GB774270A - Method of producing bodies of metals or matalloids - Google Patents

Method of producing bodies of metals or matalloids

Info

Publication number
GB774270A
GB774270A GB35016/53A GB3501653A GB774270A GB 774270 A GB774270 A GB 774270A GB 35016/53 A GB35016/53 A GB 35016/53A GB 3501653 A GB3501653 A GB 3501653A GB 774270 A GB774270 A GB 774270A
Authority
GB
United Kingdom
Prior art keywords
molten
rod
silicon
germanium
matrix
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB35016/53A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB774270A publication Critical patent/GB774270A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/40Crystalline structures
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00Boron; Compounds thereof
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B9/00General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
    • C22B9/02Refining by liquating, filtering, centrifuging, distilling, or supersonic wave action including acoustic waves
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/04Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
    • C30B11/08Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
    • C30B11/10Solid or liquid components, e.g. Verneuil method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/16Heating of the molten zone
    • C30B13/20Heating of the molten zone by induction, e.g. hot wire technique
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/02Induction heating
    • H05B6/22Furnaces without an endless core
    • H05B6/30Arrangements for remelting or zone melting
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/25Process efficiency

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Acoustics & Sound (AREA)
  • Computer Hardware Design (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Silicon Compounds (AREA)
GB35016/53A 1952-12-17 1953-12-16 Method of producing bodies of metals or matalloids Expired GB774270A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US333693XA 1952-12-17 1952-12-17

Publications (1)

Publication Number Publication Date
GB774270A true GB774270A (en) 1957-05-08

Family

ID=21870028

Family Applications (1)

Application Number Title Priority Date Filing Date
GB35016/53A Expired GB774270A (en) 1952-12-17 1953-12-16 Method of producing bodies of metals or matalloids

Country Status (6)

Country Link
BE (1) BE525102A (enrdf_load_stackoverflow)
CH (1) CH333693A (enrdf_load_stackoverflow)
DE (1) DE1014332B (enrdf_load_stackoverflow)
FR (1) FR1087946A (enrdf_load_stackoverflow)
GB (1) GB774270A (enrdf_load_stackoverflow)
NL (1) NL89230C (enrdf_load_stackoverflow)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3053639A (en) * 1959-02-11 1962-09-11 Union Carbide Corp Method and apparatus for growing crystals
US3086850A (en) * 1959-06-17 1963-04-23 Itt Method and means for growing and treating crystals
US3093456A (en) * 1958-09-02 1963-06-11 Texas Instruments Inc Method for recovery and reuse of quartz containers
US3115469A (en) * 1959-06-22 1963-12-24 Monsanto Chemicals Production of single crystals of ferrites
US3156533A (en) * 1960-07-26 1964-11-10 Imber Oscar Crystal growth apparatus
US3185551A (en) * 1959-06-05 1965-05-25 Ind De Pierres Scient Hrand Dj Process for manufacturing a tubular body made of synthetic material, and installation for carrying out this process
US3191924A (en) * 1959-12-31 1965-06-29 Siemens Ag Device for mounting semiconductor rods in apparatus for crucible-free zone melting
US3205046A (en) * 1959-06-05 1965-09-07 Ind De Pierres Scient Hrand Dj Rotary arbor for making synthetic stone
US3224844A (en) * 1961-03-01 1965-12-21 Philips Corp Zone-melting method for metal compounds
US3245761A (en) * 1962-10-11 1966-04-12 Norton Co Apparatus for making magnesium oxide crystals
US3314769A (en) * 1963-05-08 1967-04-18 Union Carbide Corp Arc process and apparatus for growing crystals
US4379733A (en) * 1981-10-02 1983-04-12 Hughes Aircraft Company Bicameral mode crystal growth apparatus and process
CN115198356A (zh) * 2022-07-15 2022-10-18 郑州大学 一种特定取向的大规格金属单晶及其制备方法

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1056840B (de) 1953-02-14 1959-05-06 Siemens Ag Verfahren zum Verteilen von Fremdstoffkomponenten in Halbleiterstaeben durch ein tiegelloses Zonenschmelzverfahren
DE1061527B (de) * 1953-02-14 1959-07-16 Siemens Ag Verfahren zum zonenweisen Umschmelzen von Staeben und anderen langgestreckten Werkstuecken
DE1062431B (de) 1953-02-14 1959-07-30 Siemens Ag Verfahren und Vorrichtung zum Umschmelzen von langgestreckten Koerpern durch Zonenschmelzen
DE971413C (de) * 1953-10-02 1959-01-22 Siemens Ag Vorrichtung zum tiegellosen Zonenschmelzen
DE1151245B (de) * 1953-11-03 1963-07-11 Siemens Ag Verfahren zum zonenweisen Umschmelzen von Werkstoffen in Form eines langgestreckten Koerpers
DE1188042B (de) 1954-01-29 1965-03-04 Siemens Ag Vorrichtung zum tiegellosen Zonenschmelzen eines stabfoermigen kristallinen Halbleiterkoerpers
DE1175447B (de) 1954-01-29 1964-08-06 Licentia Gmbh Verfahren zur Herstellung von Halbleiter-kristallen durch tiegelfreies Zonenschmelzen
NL122356C (enrdf_load_stackoverflow) * 1954-05-18 1900-01-01
US2964396A (en) * 1954-05-24 1960-12-13 Siemens Ag Producing semiconductor substances of highest purity
DE1017795B (de) * 1954-05-25 1957-10-17 Siemens Ag Verfahren zur Herstellung reinster kristalliner Substanzen, vorzugsweise Halbleitersubstanzen
DE1253235B (de) * 1954-05-25 1967-11-02 Siemens Ag Verfahren zum Herstellen stabfoermiger Halbleiterkristalle
DE1221611B (de) 1954-06-24 1966-07-28 Siemens Ag Verfahren und Vorrichtung zur Herstellung von kuenstlichen Edelsteinen oder Halbedelsteinen oder von zur spanabhebenden Bearbeitung geeigneten Hartstoffen
DE1179382B (de) * 1954-06-30 1964-10-08 Siemens Ag Verfahren zum Herstellen eines extrem reinen, stabfoermigen Halbleiterkristalls fuer die Fertigung von elektrischen Halbleiterbauelementen, wie Richtleiter, Transistoren usw.
DE1201073B (de) * 1954-07-30 1965-09-16 Siemens Ag Verfahren zum Herstellen einer halbleitenden Legierung
NL105554C (enrdf_load_stackoverflow) 1955-01-13
NL203438A (enrdf_load_stackoverflow) * 1955-01-14
FR109723A (enrdf_load_stackoverflow) * 1955-01-14
DE1196046B (de) * 1955-03-28 1965-07-01 Siemens Ag Verfahren zum Herstellen eines hochreinen, kristallinen Stabes aus einem leitenden oder halbleitenden Element
DE1141255B (de) * 1958-03-05 1962-12-20 Siemens Ag Verfahren zum Herstellen hochgereinigter einkristalliner Halbleiterstaebe
US2835614A (en) * 1955-11-30 1958-05-20 Raulaud Corp Method of manufacturing crystalline material
DE1063870B (de) * 1956-06-28 1959-08-20 Gustav Weissenberg Verfahren und Vorrichtung zum tiegellosen Zuechten von Einkristallen aus hochreinem Silicium oder Germanium
DE1181668B (de) * 1956-10-17 1964-11-19 Siemens Ag Verfahren zum Herstellen von hochreinen, stabfoermigen Halbleiterkristallen durch Abscheiden des Halbleiters aus einer gasfoermigen Verbindung des Halbleiters durch eineelektrische Gasentladung
DE1136308B (de) * 1956-10-17 1962-09-13 Siemens Ag Verfahren zum Herstellen von Kristallstaeben aus hochreinen halbleitenden Stoffen
BE562704A (enrdf_load_stackoverflow) * 1956-11-28
DE1207922B (de) * 1957-04-30 1965-12-30 Standard Elektrik Lorenz Ag Verfahren zum Herstellen von hochreinen Halbleitersubstanzen, insbesondere von Silizium
DE1169683B (de) * 1957-05-31 1964-05-06 Siemens Ag Verfahren zum tiegellosen Zonenschmelzen eines Halbleiterstabes
DE1092576B (de) * 1957-11-15 1960-11-10 Siemens Ag Stromzufuehrung fuer die bewegliche Heizspule einer tiegelfreien Zonenziehvorrichtung im Innern eines Gefaesses
DE1076623B (de) * 1957-11-15 1960-03-03 Siemens Ag Vorrichtung zum tiegelfreien Zonenziehen von stabfoermigem Halbleitermaterial
NL234451A (enrdf_load_stackoverflow) * 1957-12-27
NL235481A (enrdf_load_stackoverflow) * 1958-02-19
NL237618A (enrdf_load_stackoverflow) * 1958-04-03
BE581195A (enrdf_load_stackoverflow) * 1958-07-30
DE1216040B (de) * 1958-09-12 1966-05-05 Eternit Sa Muffensteckverbindung fuer glatte Einsteckrohre
DE1164681B (de) 1958-12-24 1964-03-05 Siemens Ag Verfahren zur Herstellung eines gleichmaessig dotierten Stabes aus Halbleitermaterial durch tiegelfreies Zonenschmelzen
NL112210C (enrdf_load_stackoverflow) * 1959-04-30
DE1128412B (de) * 1959-12-17 1962-04-26 Metallgesellschaft Ag Verfahren zur Herstellung von Reinstsilicium durch thermische Zersetzung von gasfoermigen Siliciumverbindungen
NL258961A (enrdf_load_stackoverflow) * 1959-12-23
NL262164A (enrdf_load_stackoverflow) * 1960-03-11
DE1216257B (de) * 1960-08-18 1966-05-12 Kempten Elektroschmelz Gmbh Verfahren zur Herstellung von Einkristallen
DE1163559B (de) * 1960-08-20 1964-02-20 Siemens Ag Verfahren und Vorrichtung zum Herstellen von einkristallinen Staeben, insbesondere fuer Halbleiteranordnungen, durch tiegelfreies Zonenschmelzen
US3232745A (en) * 1960-12-05 1966-02-01 Siemens Ag Producing rod-shaped semiconductor crystals
FR1317646A (enrdf_load_stackoverflow) * 1961-03-14 1963-05-08
FR1315934A (fr) * 1961-12-15 1963-01-25 Radiotechnique Appareil horizontal pour la purification et le tirage de cristaux semi-conducteurs
DE1182207B (de) * 1962-07-20 1964-11-26 Siemens Ag Verfahren zum Herstellen eines versetzungsarmen Halbleitereinkristalls durch tiegelfreies Zonenschmelzen
DE1284942B (de) * 1964-06-30 1968-12-12 Halbleiterwerk Frankfurt Oder Vorrichtung zur thermischen Behandlung von Kristallen und Schmelzen, insbesondere aus Halbleitermaterial
CN113337725A (zh) * 2021-06-29 2021-09-03 红河学院 一种从冶炼渣中富集锗的方法

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3093456A (en) * 1958-09-02 1963-06-11 Texas Instruments Inc Method for recovery and reuse of quartz containers
US3053639A (en) * 1959-02-11 1962-09-11 Union Carbide Corp Method and apparatus for growing crystals
US3205046A (en) * 1959-06-05 1965-09-07 Ind De Pierres Scient Hrand Dj Rotary arbor for making synthetic stone
US3185551A (en) * 1959-06-05 1965-05-25 Ind De Pierres Scient Hrand Dj Process for manufacturing a tubular body made of synthetic material, and installation for carrying out this process
US3086850A (en) * 1959-06-17 1963-04-23 Itt Method and means for growing and treating crystals
US3115469A (en) * 1959-06-22 1963-12-24 Monsanto Chemicals Production of single crystals of ferrites
US3191924A (en) * 1959-12-31 1965-06-29 Siemens Ag Device for mounting semiconductor rods in apparatus for crucible-free zone melting
US3156533A (en) * 1960-07-26 1964-11-10 Imber Oscar Crystal growth apparatus
US3224844A (en) * 1961-03-01 1965-12-21 Philips Corp Zone-melting method for metal compounds
US3245761A (en) * 1962-10-11 1966-04-12 Norton Co Apparatus for making magnesium oxide crystals
US3314769A (en) * 1963-05-08 1967-04-18 Union Carbide Corp Arc process and apparatus for growing crystals
US4379733A (en) * 1981-10-02 1983-04-12 Hughes Aircraft Company Bicameral mode crystal growth apparatus and process
CN115198356A (zh) * 2022-07-15 2022-10-18 郑州大学 一种特定取向的大规格金属单晶及其制备方法

Also Published As

Publication number Publication date
DE1014332B (de) 1957-08-22
NL89230C (enrdf_load_stackoverflow) 1900-01-01
CH333693A (fr) 1958-10-31
FR1087946A (fr) 1955-03-01
BE525102A (enrdf_load_stackoverflow) 1900-01-01

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