HK1111773A1 - Pellicle and pellicle stripping device - Google Patents

Pellicle and pellicle stripping device

Info

Publication number
HK1111773A1
HK1111773A1 HK08102461.8A HK08102461A HK1111773A1 HK 1111773 A1 HK1111773 A1 HK 1111773A1 HK 08102461 A HK08102461 A HK 08102461A HK 1111773 A1 HK1111773 A1 HK 1111773A1
Authority
HK
Hong Kong
Prior art keywords
pellicle
stripping device
stripping
pellicle stripping
Prior art date
Application number
HK08102461.8A
Other languages
English (en)
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of HK1111773A1 publication Critical patent/HK1111773A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
HK08102461.8A 2006-05-15 2008-03-04 Pellicle and pellicle stripping device HK1111773A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006135185A JP4637053B2 (ja) 2006-05-15 2006-05-15 ペリクルおよびペリクル剥離装置

Publications (1)

Publication Number Publication Date
HK1111773A1 true HK1111773A1 (en) 2008-08-15

Family

ID=38838450

Family Applications (1)

Application Number Title Priority Date Filing Date
HK08102461.8A HK1111773A1 (en) 2006-05-15 2008-03-04 Pellicle and pellicle stripping device

Country Status (5)

Country Link
JP (1) JP4637053B2 (zh)
KR (1) KR101312478B1 (zh)
CN (1) CN101075088B (zh)
HK (1) HK1111773A1 (zh)
TW (1) TWI329238B (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5051840B2 (ja) * 2007-11-22 2012-10-17 信越化学工業株式会社 ペリクル収納容器内にペリクルを保管する方法
DE102007063383B4 (de) * 2007-12-18 2020-07-02 HAP Handhabungs-, Automatisierungs- und Präzisionstechnik GmbH Vorrichtung und Verfahren zur Entfernung von Pelliclen von Masken
JP2010261987A (ja) * 2009-04-30 2010-11-18 Shin-Etsu Chemical Co Ltd フォトマスク
JP4879308B2 (ja) * 2009-10-29 2012-02-22 信越化学工業株式会社 ペリクル剥離用冶具および剥離方法
JP2013195950A (ja) * 2012-03-22 2013-09-30 Toppan Printing Co Ltd ベルクル及びフォトマスク
JP5746662B2 (ja) * 2012-05-11 2015-07-08 信越化学工業株式会社 ペリクルフレーム
JP6304884B2 (ja) * 2014-09-22 2018-04-04 信越化学工業株式会社 ペリクルの貼り付け方法
JP6805495B2 (ja) * 2016-01-08 2020-12-23 大日本印刷株式会社 防塵体の剥離方法、防塵体の剥離装置
US11143952B2 (en) * 2017-09-28 2021-10-12 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle removal method
WO2019240166A1 (ja) * 2018-06-12 2019-12-19 三井化学株式会社 ペリクル用支持枠、ペリクル及びペリクル用支持枠の製造方法、並びにペリクルを用いた露光原版及び露光装置
JP7347789B2 (ja) * 2019-07-09 2023-09-20 三井化学株式会社 ペリクル枠体及びペリクル
JP7442291B2 (ja) * 2019-10-09 2024-03-04 信越化学工業株式会社 ペリクルとその専用ペリクルケースからなるアセンブリ
US20220365422A1 (en) * 2019-12-13 2022-11-17 Mitsui Chemicals, Inc. Pellicle demounting method and pellicle demounting preprocessing device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61169848A (ja) * 1985-01-23 1986-07-31 Oki Electric Ind Co Ltd マスク保護用ペリクルの剥離方法
US4828640A (en) * 1987-05-28 1989-05-09 Mitsui Petrochemical Industries, Ltd. Method of producing films using a peeling jig
JPH0190044U (zh) * 1987-12-07 1989-06-14
JP3408000B2 (ja) * 1994-11-28 2003-05-19 菱電セミコンダクタシステムエンジニアリング株式会社 ペリクル剥離方法
JP3331996B2 (ja) * 1998-12-25 2002-10-07 日本電気株式会社 ペリクル
KR100505283B1 (ko) * 2001-10-31 2005-08-03 미쓰이 가가쿠 가부시키가이샤 펠리클 및 펠리클 부착 마스크의 제조 방법
JP4101206B2 (ja) * 2003-05-23 2008-06-18 旭化成エレクトロニクス株式会社 大型ペリクルの支持装置および装着方法
JP2007292995A (ja) * 2006-04-25 2007-11-08 Matsushita Seiki Kk ペリクル用のハンドリング器具

Also Published As

Publication number Publication date
KR101312478B1 (ko) 2013-09-27
TWI329238B (en) 2010-08-21
KR20070110768A (ko) 2007-11-20
JP4637053B2 (ja) 2011-02-23
JP2007304491A (ja) 2007-11-22
CN101075088B (zh) 2010-06-02
CN101075088A (zh) 2007-11-21
TW200742938A (en) 2007-11-16

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210516