GB1275471A - Improvements relating to photo-resists - Google Patents

Improvements relating to photo-resists

Info

Publication number
GB1275471A
GB1275471A GB2835869A GB2835869A GB1275471A GB 1275471 A GB1275471 A GB 1275471A GB 2835869 A GB2835869 A GB 2835869A GB 2835869 A GB2835869 A GB 2835869A GB 1275471 A GB1275471 A GB 1275471A
Authority
GB
United Kingdom
Prior art keywords
layer
photo
polymerizable
support
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2835869A
Inventor
Jack Richard Celeste
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Priority to GB2835869A priority Critical patent/GB1275471A/en
Publication of GB1275471A publication Critical patent/GB1275471A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1275471 Processing photo-polymerizable materials E I DU PONT DE NEMOURS & CO 4 June 1969 28358/69 Addition to 1128850 Heading G2C A photographic process wherein a material comprising a polymeric support coated with a layer containing a photo-polymerizable compound with less than 10 ethylenically unsaturated groups for molecule and a photo-initiator; the layer having at best moderate adhesion for the support and being laminated to a solid surface at a temperature up to 150‹C. is imagewise exposed before or after removal of the support, liquid developed to remove the unexposed areas of the layer and subjecting the bared areas of the surface to an etching or plating treatment. A protective cover sheet may be laminated to the layer which sheet is removed before lamination of the layer to the surface. Specified surfaces are copper, aluminium or glass. The remaining resist may be removed after etching or plating the surface. The photo-polymerizable layer may contain a dye and preferably contains a binder.
GB2835869A 1969-06-04 1969-06-04 Improvements relating to photo-resists Expired GB1275471A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB2835869A GB1275471A (en) 1969-06-04 1969-06-04 Improvements relating to photo-resists

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2835869A GB1275471A (en) 1969-06-04 1969-06-04 Improvements relating to photo-resists

Publications (1)

Publication Number Publication Date
GB1275471A true GB1275471A (en) 1972-05-24

Family

ID=10274400

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2835869A Expired GB1275471A (en) 1969-06-04 1969-06-04 Improvements relating to photo-resists

Country Status (1)

Country Link
GB (1) GB1275471A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2448850A1 (en) * 1974-10-14 1976-04-22 Hoechst Ag METHOD OF APPLYING A COPY LAYER
US4119480A (en) * 1976-05-13 1978-10-10 Tokyo Shibaura Electric Co., Ltd. Method of manufacturing thick-film circuit devices
DE2830622A1 (en) * 1977-07-12 1979-01-18 Asahi Chemical Ind METHOD OF IMAGE GENERATION AND LIGHT-SENSITIVE ELEMENT THAT CAN BE USED FOR IT
US4268610A (en) 1979-11-05 1981-05-19 Hercules Incorporated Photoresist formulations
FR2788062A1 (en) * 1998-12-31 2000-07-07 Hyundai Electronics Ind CROSSLINKING MONOMERS FOR PHOTORESIST, AND METHOD FOR PREPARING PHOTORESIST POLYMERS USING THE SAME

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2448850A1 (en) * 1974-10-14 1976-04-22 Hoechst Ag METHOD OF APPLYING A COPY LAYER
US4119480A (en) * 1976-05-13 1978-10-10 Tokyo Shibaura Electric Co., Ltd. Method of manufacturing thick-film circuit devices
DE2830622A1 (en) * 1977-07-12 1979-01-18 Asahi Chemical Ind METHOD OF IMAGE GENERATION AND LIGHT-SENSITIVE ELEMENT THAT CAN BE USED FOR IT
US4268610A (en) 1979-11-05 1981-05-19 Hercules Incorporated Photoresist formulations
FR2788062A1 (en) * 1998-12-31 2000-07-07 Hyundai Electronics Ind CROSSLINKING MONOMERS FOR PHOTORESIST, AND METHOD FOR PREPARING PHOTORESIST POLYMERS USING THE SAME
NL1013916C2 (en) * 1998-12-31 2002-12-03 Hyundai Electronics Ind Crosslinking monomers for a photo protection layer and method for preparing photo protection layer polymers using them.
CN1303114C (en) * 1998-12-31 2007-03-07 现代电子产业株式会社 Cross-linking monomer using for photoresist and process for producing photoresist polymer using the same

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Legal Events

Date Code Title Description
PS Patent sealed
PE Patent expired