) Bilonownica

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20150328