HK1111813A1 - - Google Patents

Info

Publication number
HK1111813A1
HK1111813A1 HK08106397.8A HK08106397A HK1111813A1 HK 1111813 A1 HK1111813 A1 HK 1111813A1 HK 08106397 A HK08106397 A HK 08106397A HK 1111813 A1 HK1111813 A1 HK 1111813A1
Authority
HK
Hong Kong
Application number
HK08106397.8A
Inventor
Yasuhiro Omura
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1111813A1 publication Critical patent/HK1111813A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/06—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of fluids in transparent cells
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids
HK08106397.8A 2005-05-12 2008-06-10 HK1111813A1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005139343 2005-05-12
PCT/JP2006/309253 WO2006121008A1 (ja) 2005-05-12 2006-05-08 投影光学系、露光装置、および露光方法

Publications (1)

Publication Number Publication Date
HK1111813A1 true HK1111813A1 (ko) 2008-08-15

Family

ID=37396517

Family Applications (1)

Application Number Title Priority Date Filing Date
HK08106397.8A HK1111813A1 (ko) 2005-05-12 2008-06-10

Country Status (7)

Country Link
US (1) US7936441B2 (ko)
EP (1) EP1881520A4 (ko)
JP (2) JP5055566B2 (ko)
KR (1) KR20080005428A (ko)
CN (1) CN100539020C (ko)
HK (1) HK1111813A1 (ko)
WO (1) WO2006121008A1 (ko)

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US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
CN1938646B (zh) 2004-01-20 2010-12-15 卡尔蔡司Smt股份公司 曝光装置和用于投影透镜的测量装置
KR101376931B1 (ko) 2004-05-17 2014-03-25 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
JP2007005777A (ja) * 2005-05-25 2007-01-11 Tokuyama Corp 液浸式露光装置のラストレンズ
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
US8027023B2 (en) 2006-05-19 2011-09-27 Carl Zeiss Smt Gmbh Optical imaging device and method for reducing dynamic fluctuations in pressure difference
DE102007062894A1 (de) 2007-01-23 2008-07-24 Carl Zeiss Smt Ag Projektionsobjektiv für die Lithographie
EP1998223A2 (de) 2007-01-23 2008-12-03 Carl Zeiss SMT AG Projektionsobjektiv für die Lithographie
NL1035757A1 (nl) 2007-08-02 2009-02-03 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
DE102009037077B3 (de) 2009-08-13 2011-02-17 Carl Zeiss Smt Ag Katadioptrisches Projektionsobjektiv
DE102011077784A1 (de) 2011-06-20 2012-12-20 Carl Zeiss Smt Gmbh Projektionsanordnung
US20140192337A1 (en) * 2011-08-30 2014-07-10 Asml Netherlands B.V. Lithographic apparatus, method of setting up a lithographic apparatus and device manufacturing method
JP6261357B2 (ja) * 2014-01-30 2018-01-17 オリンパス株式会社 顕微鏡および観察方法
JP2016001633A (ja) * 2014-06-11 2016-01-07 ソニー株式会社 固体撮像素子、および電子装置
DE102016205618A1 (de) 2016-04-05 2017-03-30 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Wellenfrontmanipulator, Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage
DE102016224400A1 (de) 2016-12-07 2018-06-07 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv und Verfahren zu seiner Herstellung
DE102017209440A1 (de) 2017-06-02 2018-12-06 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithografie

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JPS60230604A (ja) 1984-04-30 1985-11-16 Olympus Optical Co Ltd レンズ
JPS63141011A (ja) * 1986-12-03 1988-06-13 Minolta Camera Co Ltd レンズの保持装置
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
US5995304A (en) * 1997-07-02 1999-11-30 Fuji Photo Optical Co., Ltd. Plastic lens
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
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JP2001356263A (ja) * 2000-06-12 2001-12-26 Pioneer Electronic Corp 組み合わせ対物レンズ、光ピックアップ装置、光学式記録再生装置及び組み合わせ対物レンズ製造方法
US6829107B2 (en) * 2000-06-17 2004-12-07 Carl-Zeiss-Stiftung Device for mounting an optical element, for example a lens element in a lens
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AU2003289239A1 (en) * 2002-12-10 2004-06-30 Nikon Corporation Exposure system and device producing method
JP2004205698A (ja) 2002-12-24 2004-07-22 Nikon Corp 投影光学系、露光装置および露光方法
JP2005005395A (ja) * 2003-06-10 2005-01-06 Nikon Corp ガス給排気方法及び装置、鏡筒、露光装置及び方法
KR101209539B1 (ko) * 2003-07-09 2012-12-07 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101441844B1 (ko) * 2003-08-21 2014-09-17 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR101171809B1 (ko) * 2003-08-26 2012-08-13 가부시키가이샤 니콘 광학소자 및 노광장치
US8149381B2 (en) * 2003-08-26 2012-04-03 Nikon Corporation Optical element and exposure apparatus
SG144907A1 (en) * 2003-09-29 2008-08-28 Nikon Corp Liquid immersion type lens system, projection exposure apparatus, and device fabricating method
JP4470433B2 (ja) * 2003-10-02 2010-06-02 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US20050185269A1 (en) * 2003-12-19 2005-08-25 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
JP4577023B2 (ja) * 2004-03-15 2010-11-10 ソニー株式会社 ソリッドイマージョンレンズ、集光レンズ、光学ピックアップ装置、光記録再生装置及びソリッドイマージョンレンズの形成方法
US20070103661A1 (en) * 2004-06-04 2007-05-10 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP1768169B9 (en) 2004-06-04 2013-03-06 Nikon Corporation Exposure apparatus, exposure method, and device producing method
JP4655763B2 (ja) 2004-06-04 2011-03-23 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
JP2006114195A (ja) * 2004-09-14 2006-04-27 Sony Corp レンズ保持体とこれを用いた集光レンズ、光学ピックアップ装置及び光記録再生装置
JP2006114196A (ja) * 2004-09-14 2006-04-27 Sony Corp ソリッドイマージョンレンズとこれを用いた集光レンズ、光学ピックアップ装置、光記録再生装置及びソリッドイマージョンレンズの形成方法
JP2006128192A (ja) * 2004-10-26 2006-05-18 Nikon Corp 保持装置、鏡筒、及び露光装置、並びにデバイス製造方法
JP4980922B2 (ja) * 2004-11-18 2012-07-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置及びマイクロリソグラフィ投影露光装置の像面湾曲を修正するための方法
JP2006268741A (ja) 2005-03-25 2006-10-05 Nec Corp コンタクトセンターシステムおよびエージェント端末装置ならびにエージェントへの情報提供方法
WO2007132862A1 (ja) * 2006-05-16 2007-11-22 Nikon Corporation 投影光学系、露光方法、露光装置、及びデバイス製造方法
NL1035908A1 (nl) * 2007-09-25 2009-03-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.

Also Published As

Publication number Publication date
KR20080005428A (ko) 2008-01-11
JP5055566B2 (ja) 2012-10-24
EP1881520A4 (en) 2010-06-02
JP2012164991A (ja) 2012-08-30
US7936441B2 (en) 2011-05-03
CN101171667A (zh) 2008-04-30
EP1881520A1 (en) 2008-01-23
CN100539020C (zh) 2009-09-09
WO2006121008A1 (ja) 2006-11-16
US20090092925A1 (en) 2009-04-09
JPWO2006121008A1 (ja) 2008-12-18
JP5561563B2 (ja) 2014-07-30

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210508