GB1500541A - Method of producing positive-working electron resist coatings - Google Patents

Method of producing positive-working electron resist coatings

Info

Publication number
GB1500541A
GB1500541A GB1166075A GB1166075A GB1500541A GB 1500541 A GB1500541 A GB 1500541A GB 1166075 A GB1166075 A GB 1166075A GB 1166075 A GB1166075 A GB 1166075A GB 1500541 A GB1500541 A GB 1500541A
Authority
GB
United Kingdom
Prior art keywords
producing positive
resist coatings
electron resist
working electron
working
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1166075A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Components Ltd
Original Assignee
Mullard Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mullard Ltd filed Critical Mullard Ltd
Priority to GB1166075A priority Critical patent/GB1500541A/en
Priority to DE2610301A priority patent/DE2610301C2/de
Priority to NL7602708A priority patent/NL175107C/xx
Priority to JP2907876A priority patent/JPS51117577A/ja
Priority to US05/668,486 priority patent/US4061832A/en
Priority to FR7608022A priority patent/FR2304943A1/fr
Publication of GB1500541A publication Critical patent/GB1500541A/en
Priority to JP17085881A priority patent/JPS5798517A/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
GB1166075A 1975-03-20 1975-03-20 Method of producing positive-working electron resist coatings Expired GB1500541A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
GB1166075A GB1500541A (en) 1975-03-20 1975-03-20 Method of producing positive-working electron resist coatings
DE2610301A DE2610301C2 (de) 1975-03-20 1976-03-12 Verfahren zur Herstellung einer positiv wirkenden Resistmaterialschicht und Verfahren zum Erzeugen eines Resistmusters
NL7602708A NL175107C (nl) 1975-03-20 1976-03-16 Werkwijze voor het aanbrengen van een laag van een positief werkende elektronenresist en werkwijze ter vervaardiging van een resistpatroon.
JP2907876A JPS51117577A (en) 1975-03-20 1976-03-17 Positive operation type electron resist
US05/668,486 US4061832A (en) 1975-03-20 1976-03-19 Positive-working electron resists
FR7608022A FR2304943A1 (fr) 1975-03-20 1976-03-19 Vernis photosensible a activite positive
JP17085881A JPS5798517A (en) 1975-03-20 1981-10-27 Copolymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1166075A GB1500541A (en) 1975-03-20 1975-03-20 Method of producing positive-working electron resist coatings

Publications (1)

Publication Number Publication Date
GB1500541A true GB1500541A (en) 1978-02-08

Family

ID=9990342

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1166075A Expired GB1500541A (en) 1975-03-20 1975-03-20 Method of producing positive-working electron resist coatings

Country Status (6)

Country Link
US (1) US4061832A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (2) JPS51117577A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2610301C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2304943A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB1500541A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL175107C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5466122A (en) * 1977-11-07 1979-05-28 Fujitsu Ltd Pattern formation material
JPS5466829A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Pattern formation materil
DE2757931A1 (de) * 1977-12-24 1979-07-12 Licentia Gmbh Verfahren zum herstellen von positiven aetzresistenten masken
DE2757932A1 (de) 1977-12-24 1979-07-05 Licentia Gmbh Strahlungsempfindliche positiv arbeitende materialien
JPS54158173A (en) * 1978-06-05 1979-12-13 Fujitsu Ltd Micropattern forming method
DE2828128A1 (de) * 1978-06-27 1980-01-10 Licentia Gmbh Strahlungsempfindliche positiv arbeitende materialien
JPS5590942A (en) * 1978-12-29 1980-07-10 Fujitsu Ltd Positive type resist material
DE3060510D1 (en) * 1979-03-09 1982-07-29 Thomson Csf Photomasking substances, process for preparing them and mask obtained
JPS55133042A (en) * 1979-04-04 1980-10-16 Fujitsu Ltd Pattern forming method
US4276365A (en) * 1979-07-02 1981-06-30 Fujitsu Limited Positive resist terpolymer composition and method of forming resist pattern
DE3246825A1 (de) * 1982-02-24 1983-09-01 Max Planck Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Positives resistmaterial
US4448875A (en) * 1983-03-31 1984-05-15 Gaf Corporation Electron beam sensitive mixture resist
JP2707785B2 (ja) * 1990-03-13 1998-02-04 富士通株式会社 レジスト組成物およびパターン形成方法
US5789140A (en) * 1996-04-25 1998-08-04 Fujitsu Limited Method of forming a pattern or via structure utilizing supplemental electron beam exposure and development to remove image residue

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3441545A (en) * 1963-11-01 1969-04-29 Du Pont Modification of olefin-carboxylic acid halide copolymers
US3647771A (en) * 1964-01-30 1972-03-07 Sumitomo Chemical Co Alternating copolymers of alpha-olefins and vinyl compounds and a process for manufacturing the same
GB1275632A (en) * 1968-06-25 1972-05-24 Hart Schaffner & Marx Inc A method of making tailored garments
US3631157A (en) * 1970-02-09 1971-12-28 Dow Chemical Co Reactive mixed anhydride-containing polymers and a method for their preparation
JPS5119047B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1972-04-14 1976-06-15
GB1445345A (en) * 1972-12-21 1976-08-11 Mullard Ltd Positive-working electron resists
JPS5639680B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1974-04-02 1981-09-14

Also Published As

Publication number Publication date
FR2304943A1 (fr) 1976-10-15
NL175107C (nl) 1984-09-17
JPS6342770B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-08-25
DE2610301A1 (de) 1976-09-30
US4061832A (en) 1977-12-06
JPS51117577A (en) 1976-10-15
DE2610301C2 (de) 1985-01-17
NL7602708A (nl) 1976-09-22
JPS5719411B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1982-04-22
FR2304943B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1978-12-08
JPS5798517A (en) 1982-06-18

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
732 Registration of transactions, instruments or events in the register (sect. 32/1977)