GB0501682D0 - Acoustic resonators - Google Patents

Acoustic resonators

Info

Publication number
GB0501682D0
GB0501682D0 GBGB0501682.9A GB0501682A GB0501682D0 GB 0501682 D0 GB0501682 D0 GB 0501682D0 GB 0501682 A GB0501682 A GB 0501682A GB 0501682 D0 GB0501682 D0 GB 0501682D0
Authority
GB
United Kingdom
Prior art keywords
acoustic resonators
resonators
acoustic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB0501682.9A
Other versions
GB2406582A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Trikon Technologies Ltd
Original Assignee
Trikon Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0218762A external-priority patent/GB0218762D0/en
Priority claimed from GB0227981A external-priority patent/GB0227981D0/en
Application filed by Trikon Technologies Ltd filed Critical Trikon Technologies Ltd
Publication of GB0501682D0 publication Critical patent/GB0501682D0/en
Publication of GB2406582A publication Critical patent/GB2406582A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/42Piezoelectric device making
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49005Acoustic transducer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • Y10T29/49156Manufacturing circuit on or in base with selective destruction of conductive paths

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
GB0501682A 2002-08-13 2003-08-11 Acoustic resonators Withdrawn GB2406582A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US40272802P 2002-08-13 2002-08-13
GB0218762A GB0218762D0 (en) 2002-08-13 2002-08-13 Acoustic resonators
GB0227981A GB0227981D0 (en) 2002-11-30 2002-11-30 Acoustic resonators
PCT/GB2003/003504 WO2004015862A2 (en) 2002-08-13 2003-08-11 Acoustic resonators

Publications (2)

Publication Number Publication Date
GB0501682D0 true GB0501682D0 (en) 2005-03-02
GB2406582A GB2406582A (en) 2005-04-06

Family

ID=31721069

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0501682A Withdrawn GB2406582A (en) 2002-08-13 2003-08-11 Acoustic resonators

Country Status (5)

Country Link
JP (2) JP5116945B2 (en)
AU (1) AU2003252992A1 (en)
DE (1) DE10393038B4 (en)
GB (1) GB2406582A (en)
WO (1) WO2004015862A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6944922B2 (en) * 2002-08-13 2005-09-20 Trikon Technologies Limited Method of forming an acoustic resonator
JP5983164B2 (en) * 2012-08-07 2016-08-31 旭硝子株式会社 Glass substrate with Ti film, glass substrate with metal film using the same, glass substrate with Ti film, method for producing glass substrate with metal film using the same, and method for evaluating flatness of glass substrate surface
CN104767500B (en) * 2014-01-03 2018-11-09 佛山市艾佛光通科技有限公司 Cavity type thin film bulk acoustic wave resonator and preparation method thereof

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4482833A (en) * 1981-04-01 1984-11-13 Westinghouse Electric Corp. Method for obtaining oriented gold and piezoelectric films
US4502932A (en) * 1983-10-13 1985-03-05 The United States Of America As Represented By The United States Department Of Energy Acoustic resonator and method of making same
JPS61170561A (en) * 1985-01-25 1986-08-01 Nippon Telegr & Teleph Corp <Ntt> Formation of high melting point metal film
JP2659394B2 (en) * 1988-05-09 1997-09-30 三井東圧化学株式会社 Semiconductor thin film manufacturing method
KR960000190B1 (en) * 1992-11-09 1996-01-03 엘지전자주식회사 Semiconductor manufacturing method and apparatus thereof
US5587620A (en) * 1993-12-21 1996-12-24 Hewlett-Packard Company Tunable thin film acoustic resonators and method for making the same
JPH10308393A (en) * 1997-05-02 1998-11-17 Tokyo Electron Ltd Manufacture and manufacturing device of semiconductor device
JP3813740B2 (en) * 1997-07-11 2006-08-23 Tdk株式会社 Substrates for electronic devices
US6060818A (en) * 1998-06-02 2000-05-09 Hewlett-Packard Company SBAR structures and method of fabrication of SBAR.FBAR film processing techniques for the manufacturing of SBAR/BAR filters
JP2000160337A (en) * 1998-11-30 2000-06-13 Hitachi Ltd Magnetron sputtering device
JP2000273629A (en) * 1999-03-18 2000-10-03 Ulvac Japan Ltd Formation of low resistance metallic thin film
GB2349392B (en) * 1999-04-20 2003-10-22 Trikon Holdings Ltd A method of depositing a layer
JP4327942B2 (en) * 1999-05-20 2009-09-09 Tdk株式会社 Thin film piezoelectric element
US6349454B1 (en) * 1999-07-29 2002-02-26 Agere Systems Guardian Corp. Method of making thin film resonator apparatus
JP4021601B2 (en) * 1999-10-29 2007-12-12 株式会社東芝 Sputtering apparatus and film forming method
JP2001313429A (en) * 2000-04-27 2001-11-09 Tdk Corp Laminated thin film and manufacturing method for the same, and electronic device
WO2002011176A1 (en) * 2000-07-27 2002-02-07 Trikon Holdings Limited Magnetron sputtering
JP4016583B2 (en) * 2000-08-31 2007-12-05 株式会社村田製作所 Piezoelectric thin film resonator, filter and electronic device
US6377137B1 (en) * 2000-09-11 2002-04-23 Agilent Technologies, Inc. Acoustic resonator filter with reduced electromagnetic influence due to die substrate thickness
JP2002374145A (en) * 2001-06-15 2002-12-26 Ube Electronics Ltd Piezoelectric thin-film resonator
US6828713B2 (en) * 2002-07-30 2004-12-07 Agilent Technologies, Inc Resonator with seed layer
US20040021529A1 (en) * 2002-07-30 2004-02-05 Bradley Paul D. Resonator with protective layer

Also Published As

Publication number Publication date
JP5116945B2 (en) 2013-01-09
WO2004015862A3 (en) 2004-10-14
DE10393038T5 (en) 2005-07-28
DE10393038B4 (en) 2013-11-07
JP2005536098A (en) 2005-11-24
WO2004015862A2 (en) 2004-02-19
GB2406582A (en) 2005-04-06
JP2010161781A (en) 2010-07-22
AU2003252992A1 (en) 2004-02-25
JP5074540B2 (en) 2012-11-14

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)