GB2406582A - Acoustic resonators - Google Patents

Acoustic resonators Download PDF

Info

Publication number
GB2406582A
GB2406582A GB0501682A GB0501682A GB2406582A GB 2406582 A GB2406582 A GB 2406582A GB 0501682 A GB0501682 A GB 0501682A GB 0501682 A GB0501682 A GB 0501682A GB 2406582 A GB2406582 A GB 2406582A
Authority
GB
United Kingdom
Prior art keywords
primer
layer
electrode
layers
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB0501682A
Other languages
English (en)
Other versions
GB0501682D0 (en
Inventor
Christine Janet Shearer
Carl David Monnington Brancher
Rajkumar Jakkaraju
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Trikon Technologies Ltd
Original Assignee
Trikon Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0218762A external-priority patent/GB0218762D0/en
Priority claimed from GB0227981A external-priority patent/GB0227981D0/en
Application filed by Trikon Technologies Ltd filed Critical Trikon Technologies Ltd
Publication of GB0501682D0 publication Critical patent/GB0501682D0/en
Publication of GB2406582A publication Critical patent/GB2406582A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/42—Piezoelectric device making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49005—Acoustic transducer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y10T29/49156—Manufacturing circuit on or in base with selective destruction of conductive paths

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
GB0501682A 2002-08-13 2003-08-11 Acoustic resonators Withdrawn GB2406582A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US40272802P 2002-08-13 2002-08-13
GB0218762A GB0218762D0 (en) 2002-08-13 2002-08-13 Acoustic resonators
GB0227981A GB0227981D0 (en) 2002-11-30 2002-11-30 Acoustic resonators
PCT/GB2003/003504 WO2004015862A2 (en) 2002-08-13 2003-08-11 Acoustic resonators

Publications (2)

Publication Number Publication Date
GB0501682D0 GB0501682D0 (en) 2005-03-02
GB2406582A true GB2406582A (en) 2005-04-06

Family

ID=31721069

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0501682A Withdrawn GB2406582A (en) 2002-08-13 2003-08-11 Acoustic resonators

Country Status (5)

Country Link
JP (2) JP5116945B2 (de)
AU (1) AU2003252992A1 (de)
DE (1) DE10393038B4 (de)
GB (1) GB2406582A (de)
WO (1) WO2004015862A2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6944922B2 (en) * 2002-08-13 2005-09-20 Trikon Technologies Limited Method of forming an acoustic resonator
JP5983164B2 (ja) * 2012-08-07 2016-08-31 旭硝子株式会社 Ｔｉ膜付きガラス基板及びこれを用いた金属膜付きガラス基板、Ｔｉ膜付きガラス基板及びこれを用いた金属膜付きガラス基板の製造方法、ならびにガラス基板表面の平坦度評価方法
CN104767500B (zh) * 2014-01-03 2018-11-09 佛山市艾佛光通科技有限公司 空腔型薄膜体声波谐振器及其制备方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5587620A (en) * 1993-12-21 1996-12-24 Hewlett-Packard Company Tunable thin film acoustic resonators and method for making the same
EP0963040A2 (de) * 1998-06-02 1999-12-08 Hewlett-Packard Company Akustisches Resonator und Verfahren zur Herstellung desselben
EP1054460A2 (de) * 1999-05-20 2000-11-22 TDK Corporation Piezoelektrisches Dünnschicht-Bauelement für akustische Resonatoren
US20020006733A1 (en) * 2000-04-27 2002-01-17 Tdk Corporation Multilayer thin film and its fabrication process as well as electron device
GB2391408A (en) * 2002-07-30 2004-02-04 Agilent Technologies Inc FBAR thin-film resonator with protective layer
US20040021400A1 (en) * 2002-07-30 2004-02-05 Bradley Paul D. Resonator with seed layer

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4482833A (en) * 1981-04-01 1984-11-13 Westinghouse Electric Corp. Method for obtaining oriented gold and piezoelectric films
US4502932A (en) * 1983-10-13 1985-03-05 The United States Of America As Represented By The United States Department Of Energy Acoustic resonator and method of making same
JPS61170561A (ja) * 1985-01-25 1986-08-01 Nippon Telegr & Teleph Corp <Ntt> 高融点金属膜形成方法
JP2659394B2 (ja) * 1988-05-09 1997-09-30 三井東圧化学株式会社 半導体薄膜の製造方法
KR960000190B1 (ko) * 1992-11-09 1996-01-03 엘지전자주식회사 반도체 제조방법 및 그 장치
JPH10308393A (ja) * 1997-05-02 1998-11-17 Tokyo Electron Ltd 半導体装置の製造方法および製造装置
JP3813740B2 (ja) * 1997-07-11 2006-08-23 Ｔｄｋ株式会社 電子デバイス用基板
JP2000160337A (ja) * 1998-11-30 2000-06-13 Hitachi Ltd マグネトロンスパッタ装置
JP2000273629A (ja) * 1999-03-18 2000-10-03 Ulvac Japan Ltd 低抵抗金属薄膜の形成方法
GB2349392B (en) * 1999-04-20 2003-10-22 Trikon Holdings Ltd A method of depositing a layer
US6349454B1 (en) * 1999-07-29 2002-02-26 Agere Systems Guardian Corp. Method of making thin film resonator apparatus
JP4021601B2 (ja) * 1999-10-29 2007-12-12 株式会社東芝 スパッタ装置および成膜方法
AU2001272643A1 (en) * 2000-07-27 2002-02-13 Stephen Robert Burgess Magnetron sputtering
JP4016583B2 (ja) * 2000-08-31 2007-12-05 株式会社村田製作所 圧電薄膜共振子、フィルタおよび電子機器
US6377137B1 (en) * 2000-09-11 2002-04-23 Agilent Technologies, Inc. Acoustic resonator filter with reduced electromagnetic influence due to die substrate thickness
JP2002374145A (ja) * 2001-06-15 2002-12-26 Ube Electronics Ltd 圧電薄膜共振子

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5587620A (en) * 1993-12-21 1996-12-24 Hewlett-Packard Company Tunable thin film acoustic resonators and method for making the same
EP0963040A2 (de) * 1998-06-02 1999-12-08 Hewlett-Packard Company Akustisches Resonator und Verfahren zur Herstellung desselben
EP1054460A2 (de) * 1999-05-20 2000-11-22 TDK Corporation Piezoelektrisches Dünnschicht-Bauelement für akustische Resonatoren
US20020006733A1 (en) * 2000-04-27 2002-01-17 Tdk Corporation Multilayer thin film and its fabrication process as well as electron device
GB2391408A (en) * 2002-07-30 2004-02-04 Agilent Technologies Inc FBAR thin-film resonator with protective layer
US20040021400A1 (en) * 2002-07-30 2004-02-05 Bradley Paul D. Resonator with seed layer

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
LEE S-H ET AL: Influence of electrodes and Bragg reflector on the quality of thin film bulk acoustic wave resonators.2002 IEEE INTERNATIONAL FREQUENCY CONTROL SYMPOSIUM AND PDA EXHIBITION, NEW ORLEANS, USA, 29 May 2002 - 31 May 2002 pages 45 - 49, XP010618917 *
Y YOSHINO ET AL: Effect of buffer electrodes in crystallization of zinc oxide thin film for thin film bulk acoustic wave resonator. MATERIALS SCIENCE OF MICROELECTROMECHANICAL SYSTEMS (MEMS) DEVICES 11.SYMPOSIUM, BOSTON, USA, 29 NOVEMBER 1999 - 1 DECEMBER 1999 pages 267-272. XP009030776 *

Also Published As

Publication number Publication date
JP2010161781A (ja) 2010-07-22
JP2005536098A (ja) 2005-11-24
JP5074540B2 (ja) 2012-11-14
GB0501682D0 (en) 2005-03-02
WO2004015862A2 (en) 2004-02-19
AU2003252992A1 (en) 2004-02-25
DE10393038T5 (de) 2005-07-28
WO2004015862A3 (en) 2004-10-14
JP5116945B2 (ja) 2013-01-09
DE10393038B4 (de) 2013-11-07

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)