DK103053C - Acidic baths tilt electrolytic precipitation of metals. - Google Patents
Acidic baths tilt electrolytic precipitation of metals.Info
- Publication number
- DK103053C DK103053C DK46962AA DK46962A DK103053C DK 103053 C DK103053 C DK 103053C DK 46962A A DK46962A A DK 46962AA DK 46962 A DK46962 A DK 46962A DK 103053 C DK103053 C DK 103053C
- Authority
- DK
- Denmark
- Prior art keywords
- tilt
- metals
- electrolytic precipitation
- acidic baths
- baths
- Prior art date
Links
- 230000002378 acidificating effect Effects 0.000 title 1
- 229910052751 metal Inorganic materials 0.000 title 1
- 239000002184 metal Substances 0.000 title 1
- 150000002739 metals Chemical class 0.000 title 1
- 238000001556 precipitation Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
- C07D295/20—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carbonic acid, or sulfur or nitrogen analogues thereof
- C07D295/21—Radicals derived from sulfur analogues of carbonic acid
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D233/28—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D233/30—Oxygen or sulfur atoms
- C07D233/42—Sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/08—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DED35328A DE1146322B (en) | 1961-02-02 | 1961-02-02 | Acid galvanic metal baths |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DK103053C true DK103053C (en) | 1965-11-08 |
Family
ID=7042588
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK46962AA DK103053C (en) | 1961-02-02 | 1962-02-01 | Acidic baths tilt electrolytic precipitation of metals. |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3203878A (en) |
| BE (1) | BE613365A (en) |
| CH (1) | CH427447A (en) |
| DE (1) | DE1146322B (en) |
| DK (1) | DK103053C (en) |
| GB (1) | GB928011A (en) |
| NL (2) | NL134137C (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1248415B (en) * | 1964-03-07 | 1967-08-24 | Dehydag Gmbh | Acid galvanic copper baths |
| US3414493A (en) * | 1965-10-19 | 1968-12-03 | Lea Ronal Inc | Electrodeposition of copper |
| US3725220A (en) * | 1972-04-27 | 1973-04-03 | Lea Ronal Inc | Electrodeposition of copper from acidic baths |
| US4376685A (en) * | 1981-06-24 | 1983-03-15 | M&T Chemicals Inc. | Acid copper electroplating baths containing brightening and leveling additives |
| GB2109815B (en) * | 1981-11-18 | 1985-09-04 | Ibm | Electrodepositing chromium |
| US4786746A (en) * | 1987-09-18 | 1988-11-22 | Pennsylvania Research Corporation | Copper electroplating solutions and methods of making and using them |
| ES2624637T3 (en) * | 2008-05-30 | 2017-07-17 | Atotech Deutschland Gmbh | Electrogalvanoplasty additive for the deposition of an alloy of a metal of group IB / binary or ternary of group IB-group IIIA / ternary, quaternary or quinary of group IB, group IIIA-group VIA |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL110737C (en) * | 1953-09-19 | |||
| DE1007592B (en) * | 1955-01-19 | 1957-05-02 | Dehydag Gmbh | Bath for the production of galvanic metal coatings |
| US3006954A (en) * | 1957-12-27 | 1961-10-31 | Shell Oil Co | Urea and thiourea compounds |
| US2948752A (en) * | 1959-05-18 | 1960-08-09 | Monsanto Canada Ltd | Combined fungistatic and bacteriostatic agents |
-
0
- NL NL274211D patent/NL274211A/xx unknown
- NL NL134137D patent/NL134137C/xx active
-
1961
- 1961-02-02 DE DED35328A patent/DE1146322B/en active Pending
- 1961-12-16 CH CH1462561A patent/CH427447A/en unknown
- 1961-12-28 GB GB46401/61A patent/GB928011A/en not_active Expired
-
1962
- 1962-02-01 DK DK46962AA patent/DK103053C/en active
- 1962-02-01 US US170522A patent/US3203878A/en not_active Expired - Lifetime
- 1962-02-01 BE BE613365A patent/BE613365A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| NL134137C (en) | |
| DE1146322B (en) | 1963-03-28 |
| BE613365A (en) | 1962-05-29 |
| CH427447A (en) | 1966-12-31 |
| US3203878A (en) | 1965-08-31 |
| NL274211A (en) | |
| GB928011A (en) | 1963-06-06 |
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