GB939275A - Device for producing thin metal layers by ion neutralization - Google Patents

Device for producing thin metal layers by ion neutralization

Info

Publication number
GB939275A
GB939275A GB2439661A GB2439661A GB939275A GB 939275 A GB939275 A GB 939275A GB 2439661 A GB2439661 A GB 2439661A GB 2439661 A GB2439661 A GB 2439661A GB 939275 A GB939275 A GB 939275A
Authority
GB
United Kingdom
Prior art keywords
cathode
thin metal
ions
metal layers
july
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2439661A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Czech Academy of Sciences CAS
Original Assignee
Czech Academy of Sciences CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Czech Academy of Sciences CAS filed Critical Czech Academy of Sciences CAS
Publication of GB939275A publication Critical patent/GB939275A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

939,275. Vapour deposition of metals. CESKOSLOVENSKA AKADEMIE VED. July 6, 1961 [July 8, 1960], No. 24396/61. Class 82. [Also in Group XL (a)] A thin metal layer is formed on the body 7 by ions produced in a plasma within a cylindrical hollow cathode 4 from particles released by sputtering from the cathode surface. The plasma is formed by an electric discharge set up in a gaseous atmosphere, e.g. hydrogen or an inert gas at a pressure of the order 10-2 mm. Hg., between the cathode and an anode 2. The energy of the ions bombarding the body 7 is controlled by a grid 6 which is spaced from the body 7 a distance less than, or comparable with, the mean free path of the ions. Screening 3, 9, 8 is provided for the cathode 4 and the body 7.
GB2439661A 1960-07-08 1961-07-06 Device for producing thin metal layers by ion neutralization Expired GB939275A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CS438860 1960-07-08

Publications (1)

Publication Number Publication Date
GB939275A true GB939275A (en) 1963-10-09

Family

ID=5386503

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2439661A Expired GB939275A (en) 1960-07-08 1961-07-06 Device for producing thin metal layers by ion neutralization

Country Status (4)

Country Link
DE (1) DE1142262B (en)
FR (1) FR1294562A (en)
GB (1) GB939275A (en)
NL (2) NL266760A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3314873A (en) * 1962-11-28 1967-04-18 Western Electric Co Method and apparatus for cathode sputtering using a cylindrical cathode
US3318790A (en) * 1964-04-29 1967-05-09 Texas Instruments Inc Production of thin organic polymer by screened glow discharge
US3344055A (en) * 1964-04-29 1967-09-26 Texas Instruments Inc Apparatus for polymerizing and forming thin continuous films using a glow discharge
US3351543A (en) * 1964-05-28 1967-11-07 Gen Electric Process of coating diamond with an adherent metal coating using cathode sputtering
US3361659A (en) * 1967-08-14 1968-01-02 Ibm Process of depositing thin films by cathode sputtering using a controlled grid
US3507774A (en) * 1967-06-02 1970-04-21 Nat Res Corp Low energy sputtering apparatus for operation below one micron pressure
US3526584A (en) * 1964-09-25 1970-09-01 Western Electric Co Method of providing a field free region above a substrate during sputter-depositing thereon
US3530055A (en) * 1968-08-26 1970-09-22 Ibm Formation of layers of solids on substrates
US4116794A (en) * 1974-12-23 1978-09-26 Telic Corporation Glow discharge method and apparatus

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1039691A (en) * 1964-03-17 1966-08-17 Gen Precision Inc Vacuum coating and ion bombardment apparatus
US3325393A (en) * 1964-05-28 1967-06-13 Gen Electric Electrical discharge cleaning and coating process
JPS6040507B2 (en) * 1978-07-08 1985-09-11 テルマク・アンラ−ゲンバウ・アクチエンゲゼルシャフト Method for laminating a metal layer or alloy layer on a dielectric workpiece material and apparatus for carrying out this method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3314873A (en) * 1962-11-28 1967-04-18 Western Electric Co Method and apparatus for cathode sputtering using a cylindrical cathode
US3318790A (en) * 1964-04-29 1967-05-09 Texas Instruments Inc Production of thin organic polymer by screened glow discharge
US3344055A (en) * 1964-04-29 1967-09-26 Texas Instruments Inc Apparatus for polymerizing and forming thin continuous films using a glow discharge
US3351543A (en) * 1964-05-28 1967-11-07 Gen Electric Process of coating diamond with an adherent metal coating using cathode sputtering
US3526584A (en) * 1964-09-25 1970-09-01 Western Electric Co Method of providing a field free region above a substrate during sputter-depositing thereon
US3507774A (en) * 1967-06-02 1970-04-21 Nat Res Corp Low energy sputtering apparatus for operation below one micron pressure
US3361659A (en) * 1967-08-14 1968-01-02 Ibm Process of depositing thin films by cathode sputtering using a controlled grid
US3530055A (en) * 1968-08-26 1970-09-22 Ibm Formation of layers of solids on substrates
US4116794A (en) * 1974-12-23 1978-09-26 Telic Corporation Glow discharge method and apparatus

Also Published As

Publication number Publication date
NL266760A (en)
FR1294562A (en) 1962-05-26
NL124459C (en)
DE1142262B (en) 1963-01-10

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