GB1567187A - Particle projection method and apparatus - Google Patents

Particle projection method and apparatus Download PDF

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Publication number
GB1567187A
GB1567187A GB43205/76A GB4320576A GB1567187A GB 1567187 A GB1567187 A GB 1567187A GB 43205/76 A GB43205/76 A GB 43205/76A GB 4320576 A GB4320576 A GB 4320576A GB 1567187 A GB1567187 A GB 1567187A
Authority
GB
United Kingdom
Prior art keywords
mask
aperture
target
charged particles
pass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB43205/76A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KENKYUSHO R
Original Assignee
KENKYUSHO R
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KENKYUSHO R filed Critical KENKYUSHO R
Publication of GB1567187A publication Critical patent/GB1567187A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002Details
    • H01J37/3007Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
GB43205/76A 1975-10-23 1976-10-18 Particle projection method and apparatus Expired GB1567187A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50127833A JPS5251871A (en) 1975-10-23 1975-10-23 Projecting method for charge particle beams

Publications (1)

Publication Number Publication Date
GB1567187A true GB1567187A (en) 1980-05-14

Family

ID=14969779

Family Applications (1)

Application Number Title Priority Date Filing Date
GB43205/76A Expired GB1567187A (en) 1975-10-23 1976-10-18 Particle projection method and apparatus

Country Status (5)

Country Link
US (1) US4112305A ( )
JP (1) JPS5251871A ( )
DE (1) DE2647855A1 ( )
FR (1) FR2329069A1 ( )
GB (1) GB1567187A ( )

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52151568A (en) * 1976-06-11 1977-12-16 Jeol Ltd Electron beam exposure apparatus
JPS5316577A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
JPS5316578A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
CA1166766A (en) * 1977-02-23 1984-05-01 Hans C. Pfeiffer Method and apparatus for forming a variable size electron beam
US4182958A (en) * 1977-05-31 1980-01-08 Rikagaku Kenkyusho Method and apparatus for projecting a beam of electrically charged particles
JPS543476A (en) * 1977-06-09 1979-01-11 Jeol Ltd Electron beam exposure device
JPS5410678A (en) * 1977-06-24 1979-01-26 Zeiss Jena Veb Carl Nonnthermal electron beam processor
GB1598219A (en) * 1977-08-10 1981-09-16 Ibm Electron beam system
JPS5435680A (en) * 1977-08-25 1979-03-15 Cho Lsi Gijutsu Kenkyu Kumiai Device for exposing electron beam
JPS5461879A (en) * 1977-10-27 1979-05-18 Fujitsu Ltd Electron beam exposure apparatus
JPS54108580A (en) * 1978-02-13 1979-08-25 Jeol Ltd Electron-beam exposure device
JPS5515212A (en) * 1978-07-20 1980-02-02 Nippon Telegr & Teleph Corp <Ntt> Electronic beam exposure apparatus
JPS5591125A (en) * 1978-12-28 1980-07-10 Agency Of Ind Science & Technol Pattern formation method and apparatus using charged particle beam
US4263514A (en) * 1979-09-13 1981-04-21 Hughes Aircraft Company Electron beam system
US4282437A (en) * 1979-12-17 1981-08-04 Bell Telephone Laboratories, Incorporated Charged particle beam lithography
GB2076589B (en) * 1980-05-19 1985-03-06 Hughes Aircraft Co Electron-beam shaping apparatus
US4376249A (en) * 1980-11-06 1983-03-08 International Business Machines Corporation Variable axis electron beam projection system
US4469950A (en) * 1982-03-04 1984-09-04 Varian Associates, Inc. Charged particle beam exposure system utilizing variable line scan
JPS6251218A (ja) * 1985-08-30 1987-03-05 Hitachi Ltd 電子線描画装置
US5828730A (en) 1995-01-19 1998-10-27 Sten-Tel, Inc. Method and apparatus for recording and managing communications for transcription

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3020441A (en) * 1957-10-09 1962-02-06 Gen Dynamics Corp Character beam-shaped tube
US2988660A (en) * 1958-07-02 1961-06-13 Gen Dynamics Corp Electro optical system in a cathode ray tube
NL6807439A ( ) * 1968-05-27 1969-12-01
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3922546A (en) * 1972-04-14 1975-11-25 Radiant Energy Systems Electron beam pattern generator
US3936693A (en) * 1972-10-02 1976-02-03 General Electric Company Two-aperture immersion lens
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
GB1557924A (en) * 1976-02-05 1979-12-19 Western Electric Co Irradiation apparatus and methods

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker

Also Published As

Publication number Publication date
DE2647855A1 (de) 1977-05-05
US4112305A (en) 1978-09-05
DE2647855C2 ( ) 1987-01-29
JPS5320391B2 ( ) 1978-06-26
JPS5251871A (en) 1977-04-26
FR2329069A1 (fr) 1977-05-20
FR2329069B1 ( ) 1980-05-23

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PE20 Patent expired after termination of 20 years

Effective date: 19961017