GB2062647B - Photo resist formulations - Google Patents

Photo resist formulations

Info

Publication number
GB2062647B
GB2062647B GB8035334A GB8035334A GB2062647B GB 2062647 B GB2062647 B GB 2062647B GB 8035334 A GB8035334 A GB 8035334A GB 8035334 A GB8035334 A GB 8035334A GB 2062647 B GB2062647 B GB 2062647B
Authority
GB
United Kingdom
Prior art keywords
photo resist
resist formulations
formulations
photo
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8035334A
Other languages
English (en)
Other versions
GB2062647A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hercules LLC
Original Assignee
Hercules LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hercules LLC filed Critical Hercules LLC
Publication of GB2062647A publication Critical patent/GB2062647A/en
Application granted granted Critical
Publication of GB2062647B publication Critical patent/GB2062647B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
    • H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
GB8035334A 1979-11-05 1980-11-04 Photo resist formulations Expired GB2062647B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/091,635 US4268610A (en) 1979-11-05 1979-11-05 Photoresist formulations

Publications (2)

Publication Number Publication Date
GB2062647A GB2062647A (en) 1981-05-28
GB2062647B true GB2062647B (en) 1983-06-22

Family

ID=22228832

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8035334A Expired GB2062647B (en) 1979-11-05 1980-11-04 Photo resist formulations

Country Status (6)

Country Link
US (1) US4268610A (enExample)
JP (1) JPS5675642A (enExample)
CA (1) CA1136472A (enExample)
DE (1) DE3041223A1 (enExample)
FR (1) FR2468933A1 (enExample)
GB (1) GB2062647B (enExample)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4438190A (en) * 1981-03-04 1984-03-20 Hitachi Chemical Company, Ltd. Photosensitive resin composition containing unsaturated monomers and unsaturated phosphates
US4352839A (en) * 1981-05-26 1982-10-05 General Electric Company Method of forming a layer of polymethyl methacrylate on a surface of silicon dioxide
JPS589138A (ja) * 1981-07-10 1983-01-19 Hitachi Chem Co Ltd 感光性樹脂組成物
EP0089041B1 (en) * 1982-03-16 1987-11-25 E.I. Du Pont De Nemours And Company Use of a negative acting photopolymerizable element as a solder mask
DE3315977A1 (de) * 1983-05-02 1984-11-08 Hoechst Ag, 6230 Frankfurt Haftmasse
EP0131824B1 (en) * 1983-07-01 1990-05-09 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US4865873A (en) * 1986-09-15 1989-09-12 General Electric Company Electroless deposition employing laser-patterned masking layer
US4950583A (en) * 1986-09-17 1990-08-21 Brewer Science Inc. Adhesion promoting product and process for treating an integrated circuit substrate therewith
GB8702732D0 (en) * 1987-02-06 1987-03-11 Hercules Inc Photopolymerisable composition
DE3717038A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
US4940608A (en) * 1988-11-07 1990-07-10 Okuno Chemical Industry Co., Ltd. Local electroless plating process for plastics
US4976817A (en) * 1988-12-09 1990-12-11 Morton International, Inc. Wet lamination process and apparatus
JPH03179356A (ja) * 1989-05-18 1991-08-05 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性樹脂組成物積層体
DE3926708A1 (de) * 1989-08-12 1991-02-14 Basf Ag Photopolymerisierbares schichtuebertragungsmaterial
US5076946A (en) * 1990-03-30 1991-12-31 Exxon Research And Engineering Company Alkylamine substituted benzotriazole containing lubricants having improved oxidation stability and rust inhibition (PNE-530)
US5403698A (en) * 1990-10-16 1995-04-04 Hitachi Chemical Company, Ltd. Negative type photosensitive electrodepositing resin composition
CA2076727A1 (en) * 1991-08-30 1993-03-01 Richard T. Mayes Alkaline-etch resistant dry film photoresist
JP3010395B2 (ja) * 1991-09-04 2000-02-21 日本シイエムケイ株式会社 プリント配線板の製造方法
CA2158915A1 (en) 1994-09-30 1996-03-31 Dekai Loo Liquid photoimageable resist
JP3631291B2 (ja) * 1995-06-12 2005-03-23 東京応化工業株式会社 ネガ型レジスト組成物及びレジストパターン形成方法
US5648324A (en) * 1996-01-23 1997-07-15 Ocg Microelectronic Materials, Inc. Photoresist stripping composition
JP2002531689A (ja) * 1998-12-11 2002-09-24 イゾラ ラミネイト システムズ コーポレイション 積層材料を含む可視および蛍光染料
US20030143492A1 (en) * 2002-01-31 2003-07-31 Scitex Digital Printing, Inc. Mandrel with controlled release layer for multi-layer electroformed ink jet orifice plates
DE10259374A1 (de) * 2002-12-18 2004-07-08 Atto-Tec Gmbh Carboxamid-substituierte Farbstoffe für analytische Anwendungen
EP1589374B1 (en) * 2004-02-26 2008-10-01 FUJIFILM Corporation Polymerizable composition and process for producing lithographic plate using the polymerizable composition
US8263313B2 (en) * 2004-08-11 2012-09-11 Hitachi Chemical Company, Ltd. Photosensitive resin composition and photosensitive film made with the same
US20060178676A1 (en) * 2005-02-07 2006-08-10 Anderson Paul M Skin smoothing implement
JP4850487B2 (ja) * 2005-11-07 2012-01-11 富士フイルム株式会社 プリント配線板用積層体、それを用いたプリント配線板、プリント配線基板の作製方法、電気部品、電子部品、および、電気機器
JP5190000B2 (ja) * 2009-01-30 2013-04-24 東京応化工業株式会社 ポジ型レジスト組成物及びこれを用いたレジストパターンの形成方法
EP2428842A1 (en) * 2010-09-14 2012-03-14 Rohm and Haas Electronic Materials LLC Photoresists comprising multi-amide component
JP6061449B2 (ja) * 2011-03-31 2017-01-18 太陽インキ製造株式会社 光硬化性熱硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板
EP2764037B1 (en) 2011-10-07 2017-03-22 Nuplex Resins B.V. A crosslinkable composition cross-linkable by real michael addition reaction and resins for use in said composition
NO2984133T3 (enExample) 2013-04-08 2018-08-25
US10774238B2 (en) 2015-04-17 2020-09-15 Allnex Netherlands B.V. Method for curing a RMA crosslinkable resin coating, RMA crosslinkable compositions and resins for use therein
JP6837991B2 (ja) 2015-04-17 2021-03-03 オールネックス・ネザーランズ・ビー．ブイ．Ａｌｌｎｅｘ Ｎｅｔｈｅｒｌａｎｄｓ Ｂ．Ｖ． フロアコーティング組成物
US10767074B2 (en) 2015-04-17 2020-09-08 Allnex Netherlands B.V. Process for the manufacture of a crosslinkable composition
JP6833716B2 (ja) * 2015-04-17 2021-02-24 オールネックス・ネザーランズ・ビー．ブイ．Ａｌｌｎｅｘ Ｎｅｔｈｅｒｌａｎｄｓ Ｂ．Ｖ． Ｒｍａ架橋性コーティング組成物の接着の改善のための改質エポキシプライマー
EP3663326A1 (en) 2018-12-04 2020-06-10 Allnex Netherlands B.V. Rma crosslinkable polymer
JP7524587B2 (ja) * 2020-04-13 2024-07-30 株式会社レゾナック 感光性樹脂組成物、それを用いた硬化物、パターン硬化物の製造方法及び電子部品の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1817107C3 (de) 1968-12-27 1980-09-11 Hoechst Ag, 6000 Frankfurt Vorsensibilisierte MehrmetaU-Offsetdruckplatte
GB1275471A (en) 1969-06-04 1972-05-24 Du Pont Improvements relating to photo-resists
US3622334A (en) * 1969-12-31 1971-11-23 Du Pont Photopolymerizable compositions and elements containing heterocyclic nitrogen-containing compounds
US3645772A (en) * 1970-06-30 1972-02-29 Du Pont Process for improving bonding of a photoresist to copper
JPS5522481B2 (enExample) * 1972-12-27 1980-06-17
GB1466558A (en) 1975-01-23 1977-03-09 Ciba Geigy Ag Additives for functional fluids
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
ZA757987B (en) * 1975-12-23 1976-12-29 Dynachem Corp Adhesion promoters for polymerizable films
GB1472527A (en) 1976-01-07 1977-05-04 Ciba Geigy Ag Additives for functional fluids

Also Published As

Publication number Publication date
FR2468933B1 (enExample) 1983-07-01
GB2062647A (en) 1981-05-28
CA1136472A (en) 1982-11-30
JPS5675642A (en) 1981-06-22
US4268610A (en) 1981-05-19
DE3041223A1 (de) 1981-05-14
DE3041223C2 (enExample) 1989-03-23
JPS6313526B2 (enExample) 1988-03-25
FR2468933A1 (fr) 1981-05-08

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19971104