GB928011A - Improvements in and relating to baths - Google Patents
Improvements in and relating to bathsInfo
- Publication number
- GB928011A GB928011A GB46401/61A GB4640161A GB928011A GB 928011 A GB928011 A GB 928011A GB 46401/61 A GB46401/61 A GB 46401/61A GB 4640161 A GB4640161 A GB 4640161A GB 928011 A GB928011 A GB 928011A
- Authority
- GB
- United Kingdom
- Prior art keywords
- radical
- radicals
- acid
- sulphonic acid
- thiourea
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- -1 thiourea radical Chemical class 0.000 abstract 21
- UMGDCJDMYOKAJW-UHFFFAOYSA-N aminothiocarboxamide Natural products NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 abstract 7
- 150000003839 salts Chemical class 0.000 abstract 7
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 abstract 6
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 abstract 6
- 239000002253 acid Substances 0.000 abstract 4
- 238000009713 electroplating Methods 0.000 abstract 4
- 150000003254 radicals Chemical class 0.000 abstract 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- 239000004215 Carbon black (E152) Substances 0.000 abstract 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 abstract 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 abstract 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 2
- DKVNPHBNOWQYFE-UHFFFAOYSA-N carbamodithioic acid Chemical group NC(S)=S DKVNPHBNOWQYFE-UHFFFAOYSA-N 0.000 abstract 2
- 125000000623 heterocyclic group Chemical group 0.000 abstract 2
- 229930195733 hydrocarbon Natural products 0.000 abstract 2
- 229910052751 metal Inorganic materials 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 abstract 2
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 abstract 1
- 239000005977 Ethylene Substances 0.000 abstract 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 abstract 1
- 239000005864 Sulphur Substances 0.000 abstract 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract 1
- 150000007513 acids Chemical class 0.000 abstract 1
- 125000002015 acyclic group Chemical group 0.000 abstract 1
- 238000007792 addition Methods 0.000 abstract 1
- 150000005840 aryl radicals Chemical class 0.000 abstract 1
- 229910052793 cadmium Inorganic materials 0.000 abstract 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 125000004122 cyclic group Chemical group 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 125000005842 heteroatom Chemical group 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229910021645 metal ion Chemical group 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- HZVOZRGWRWCICA-UHFFFAOYSA-N methanediyl Chemical compound [CH2] HZVOZRGWRWCICA-UHFFFAOYSA-N 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 125000004193 piperazinyl group Chemical group 0.000 abstract 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 abstract 1
- 229910001415 sodium ion Inorganic materials 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 239000011701 zinc Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
- C07D295/20—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carbonic acid, or sulfur or nitrogen analogues thereof
- C07D295/21—Radicals derived from sulfur analogues of carbonic acid
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D233/28—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D233/30—Oxygen or sulfur atoms
- C07D233/42—Sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/08—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
928,011. Additions to acid electroplating solutions. DEHYDAG DEUTSCHE BYDRIERWERKE G.m.b.H. Dec. 28, 1961 [Feb. 2, 1961], No. 46401/61. Class 41. Acid baths for the production of electrolytic metal coatings contain lustring and levelling agents in the form of an organic sulphonic acid or a salt thereof which possesses at least one thiourea radical and at least one dithiocarbamic acid radical in the molecule. The invention is particularly applicable to copper and zinc electroplating baths but can also be applied to electrolytic baths which contain salts of the metals lead, tin, cadmium or mixtures thereof. The dithiocarbamic acid radical of the sulphonic acid or salt thereof has the formula where R and R 1 are hydrogen atoms or hydrocarbon radicals. Such radicals are substituted or unsubstituted cyclo-alkyl radicals or alkyl radicals which radicals together with the nitrogen atom may form a heterocyclic ring such as morpholine or piperazine ring. The thiourea radical of the sulphonic acid or salt thereof has the formula wherein R 2 or R 3 represent hydrogen atoms, or substituted or unsubstituted alkyl radicals or cycloalkyl radicals, or substituted or unsubstituted aryl radicals, or dithiocarbamic acid radicals linked via an acyclic or cyclic intermediate radical. The sulphonic acid radical of the organic sulphonic acid or salt thereof is an alkyl sulphonic acid or salt radical linked via the sulphur atom of the thiourea radical and has the formula -R 4 -SO 3 X wherein R 4 is an alkyl radical having from 1 to 4 carbon atoms and X is a hydrogen atom or a metal ion, preferably a sodium ion. As an example, sulphonic acids or their salts can be used in the acid electroplating baths in which the dithiocarbamic acid group is linked with the part of the molecule containing the thiourea and the sulphonic acid residues via an ester linkage-see compound 4 of the Complete Specification. The linkage between the dithiocarbamic acid radical and the thiourea radical is formed from a methylene radical but may also be effected by other radicals e.g. an ethylene or propylene radical or by any other short chain hydrocarbon radical which, if desired, may be substituted or interrupted by hetero-atoms or with inclusion of the two nitrogen atoms may be closed to give a heterocyclic ring e.g. piperazine. The alkyl sulphonic acid radicals are linked in the molecule via sulphur or nitrogen and are preferably introduced in the dithiocarbamic acid and/or thiourea radicals. The sulphonic acid or salts thereof are added to the electroplating baths in amounts from 50 mg. to 5 gms. per litre, preferably in amounts from 100 to 500 mg. per litre of bath liquid.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DED35328A DE1146322B (en) | 1961-02-02 | 1961-02-02 | Acid galvanic metal baths |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB928011A true GB928011A (en) | 1963-06-06 |
Family
ID=7042588
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB46401/61A Expired GB928011A (en) | 1961-02-02 | 1961-12-28 | Improvements in and relating to baths |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3203878A (en) |
| BE (1) | BE613365A (en) |
| CH (1) | CH427447A (en) |
| DE (1) | DE1146322B (en) |
| DK (1) | DK103053C (en) |
| GB (1) | GB928011A (en) |
| NL (2) | NL274211A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1248415B (en) * | 1964-03-07 | 1967-08-24 | Dehydag Gmbh | Acid galvanic copper baths |
| US3414493A (en) * | 1965-10-19 | 1968-12-03 | Lea Ronal Inc | Electrodeposition of copper |
| US3725220A (en) * | 1972-04-27 | 1973-04-03 | Lea Ronal Inc | Electrodeposition of copper from acidic baths |
| US4376685A (en) * | 1981-06-24 | 1983-03-15 | M&T Chemicals Inc. | Acid copper electroplating baths containing brightening and leveling additives |
| GB2109815B (en) * | 1981-11-18 | 1985-09-04 | Ibm | Electrodepositing chromium |
| US4786746A (en) * | 1987-09-18 | 1988-11-22 | Pennsylvania Research Corporation | Copper electroplating solutions and methods of making and using them |
| EP2128903B1 (en) * | 2008-05-30 | 2017-02-22 | ATOTECH Deutschland GmbH | Electroplating additive for the deposition of a metal, a binary, ternary, quaternary or pentanary alloy of elements of group 11 (IB)-group 13 (IIIA)-group 16 (VIA) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE543413A (en) * | 1953-09-19 | |||
| DE1007592B (en) * | 1955-01-19 | 1957-05-02 | Dehydag Gmbh | Bath for the production of galvanic metal coatings |
| US3006954A (en) * | 1957-12-27 | 1961-10-31 | Shell Oil Co | Urea and thiourea compounds |
| US2948752A (en) * | 1959-05-18 | 1960-08-09 | Monsanto Canada Ltd | Combined fungistatic and bacteriostatic agents |
-
0
- NL NL134137D patent/NL134137C/xx active
- NL NL274211D patent/NL274211A/xx unknown
-
1961
- 1961-02-02 DE DED35328A patent/DE1146322B/en active Pending
- 1961-12-16 CH CH1462561A patent/CH427447A/en unknown
- 1961-12-28 GB GB46401/61A patent/GB928011A/en not_active Expired
-
1962
- 1962-02-01 DK DK46962AA patent/DK103053C/en active
- 1962-02-01 US US170522A patent/US3203878A/en not_active Expired - Lifetime
- 1962-02-01 BE BE613365A patent/BE613365A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| BE613365A (en) | 1962-05-29 |
| CH427447A (en) | 1966-12-31 |
| DK103053C (en) | 1965-11-08 |
| NL274211A (en) | |
| NL134137C (en) | |
| DE1146322B (en) | 1963-03-28 |
| US3203878A (en) | 1965-08-31 |
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