GB833143A - Improvements relating to the production of hydrophilic substantially fluorine-free silicon dioxide - Google Patents
Improvements relating to the production of hydrophilic substantially fluorine-free silicon dioxideInfo
- Publication number
- GB833143A GB833143A GB9320/58A GB932058A GB833143A GB 833143 A GB833143 A GB 833143A GB 9320/58 A GB9320/58 A GB 9320/58A GB 932058 A GB932058 A GB 932058A GB 833143 A GB833143 A GB 833143A
- Authority
- GB
- United Kingdom
- Prior art keywords
- water vapour
- silica
- production
- silicon dioxide
- improvements relating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
- C01B33/184—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane by hydrolysis of tetrafluoride
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/02—Amorphous compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/30—Particle morphology extending in three dimensions
- C01P2004/32—Spheres
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
A hydrophobic fluorine-containing silica is converted to a hydrophilic substantially fluorine-free form by treatment with water vapour at a temperature of 500 DEG C. or above, preferably 500-1000 DEG C., until the "neutralization number" of the silica is reduced to below 15, preferably below 10. The water vapour may be diluted with air, nitrogen, or carbon dioxide. The water vapour may be recycled after passing through a tower containing calcium oxide. The silica treated may be produced by burning a mixture of silicon tetrafluoride, propane, and air, and may have an average grain size of 12 mm and a specific surface area of 228 sq. m/gm. A table is given specifying temperatures, times, and neutralization numbers, for silica treated in a drum rotated at 5 turns/min. and supplied with water vapour at a rate of 2 kg./min. The specific surface area increased on treatment to not more than 235 sq. m./gm.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SE833143X | 1957-03-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB833143A true GB833143A (en) | 1960-04-21 |
Family
ID=20353991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB9320/58A Expired GB833143A (en) | 1957-03-25 | 1958-03-24 | Improvements relating to the production of hydrophilic substantially fluorine-free silicon dioxide |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB833143A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3969485A (en) * | 1971-10-28 | 1976-07-13 | Flemmert Goesta Lennart | Process for converting silicon-and-fluorine-containing waste gases into silicon dioxide and hydrogen fluoride |
-
1958
- 1958-03-24 GB GB9320/58A patent/GB833143A/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3969485A (en) * | 1971-10-28 | 1976-07-13 | Flemmert Goesta Lennart | Process for converting silicon-and-fluorine-containing waste gases into silicon dioxide and hydrogen fluoride |
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