FR1294562A - Process and device for the formation of surface metal layers by ion neutralization and products conforming to those thus obtained - Google Patents

Process and device for the formation of surface metal layers by ion neutralization and products conforming to those thus obtained

Info

Publication number
FR1294562A
FR1294562A FR867429A FR867429A FR1294562A FR 1294562 A FR1294562 A FR 1294562A FR 867429 A FR867429 A FR 867429A FR 867429 A FR867429 A FR 867429A FR 1294562 A FR1294562 A FR 1294562A
Authority
FR
France
Prior art keywords
formation
those
metal layers
surface metal
ion neutralization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR867429A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Czech Academy of Sciences CAS
Original Assignee
Czech Academy of Sciences CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Czech Academy of Sciences CAS filed Critical Czech Academy of Sciences CAS
Application granted granted Critical
Publication of FR1294562A publication Critical patent/FR1294562A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electron Sources, Ion Sources (AREA)
FR867429A 1960-07-08 1961-07-08 Process and device for the formation of surface metal layers by ion neutralization and products conforming to those thus obtained Expired FR1294562A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CS438860 1960-07-08

Publications (1)

Publication Number Publication Date
FR1294562A true FR1294562A (en) 1962-05-26

Family

ID=5386503

Family Applications (1)

Application Number Title Priority Date Filing Date
FR867429A Expired FR1294562A (en) 1960-07-08 1961-07-08 Process and device for the formation of surface metal layers by ion neutralization and products conforming to those thus obtained

Country Status (4)

Country Link
DE (1) DE1142262B (en)
FR (1) FR1294562A (en)
GB (1) GB939275A (en)
NL (2) NL124459C (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3325393A (en) * 1964-05-28 1967-06-13 Gen Electric Electrical discharge cleaning and coating process
US3351543A (en) * 1964-05-28 1967-11-07 Gen Electric Process of coating diamond with an adherent metal coating using cathode sputtering
DE1279425B (en) * 1964-03-17 1968-10-03 Gen Precision Inc Device for ion bombardment and for vacuum vapor deposition of surfaces
US3526584A (en) * 1964-09-25 1970-09-01 Western Electric Co Method of providing a field free region above a substrate during sputter-depositing thereon
EP0008634A1 (en) * 1978-07-08 1980-03-19 Wolfgang Kieferle Method and apparatus for depositing a layer of a metal or an alloy on an electrically conductive workpiece

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3314873A (en) * 1962-11-28 1967-04-18 Western Electric Co Method and apparatus for cathode sputtering using a cylindrical cathode
US3318790A (en) * 1964-04-29 1967-05-09 Texas Instruments Inc Production of thin organic polymer by screened glow discharge
US3344055A (en) * 1964-04-29 1967-09-26 Texas Instruments Inc Apparatus for polymerizing and forming thin continuous films using a glow discharge
US3507774A (en) * 1967-06-02 1970-04-21 Nat Res Corp Low energy sputtering apparatus for operation below one micron pressure
US3361659A (en) * 1967-08-14 1968-01-02 Ibm Process of depositing thin films by cathode sputtering using a controlled grid
US3530055A (en) * 1968-08-26 1970-09-22 Ibm Formation of layers of solids on substrates
US4132613A (en) * 1974-12-23 1979-01-02 Telic Corporation Glow discharge method and apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1279425B (en) * 1964-03-17 1968-10-03 Gen Precision Inc Device for ion bombardment and for vacuum vapor deposition of surfaces
US3325393A (en) * 1964-05-28 1967-06-13 Gen Electric Electrical discharge cleaning and coating process
US3351543A (en) * 1964-05-28 1967-11-07 Gen Electric Process of coating diamond with an adherent metal coating using cathode sputtering
US3526584A (en) * 1964-09-25 1970-09-01 Western Electric Co Method of providing a field free region above a substrate during sputter-depositing thereon
EP0008634A1 (en) * 1978-07-08 1980-03-19 Wolfgang Kieferle Method and apparatus for depositing a layer of a metal or an alloy on an electrically conductive workpiece

Also Published As

Publication number Publication date
NL124459C (en)
NL266760A (en)
DE1142262B (en) 1963-01-10
GB939275A (en) 1963-10-09

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