TW200742938A - Pellicle and pellicle stripping device - Google Patents

Pellicle and pellicle stripping device

Info

Publication number
TW200742938A
TW200742938A TW096117213A TW96117213A TW200742938A TW 200742938 A TW200742938 A TW 200742938A TW 096117213 A TW096117213 A TW 096117213A TW 96117213 A TW96117213 A TW 96117213A TW 200742938 A TW200742938 A TW 200742938A
Authority
TW
Taiwan
Prior art keywords
pellicle
photo mask
stripper
over
stripping device
Prior art date
Application number
TW096117213A
Other languages
Chinese (zh)
Other versions
TWI329238B (en
Inventor
Kazutoshi Sekihara
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of TW200742938A publication Critical patent/TW200742938A/en
Application granted granted Critical
Publication of TWI329238B publication Critical patent/TWI329238B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

This invention provides a pellicle frame that, after being stuck to a photo mask, can be easily stripped off, and a pellicle stripping device with which stuck to a photo mask can be stripped off without hurting the pellicle. A pellicle according to this invention has at least one side length over 300 mm. In a state wherein a pellicle frame 1 is stuck to a photo mask 2, there exists, between the pellicle frame 1 and the photo mask 2, a gap of over 2 mm in width, and over 0. 5 mm in height throughout over 80% of the whole area around the outer periphery of the pellicle frame 1. The pellicle stripping device of this invention includes a stripper 7 having a lower planar portion 15, and a lifter 12 for lifting the stripper 7 upwards in a state wherein the stripper 7 is maintained parallel with the photo mask 2. The pellicle may be separated from the photo mask 2 by inserting the lower planar portion 15 of the stripper 7 into the gap between the pellicle frame 1 and the photo mask 2.
TW096117213A 2006-05-15 2007-05-15 Pellicle and pellicle stripping device TWI329238B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006135185A JP4637053B2 (en) 2006-05-15 2006-05-15 Pellicle and pellicle peeling device

Publications (2)

Publication Number Publication Date
TW200742938A true TW200742938A (en) 2007-11-16
TWI329238B TWI329238B (en) 2010-08-21

Family

ID=38838450

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096117213A TWI329238B (en) 2006-05-15 2007-05-15 Pellicle and pellicle stripping device

Country Status (5)

Country Link
JP (1) JP4637053B2 (en)
KR (1) KR101312478B1 (en)
CN (1) CN101075088B (en)
HK (1) HK1111773A1 (en)
TW (1) TWI329238B (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5051840B2 (en) * 2007-11-22 2012-10-17 信越化学工業株式会社 Method for storing a pellicle in a pellicle storage container
DE102007063383B4 (en) * 2007-12-18 2020-07-02 HAP Handhabungs-, Automatisierungs- und Präzisionstechnik GmbH Device and method for removing pellicles from masks
JP2010261987A (en) * 2009-04-30 2010-11-18 Shin-Etsu Chemical Co Ltd Photomask
JP4879308B2 (en) * 2009-10-29 2012-02-22 信越化学工業株式会社 Pellicle stripping jig and stripping method
JP2013195950A (en) * 2012-03-22 2013-09-30 Toppan Printing Co Ltd Pellicle and photomask
JP5746662B2 (en) * 2012-05-11 2015-07-08 信越化学工業株式会社 Pellicle frame
JP6304884B2 (en) * 2014-09-22 2018-04-04 信越化学工業株式会社 Pellicle pasting method
JP6805495B2 (en) * 2016-01-08 2020-12-23 大日本印刷株式会社 Dustproof body peeling method, dustproof body peeling device
US11143952B2 (en) * 2017-09-28 2021-10-12 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle removal method
TWI787522B (en) * 2018-06-12 2022-12-21 日商三井化學股份有限公司 Support frame for pellicle, manufacturing method of pellicle and support frame for pellicle, exposure master plate using pellicle, and exposure apparatus
JP7347789B2 (en) * 2019-07-09 2023-09-20 三井化学株式会社 Pellicle frame and pellicle
JP7442291B2 (en) * 2019-10-09 2024-03-04 信越化学工業株式会社 Assembly consisting of a pellicle and its dedicated pellicle case
US20220365422A1 (en) * 2019-12-13 2022-11-17 Mitsui Chemicals, Inc. Pellicle demounting method and pellicle demounting preprocessing device
CN117561480A (en) * 2021-06-18 2024-02-13 恩特格里斯公司 Bonding layer on extreme ultraviolet light plate

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61169848A (en) * 1985-01-23 1986-07-31 Oki Electric Ind Co Ltd Separating method of pellicle for mask protection
US4828640A (en) * 1987-05-28 1989-05-09 Mitsui Petrochemical Industries, Ltd. Method of producing films using a peeling jig
JPH0190044U (en) * 1987-12-07 1989-06-14
JP3408000B2 (en) * 1994-11-28 2003-05-19 菱電セミコンダクタシステムエンジニアリング株式会社 Pellicle peeling method
JP3331996B2 (en) * 1998-12-25 2002-10-07 日本電気株式会社 Pellicle
KR100505283B1 (en) * 2001-10-31 2005-08-03 미쓰이 가가쿠 가부시키가이샤 Pellicle and method of manufacturing mask with pellicle
JP4101206B2 (en) * 2003-05-23 2008-06-18 旭化成エレクトロニクス株式会社 Large pellicle support device and mounting method
JP2007292995A (en) * 2006-04-25 2007-11-08 Matsushita Seiki Kk Handling instrument for pellicle

Also Published As

Publication number Publication date
KR101312478B1 (en) 2013-09-27
CN101075088A (en) 2007-11-21
TWI329238B (en) 2010-08-21
KR20070110768A (en) 2007-11-20
CN101075088B (en) 2010-06-02
HK1111773A1 (en) 2008-08-15
JP4637053B2 (en) 2011-02-23
JP2007304491A (en) 2007-11-22

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