HK1026068A1 - A method of manufacturing a hetero-bipolar transistor and a laser diode ion the same substrate - Google Patents

A method of manufacturing a hetero-bipolar transistor and a laser diode ion the same substrate

Info

Publication number
HK1026068A1
HK1026068A1 HK00105329A HK00105329A HK1026068A1 HK 1026068 A1 HK1026068 A1 HK 1026068A1 HK 00105329 A HK00105329 A HK 00105329A HK 00105329 A HK00105329 A HK 00105329A HK 1026068 A1 HK1026068 A1 HK 1026068A1
Authority
HK
Hong Kong
Prior art keywords
hetero
manufacturing
laser diode
bipolar transistor
same substrate
Prior art date
Application number
HK00105329A
Other languages
English (en)
Inventor
Patrik Evaldsson
Urban Eriksson
Original Assignee
Ericsson Telefon Ab L M
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ericsson Telefon Ab L M filed Critical Ericsson Telefon Ab L M
Publication of HK1026068A1 publication Critical patent/HK1026068A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/8252—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using III-V technology
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • H01S5/0261—Non-optical elements, e.g. laser driver components, heaters

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Semiconductor Lasers (AREA)
HK00105329A 1997-02-07 2000-08-24 A method of manufacturing a hetero-bipolar transistor and a laser diode ion the same substrate HK1026068A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE9700432A SE511314C2 (sv) 1997-02-07 1997-02-07 Framställning av heterobipolär transistor och laserdiod på samma substrat
PCT/SE1998/000210 WO1998035378A1 (en) 1997-02-07 1998-02-06 Manufacturing a heterobipolar transistor and a laser diode on the same substrate

Publications (1)

Publication Number Publication Date
HK1026068A1 true HK1026068A1 (en) 2000-12-01

Family

ID=20405713

Family Applications (1)

Application Number Title Priority Date Filing Date
HK00105329A HK1026068A1 (en) 1997-02-07 2000-08-24 A method of manufacturing a hetero-bipolar transistor and a laser diode ion the same substrate

Country Status (12)

Country Link
US (1) US6335255B1 (sv)
EP (1) EP0972301B1 (sv)
JP (1) JP2001511948A (sv)
KR (1) KR100386928B1 (sv)
CN (1) CN1120522C (sv)
AU (1) AU6010598A (sv)
CA (1) CA2280024A1 (sv)
DE (1) DE69838288T2 (sv)
HK (1) HK1026068A1 (sv)
SE (1) SE511314C2 (sv)
TW (1) TW437109B (sv)
WO (1) WO1998035378A1 (sv)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7247892B2 (en) * 2000-04-24 2007-07-24 Taylor Geoff W Imaging array utilizing thyristor-based pixel elements
JP2002057405A (ja) * 2000-08-07 2002-02-22 Mitsubishi Electric Corp 半導体レーザ装置及びその製造方法
US6525348B1 (en) * 2001-07-17 2003-02-25 David C. Scott Two terminal edge illuminated epilayer waveguide phototransistor
US6531721B1 (en) * 2001-12-27 2003-03-11 Skyworks Solutions, Inc. Structure for a heterojunction bipolar transistor
US20040161006A1 (en) * 2003-02-18 2004-08-19 Ying-Lan Chang Method and apparatus for improving wavelength stability for InGaAsN devices
WO2005020287A2 (en) * 2003-08-22 2005-03-03 The Board Of Trustees Of The University Of Illinois Semiconductor device and method
US7446926B2 (en) 2004-09-27 2008-11-04 Idc, Llc System and method of providing a regenerating protective coating in a MEMS device
US7471855B2 (en) * 2005-07-13 2008-12-30 Alcatel-Lucent Usa Inc. Monlithically coupled waveguide and phototransistor
US8260151B2 (en) 2008-04-18 2012-09-04 Freescale Semiconductor, Inc. Optical communication integration
US8592745B2 (en) * 2009-08-19 2013-11-26 Luxtera Inc. Method and system for optoelectronic receivers utilizing waveguide heterojunction phototransistors integrated in a CMOS SOI wafer
JP2011199031A (ja) * 2010-03-19 2011-10-06 Denso Corp 半導体装置及び半導体装置の製造方法
CN104485578B (zh) * 2014-12-11 2017-05-10 中国科学院半导体研究所 一种晶体管激光器及其制作方法
US10134881B1 (en) * 2017-05-18 2018-11-20 Qualcomm Incorporated Quantum well thermal sensing for power amplifier
DE102018124576A1 (de) * 2018-10-05 2020-04-09 Osram Opto Semiconductors Gmbh Verfahren zur herstellung eines halbleiterbauelements mit durchführung einer plasmabehandlung und halbleiterbauelement
US11271566B2 (en) * 2018-12-14 2022-03-08 Integrated Device Technology, Inc. Digital logic compatible inputs in compound semiconductor circuits
CN110459953A (zh) * 2019-07-03 2019-11-15 潘瑶麟 一种实验室用单片集成互注入型侧节精调半导体激光器
CN111416274B (zh) * 2020-02-27 2021-07-02 电子科技大学 一种反馈式多极型量子级联环形激光器
CN113130478A (zh) * 2021-04-13 2021-07-16 厦门市三安集成电路有限公司 一种射频芯片及制备方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6373688A (ja) * 1986-09-17 1988-04-04 Mitsubishi Electric Corp 半導体発光装置
JPH01143285A (ja) * 1987-11-28 1989-06-05 Mitsubishi Electric Corp 半導体超格子の無秩序化方法及び半導体レーザ装置
US5164797A (en) * 1988-06-17 1992-11-17 Xerox Corporation Lateral heterojunction bipolar transistor (LHBT) and suitability thereof as a hetero transverse junction (HTJ) laser
FR2635611B1 (fr) * 1988-08-18 1990-10-19 Centre Nat Rech Scient Procede de neutralisation des atomes accepteurs dans inp de type p
US5106764A (en) * 1989-04-10 1992-04-21 At&T Bell Laboratories Device fabrication
JP2566661B2 (ja) * 1990-04-18 1996-12-25 三菱電機株式会社 不純物拡散方法
KR940005454B1 (ko) * 1991-04-03 1994-06-18 삼성전자 주식회사 화합물반도체장치
US5202896A (en) * 1991-07-16 1993-04-13 The United States Of America As Represented By The Secretary Of The Air Force Bipolar inversion channel field effect transistor laser
US5239550A (en) * 1991-12-03 1993-08-24 University Of Connecticut Transistor lasers
US5283447A (en) * 1992-01-21 1994-02-01 Bandgap Technology Corporation Integration of transistors with vertical cavity surface emitting lasers
US5266794A (en) * 1992-01-21 1993-11-30 Bandgap Technology Corporation Vertical-cavity surface emitting laser optical interconnect technology
JPH0645633A (ja) * 1992-07-22 1994-02-18 Nec Corp 半導体光スイッチとその駆動方法

Also Published As

Publication number Publication date
US6335255B1 (en) 2002-01-01
DE69838288T2 (de) 2008-05-15
SE9700432D0 (sv) 1997-02-07
CN1246962A (zh) 2000-03-08
WO1998035378A1 (en) 1998-08-13
AU6010598A (en) 1998-08-26
DE69838288D1 (de) 2007-10-04
KR20000070895A (ko) 2000-11-25
SE9700432L (sv) 1998-08-08
JP2001511948A (ja) 2001-08-14
CA2280024A1 (en) 1998-08-13
TW437109B (en) 2001-05-28
EP0972301A1 (en) 2000-01-19
CN1120522C (zh) 2003-09-03
SE511314C2 (sv) 1999-09-06
KR100386928B1 (ko) 2003-06-09
EP0972301B1 (en) 2007-08-22

Similar Documents

Publication Publication Date Title
HK1026068A1 (en) A method of manufacturing a hetero-bipolar transistor and a laser diode ion the same substrate
AU5969998A (en) Semiconductor substrate and method of manufacturing the same
AU8531498A (en) Assembly consisting of a substrate for power components and a cooling element and method for the production thereof
EP0862208A3 (en) Semiconductor device and method of manufacturing the same
GB2292831B (en) Semiconductor laser diode and manufacturing method therefor
HK1026064A1 (en) A field effect transistor and a method for manufacturing the same
AU3001499A (en) Electroluminescent device and method of manufacturing same
HK1041863A1 (en) A wafer carrier having a low tolerance build-up and a method of assembling the same
DE69635410D1 (de) Halbleiterlaser und dessen herstellungsverfahren
AU4726397A (en) Semiconductor device and method for manufacturing the same
GB9310004D0 (en) Semiconductor laser and method for manufacturing semiconductor laser
DE69517614T2 (de) Halbleiterdiodenlaser und dessen Herstellungsverfahren
EP0792955A3 (en) Sapphire single crystal, semiconductor laser diode using the same for substrate, and method for manufacturing the same
AU7548596A (en) Method of manufacturing a semiconductor surface emitting laser
GB9924488D0 (en) Semiconductor device having a plurality of mosfets on substrate and method of manufacturing the same
EP0738004A4 (en) METHOD AND DEVICE FOR MANUFACTURING A SEMICONDUCTOR SUBSTRATE
AU6196598A (en) Plastic-encapsulated semiconductor device and fabrication method thereof
EP1052687A4 (en) SOI SUBSTRATE AND RELATED MANUFACTURING PROCESS
AU1183999A (en) Semiconductor component and manufacturing method for semiconductor component
EP1120819A4 (en) SOI SUBSTRATE AND METHOD FOR MANUFACTURING SAME
EP0612128A3 (en) Semiconductor laser and manufacturing process.
AU6748998A (en) Process for manufacturing semiconductor device and semiconductor component
AU4032197A (en) Semiconductor device and method for manufacturing the same
GB2309121B (en) Semiconductor diode and fabrication method for semiconductor diode
EP0977235A4 (en) ELECTRON-EMITTING DEVICE AND MANUFACTURING METHOD THEREOF

Legal Events

Date Code Title Description
PF Patent in force
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20160206