HK1108060A1 - Method for manufacturing of silicon-based detectors having laser- microstructured surface layers having electron-donating constituents - Google Patents
Method for manufacturing of silicon-based detectors having laser- microstructured surface layers having electron-donating constituentsInfo
- Publication number
- HK1108060A1 HK1108060A1 HK07113542.9A HK07113542A HK1108060A1 HK 1108060 A1 HK1108060 A1 HK 1108060A1 HK 07113542 A HK07113542 A HK 07113542A HK 1108060 A1 HK1108060 A1 HK 1108060A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- electron
- donating
- silicon
- constituents
- laser
- Prior art date
Links
- 239000000470 constituent Substances 0.000 title abstract 3
- 239000002344 surface layer Substances 0.000 title abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 229910052710 silicon Inorganic materials 0.000 title abstract 2
- 239000010703 silicon Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 1
- 239000002800 charge carrier Substances 0.000 abstract 1
- 229910021419 crystalline silicon Inorganic materials 0.000 abstract 1
- -1 e.g. Substances 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 229910052717 sulfur Inorganic materials 0.000 abstract 1
- 239000011593 sulfur Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/028—Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic Table
- H01L31/0288—Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic Table characterised by the doping material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1864—Annealing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- High Energy & Nuclear Physics (AREA)
- Inorganic Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Light Receiving Elements (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Photovoltaic Devices (AREA)
- Recrystallisation Techniques (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Laser Beam Processing (AREA)
- Drying Of Semiconductors (AREA)
- Semiconductor Lasers (AREA)
- Lasers (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/950,230 US7057256B2 (en) | 2001-05-25 | 2004-09-24 | Silicon-based visible and near-infrared optoelectric devices |
US10/950,248 US7354792B2 (en) | 2001-05-25 | 2004-09-24 | Manufacture of silicon-based devices having disordered sulfur-doped surface layers |
PCT/US2005/034180 WO2006086014A2 (en) | 2004-09-24 | 2005-09-23 | Method for manufacturing of silicon-based detektors having laser-microstructured sulfur-doped surface layers |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1108060A1 true HK1108060A1 (en) | 2008-04-25 |
Family
ID=36607386
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK07113542.9A HK1108060A1 (en) | 2004-09-24 | 2007-12-12 | Method for manufacturing of silicon-based detectors having laser- microstructured surface layers having electron-donating constituents |
Country Status (6)
Country | Link |
---|---|
EP (2) | EP1794804B1 (de) |
JP (3) | JP2008515196A (de) |
AT (1) | ATE480009T1 (de) |
DE (1) | DE602005023323D1 (de) |
HK (1) | HK1108060A1 (de) |
WO (1) | WO2006086014A2 (de) |
Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7442629B2 (en) | 2004-09-24 | 2008-10-28 | President & Fellows Of Harvard College | Femtosecond laser-induced formation of submicrometer spikes on a semiconductor substrate |
US7057256B2 (en) | 2001-05-25 | 2006-06-06 | President & Fellows Of Harvard College | Silicon-based visible and near-infrared optoelectric devices |
ATE480009T1 (de) * | 2004-09-24 | 2010-09-15 | Harvard College | Verfahren zur herstellung von detektoren auf siliziumbasis mit lasermikrostrukturierten oberflächenschichten mit elektronendonatoren |
US8184284B2 (en) | 2005-06-14 | 2012-05-22 | Ebstein Steven M | Laser-processed substrate for molecular diagnostics |
WO2006138442A2 (en) | 2005-06-14 | 2006-12-28 | Ebstein Steven M | Applications of laser-processed substrate for molecular diagnostics |
US7715003B2 (en) | 2005-06-14 | 2010-05-11 | President & Fellows Of Harvard College | Metalized semiconductor substrates for raman spectroscopy |
US8294891B2 (en) | 2007-01-23 | 2012-10-23 | President And Fellows Of Harvard College | Non-invasive optical analysis using surface enhanced raman spectroscopy |
US7864312B2 (en) | 2007-07-30 | 2011-01-04 | President And Fellows Of Harvard College | Substrates for Raman spectroscopy having discontinuous metal coatings |
US8058615B2 (en) | 2008-02-29 | 2011-11-15 | Sionyx, Inc. | Wide spectral range hybrid image detector |
WO2010042121A1 (en) * | 2008-10-09 | 2010-04-15 | Sionyx Inc. | Method for contact formation in semiconductor device |
JP5185207B2 (ja) * | 2009-02-24 | 2013-04-17 | 浜松ホトニクス株式会社 | フォトダイオードアレイ |
JP5185206B2 (ja) * | 2009-02-24 | 2013-04-17 | 浜松ホトニクス株式会社 | 半導体光検出素子 |
JP5185205B2 (ja) | 2009-02-24 | 2013-04-17 | 浜松ホトニクス株式会社 | 半導体光検出素子 |
JP5185236B2 (ja) * | 2009-02-24 | 2013-04-17 | 浜松ホトニクス株式会社 | フォトダイオードの製造方法及びフォトダイオード |
JP2013065912A (ja) * | 2009-02-24 | 2013-04-11 | Hamamatsu Photonics Kk | フォトダイオードの製造方法及びフォトダイオード |
JP5185208B2 (ja) * | 2009-02-24 | 2013-04-17 | 浜松ホトニクス株式会社 | フォトダイオード及びフォトダイオードアレイ |
JP5805679B2 (ja) * | 2009-02-24 | 2015-11-04 | 浜松ホトニクス株式会社 | 半導体光検出素子 |
JP5185157B2 (ja) * | 2009-02-25 | 2013-04-17 | 浜松ホトニクス株式会社 | フォトダイオードの製造方法及びフォトダイオード |
JP5363222B2 (ja) * | 2009-07-13 | 2013-12-11 | 浜松ホトニクス株式会社 | 半導体光検出素子及び半導体光検出素子の製造方法 |
JP5261304B2 (ja) * | 2009-07-13 | 2013-08-14 | 浜松ホトニクス株式会社 | 半導体光検出素子及び半導体光検出素子の製造方法 |
US9911781B2 (en) | 2009-09-17 | 2018-03-06 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
US9673243B2 (en) | 2009-09-17 | 2017-06-06 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
JP5616099B2 (ja) * | 2010-04-01 | 2014-10-29 | 浜松ホトニクス株式会社 | 距離センサ及び距離画像センサ |
JP5726434B2 (ja) | 2010-04-14 | 2015-06-03 | 浜松ホトニクス株式会社 | 半導体光検出素子 |
US8692198B2 (en) | 2010-04-21 | 2014-04-08 | Sionyx, Inc. | Photosensitive imaging devices and associated methods |
US20120146172A1 (en) | 2010-06-18 | 2012-06-14 | Sionyx, Inc. | High Speed Photosensitive Devices and Associated Methods |
DE102010061831A1 (de) * | 2010-11-24 | 2012-05-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Halbleiterbauelement und Verfahren zu seiner Herstellung |
CN102169810B (zh) * | 2010-12-27 | 2013-07-03 | 清华大学 | 一种使用真空腔的激光处理装置和处理方法 |
US9496308B2 (en) | 2011-06-09 | 2016-11-15 | Sionyx, Llc | Process module for increasing the response of backside illuminated photosensitive imagers and associated methods |
JP2014525091A (ja) | 2011-07-13 | 2014-09-25 | サイオニクス、インク. | 生体撮像装置および関連方法 |
US8865507B2 (en) | 2011-09-16 | 2014-10-21 | Sionyx, Inc. | Integrated visible and infrared imager devices and associated methods |
CN102400227B (zh) * | 2011-11-22 | 2013-03-13 | 深圳光启高等理工研究院 | 一种绒面黑硅材料的制备方法 |
US9064764B2 (en) | 2012-03-22 | 2015-06-23 | Sionyx, Inc. | Pixel isolation elements, devices, and associated methods |
JP5829223B2 (ja) * | 2013-01-17 | 2015-12-09 | 浜松ホトニクス株式会社 | フォトダイオードの製造方法及びフォトダイオード |
JP6466346B2 (ja) | 2013-02-15 | 2019-02-06 | サイオニクス、エルエルシー | アンチブルーミング特性を有するハイダイナミックレンジcmos画像センサおよび関連づけられた方法 |
WO2014151093A1 (en) | 2013-03-15 | 2014-09-25 | Sionyx, Inc. | Three dimensional imaging utilizing stacked imager devices and associated methods |
US9209345B2 (en) | 2013-06-29 | 2015-12-08 | Sionyx, Inc. | Shallow trench textured regions and associated methods |
CN103794563B (zh) * | 2014-02-19 | 2017-06-06 | 金蔚 | 一种增强硅基成像器件ccd或者cmos器件红外响应的方法 |
CN104505432A (zh) * | 2014-12-16 | 2015-04-08 | 中国科学院长春光学精密机械与物理研究所 | 降低黑硅材料在红外波段吸收退化的方法 |
CN109421402B (zh) * | 2017-08-29 | 2020-09-22 | 武汉大学 | 一种高导电石墨烯薄膜阵列的激光雕刻制备方法 |
TR201819952A2 (tr) * | 2018-12-20 | 2020-07-21 | Hacettepe Ueniversitesi | Geni̇ş bant araliğinda çalişan bi̇r yarii̇letken fotodi̇yot ve elde etme yöntemi̇ |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4703996A (en) * | 1984-08-24 | 1987-11-03 | American Telephone And Telegraph Company, At&T Bell Laboratories | Integrated optical device having integral photodetector |
US5714404A (en) * | 1993-11-18 | 1998-02-03 | Regents Of The University Of California | Fabrication of polycrystalline thin films by pulsed laser processing |
US7390689B2 (en) * | 2001-05-25 | 2008-06-24 | President And Fellows Of Harvard College | Systems and methods for light absorption and field emission using microstructured silicon |
ATE480009T1 (de) * | 2004-09-24 | 2010-09-15 | Harvard College | Verfahren zur herstellung von detektoren auf siliziumbasis mit lasermikrostrukturierten oberflächenschichten mit elektronendonatoren |
-
2005
- 2005-09-23 AT AT05856921T patent/ATE480009T1/de not_active IP Right Cessation
- 2005-09-23 EP EP05856921A patent/EP1794804B1/de active Active
- 2005-09-23 EP EP09015646A patent/EP2164107A3/de not_active Withdrawn
- 2005-09-23 JP JP2007533655A patent/JP2008515196A/ja active Pending
- 2005-09-23 WO PCT/US2005/034180 patent/WO2006086014A2/en active Application Filing
- 2005-09-23 DE DE602005023323T patent/DE602005023323D1/de active Active
-
2007
- 2007-12-12 HK HK07113542.9A patent/HK1108060A1/xx unknown
-
2011
- 2011-12-28 JP JP2011289259A patent/JP2012064987A/ja active Pending
-
2014
- 2014-06-17 JP JP2014124603A patent/JP5899271B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
ATE480009T1 (de) | 2010-09-15 |
JP5899271B2 (ja) | 2016-04-06 |
JP2012064987A (ja) | 2012-03-29 |
DE602005023323D1 (de) | 2010-10-14 |
WO2006086014A3 (en) | 2006-09-28 |
JP2008515196A (ja) | 2008-05-08 |
WO2006086014A2 (en) | 2006-08-17 |
JP2014199940A (ja) | 2014-10-23 |
EP1794804A2 (de) | 2007-06-13 |
EP1794804B1 (de) | 2010-09-01 |
EP2164107A3 (de) | 2010-09-15 |
EP2164107A2 (de) | 2010-03-17 |
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