GB2306699A - Phase shifting mask - Google Patents

Phase shifting mask Download PDF

Info

Publication number
GB2306699A
GB2306699A GB9622163A GB9622163A GB2306699A GB 2306699 A GB2306699 A GB 2306699A GB 9622163 A GB9622163 A GB 9622163A GB 9622163 A GB9622163 A GB 9622163A GB 2306699 A GB2306699 A GB 2306699A
Authority
GB
United Kingdom
Prior art keywords
phase shifting
mask
thin film
shifting mask
transparent substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB9622163A
Other languages
English (en)
Other versions
GB9622163D0 (en
Inventor
Seung Chan Moon
Woo Yung Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SK Hynix Inc
Original Assignee
Hyundai Electronics Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Industries Co Ltd filed Critical Hyundai Electronics Industries Co Ltd
Publication of GB9622163D0 publication Critical patent/GB9622163D0/en
Publication of GB2306699A publication Critical patent/GB2306699A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB9622163A 1995-10-25 1996-10-24 Phase shifting mask Withdrawn GB2306699A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950037190A KR0147493B1 (ko) 1995-10-25 1995-10-25 하프톤 위상반전마스크 제조방법

Publications (2)

Publication Number Publication Date
GB9622163D0 GB9622163D0 (en) 1996-12-18
GB2306699A true GB2306699A (en) 1997-05-07

Family

ID=19431360

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9622163A Withdrawn GB2306699A (en) 1995-10-25 1996-10-24 Phase shifting mask

Country Status (5)

Country Link
JP (1) JPH09171960A (ko)
KR (1) KR0147493B1 (ko)
CN (1) CN1159073A (ko)
DE (1) DE19644287A1 (ko)
GB (1) GB2306699A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6511778B2 (en) 2000-01-05 2003-01-28 Shin-Etsu Chemical Co., Ltd. Phase shift mask blank, phase shift mask and method of manufacture

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5658435B2 (ja) * 2009-03-31 2015-01-28 リンテック株式会社 マスクフィルム用部材、それを用いたマスクフィルムの製造方法及び感光性樹脂印刷版の製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6381426A (ja) * 1986-09-26 1988-04-12 Hoya Corp フオトマスクブランクとフオトマスク
JPH02242252A (ja) * 1989-03-15 1990-09-26 Toppan Printing Co Ltd フオトマスクブランクおよびフオトマスク
WO1994011786A1 (en) * 1992-11-16 1994-05-26 E.I. Du Pont De Nemours And Company Photomask blanks
EP0643331A2 (en) * 1993-08-17 1995-03-15 Dai Nippon Printing Co., Ltd. Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the blank
US5415953A (en) * 1994-02-14 1995-05-16 E. I. Du Pont De Nemours And Company Photomask blanks comprising transmissive embedded phase shifter

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6381426A (ja) * 1986-09-26 1988-04-12 Hoya Corp フオトマスクブランクとフオトマスク
JPH02242252A (ja) * 1989-03-15 1990-09-26 Toppan Printing Co Ltd フオトマスクブランクおよびフオトマスク
WO1994011786A1 (en) * 1992-11-16 1994-05-26 E.I. Du Pont De Nemours And Company Photomask blanks
EP0643331A2 (en) * 1993-08-17 1995-03-15 Dai Nippon Printing Co., Ltd. Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the blank
US5415953A (en) * 1994-02-14 1995-05-16 E. I. Du Pont De Nemours And Company Photomask blanks comprising transmissive embedded phase shifter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6511778B2 (en) 2000-01-05 2003-01-28 Shin-Etsu Chemical Co., Ltd. Phase shift mask blank, phase shift mask and method of manufacture

Also Published As

Publication number Publication date
KR970022525A (ko) 1997-05-30
CN1159073A (zh) 1997-09-10
KR0147493B1 (ko) 1998-08-01
GB9622163D0 (en) 1996-12-18
DE19644287A1 (de) 1997-04-30
JPH09171960A (ja) 1997-06-30

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)