GB2158431B - Low expansion, alkali-free borosilicate glass suitable for photomask applications - Google Patents

Low expansion, alkali-free borosilicate glass suitable for photomask applications

Info

Publication number
GB2158431B
GB2158431B GB08511542A GB8511542A GB2158431B GB 2158431 B GB2158431 B GB 2158431B GB 08511542 A GB08511542 A GB 08511542A GB 8511542 A GB8511542 A GB 8511542A GB 2158431 B GB2158431 B GB 2158431B
Authority
GB
United Kingdom
Prior art keywords
alkali
borosilicate glass
low expansion
glass suitable
free borosilicate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08511542A
Other languages
English (en)
Other versions
GB8511542D0 (en
GB2158431A (en
Inventor
Brian Franklin
Karl-Heinz Mader
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schott Glass Technologies Inc
Original Assignee
Schott Glass Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schott Glass Technologies Inc filed Critical Schott Glass Technologies Inc
Publication of GB8511542D0 publication Critical patent/GB8511542D0/en
Publication of GB2158431A publication Critical patent/GB2158431A/en
Application granted granted Critical
Publication of GB2158431B publication Critical patent/GB2158431B/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C03C3/093Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S501/00Compositions: ceramic
    • Y10S501/90Optical glass, e.g. silent on refractive index and/or ABBE number
    • Y10S501/903Optical glass, e.g. silent on refractive index and/or ABBE number having refractive index less than 1.8 and ABBE number less than 70

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)
  • Formation Of Insulating Films (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
GB08511542A 1984-05-08 1985-05-07 Low expansion, alkali-free borosilicate glass suitable for photomask applications Expired GB2158431B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/608,304 US4554259A (en) 1984-05-08 1984-05-08 Low expansion, alkali-free borosilicate glass suitable for photomask applications

Publications (3)

Publication Number Publication Date
GB8511542D0 GB8511542D0 (en) 1985-06-12
GB2158431A GB2158431A (en) 1985-11-13
GB2158431B true GB2158431B (en) 1987-12-02

Family

ID=24435904

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08511542A Expired GB2158431B (en) 1984-05-08 1985-05-07 Low expansion, alkali-free borosilicate glass suitable for photomask applications

Country Status (5)

Country Link
US (1) US4554259A (enExample)
JP (1) JPS60239342A (enExample)
DE (1) DE3516020C2 (enExample)
FR (1) FR2564087B1 (enExample)
GB (1) GB2158431B (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
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JPS6042247A (ja) * 1983-08-16 1985-03-06 Asahi Glass Co Ltd 低膨張性ガラス
JPS62123041A (ja) * 1985-08-09 1987-06-04 Hoya Corp レ−ザ−ガラスから白金インクル−ジヨンを消去する方法
DD262653A1 (de) * 1987-06-15 1988-12-07 Jenaer Glaswerk Veb Photomaskenglas niedriger ausdehnung mit verbesserten hafteigenschaften
JP2634063B2 (ja) * 1988-06-22 1997-07-23 東芝硝子株式会社 固体撮像素子用カバーガラス
US5213916A (en) * 1990-10-30 1993-05-25 International Business Machines Corporation Method of making a gray level mask
GB9525111D0 (en) * 1995-12-08 1996-02-07 Pilkington Plc Glass and glass products
GB2310663A (en) * 1996-02-29 1997-09-03 British Tech Group Organic polyacid/base reaction cement
DE69701255T2 (de) * 1996-02-29 2000-08-10 Btg International Ltd., London Durch reaktion zwischen organischen polysäuren und basen hergestellter zement
US6306926B1 (en) 1998-10-07 2001-10-23 3M Innovative Properties Company Radiopaque cationically polymerizable compositions comprising a radiopacifying filler, and method for polymerizing same
US6247986B1 (en) 1998-12-23 2001-06-19 3M Innovative Properties Company Method for precise molding and alignment of structures on a substrate using a stretchable mold
US6352763B1 (en) * 1998-12-23 2002-03-05 3M Innovative Properties Company Curable slurry for forming ceramic microstructures on a substrate using a mold
US6306948B1 (en) * 1999-10-26 2001-10-23 3M Innovative Properties Company Molding composition containing a debinding catalyst for making ceramic microstructures
US6821178B2 (en) 2000-06-08 2004-11-23 3M Innovative Properties Company Method of producing barrier ribs for plasma display panel substrates
US7176492B2 (en) * 2001-10-09 2007-02-13 3M Innovative Properties Company Method for forming ceramic microstructures on a substrate using a mold and articles formed by the method
US7033534B2 (en) * 2001-10-09 2006-04-25 3M Innovative Properties Company Method for forming microstructures on a substrate using a mold
US6642295B2 (en) * 2001-12-21 2003-11-04 Eastman Kodak Company Photoresist nanocomposite optical plastic article and method of making same
KR101399745B1 (ko) * 2006-02-10 2014-05-26 코닝 인코포레이티드 고온 및 화학적 안정성을 갖는 유리 조성물 및 그 제조방법
US7995631B2 (en) * 2006-04-14 2011-08-09 Raytheon Company Solid-state laser with spatially-tailored active ion concentration using valence conversion with surface masking and method
KR101478686B1 (ko) * 2007-05-14 2015-01-02 니폰 덴키 가라스 가부시키가이샤 창용 합판 유리 및 유리창 부재
WO2009078936A2 (en) 2007-12-14 2009-06-25 Miasole Photovoltaic devices protected from environment
AU2009251825A1 (en) * 2008-05-30 2009-12-03 Corning Incorporated Photovoltaic glass laminated articles and layered articles
US9782949B2 (en) * 2008-05-30 2017-10-10 Corning Incorporated Glass laminated articles and layered articles
US20120094084A1 (en) * 2010-10-15 2012-04-19 William Keith Fisher Chemically-strengthened glass laminates
TWI614227B (zh) 2012-02-29 2018-02-11 康寧公司 低cte之無鹼硼鋁矽酸鹽玻璃組成物及包含其之玻璃物件
KR102255630B1 (ko) 2013-08-15 2021-05-25 코닝 인코포레이티드 중간 내지 높은 cte 유리 및 이를 포함하는 유리 물품
EP3831785A1 (en) 2013-08-15 2021-06-09 Corning Incorporated Alkali-doped and alkali-free boroaluminosilicate glass
JP6497407B2 (ja) * 2017-03-31 2019-04-10 Agc株式会社 無アルカリガラス基板
US10188970B1 (en) * 2018-03-26 2019-01-29 Water Solutions, Inc. Rotary drum screen for thin stillage filtration
CN109748496B (zh) * 2019-01-29 2021-12-14 中国建筑材料科学研究总院有限公司 一种硼硅酸盐玻璃、防光晕输入窗玻璃及其制备方法和用途
KR20220037437A (ko) * 2019-07-25 2022-03-24 에이지씨 가부시키가이샤 적층 부재
KR20220037436A (ko) * 2019-07-25 2022-03-24 에이지씨 가부시키가이샤 적층 부재

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3326703A (en) * 1963-05-10 1967-06-20 Corning Glass Works Heat-absorbing glass
NL6609666A (enExample) * 1966-07-09 1968-01-10
NL6709718A (enExample) * 1967-07-13 1969-01-15
JPS4936803B1 (enExample) * 1970-07-28 1974-10-03
JPS5827643B2 (ja) * 1979-07-13 1983-06-10 株式会社日立製作所 非直線抵抗体およびその製法
US4321317A (en) * 1980-04-28 1982-03-23 General Motors Corporation High resolution lithography system for microelectronic fabrication
US4476216A (en) * 1981-08-03 1984-10-09 Amdahl Corporation Method for high resolution lithography
JPS5832038A (ja) * 1981-08-14 1983-02-24 Hoya Corp フオトエツチングマスク用無アルカリガラス
US4411972A (en) * 1981-12-30 1983-10-25 International Business Machines Corporation Integrated circuit photomask
US4501819A (en) * 1982-12-23 1985-02-26 Kabushiki Kaisha Ohara Kogaku Garasu Seizosho Glass for a photomask
US4421593A (en) * 1983-04-11 1983-12-20 Rca Corporation Reverse etching of chromium

Also Published As

Publication number Publication date
JPH0146461B2 (enExample) 1989-10-09
FR2564087B1 (fr) 1988-01-22
DE3516020A1 (de) 1985-11-14
GB8511542D0 (en) 1985-06-12
US4554259A (en) 1985-11-19
GB2158431A (en) 1985-11-13
DE3516020C2 (de) 1994-07-07
FR2564087A1 (fr) 1985-11-15
JPS60239342A (ja) 1985-11-28

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20040507