GB1485545A - Polymeric etch resist strippers - Google Patents
Polymeric etch resist strippersInfo
- Publication number
- GB1485545A GB1485545A GB4135/75A GB413575A GB1485545A GB 1485545 A GB1485545 A GB 1485545A GB 4135/75 A GB4135/75 A GB 4135/75A GB 413575 A GB413575 A GB 413575A GB 1485545 A GB1485545 A GB 1485545A
- Authority
- GB
- United Kingdom
- Prior art keywords
- per cent
- jan
- photo
- resist strippers
- etch resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 3
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 abstract 2
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 abstract 1
- IULJSGIJJZZUMF-UHFFFAOYSA-N 2-hydroxybenzenesulfonic acid Chemical class OC1=CC=CC=C1S(O)(=O)=O IULJSGIJJZZUMF-UHFFFAOYSA-N 0.000 abstract 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 abstract 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 abstract 1
- 229940114081 cinnamate Drugs 0.000 abstract 1
- 229920001568 phenolic resin Polymers 0.000 abstract 1
- 229920001195 polyisoprene Polymers 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31127—Etching organic layers
- H01L21/31133—Etching organic layers by chemical means
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D9/00—Chemical paint or ink removers
- C09D9/005—Chemical paint or ink removers containing organic solvents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Wood Science & Technology (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Paints Or Removers (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US438127A US3871929A (en) | 1974-01-30 | 1974-01-30 | Polymeric etch resist strippers and method of using same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1485545A true GB1485545A (en) | 1977-09-14 |
Family
ID=23739341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4135/75A Expired GB1485545A (en) | 1974-01-30 | 1975-01-30 | Polymeric etch resist strippers |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US3871929A (enExample) |
| JP (1) | JPS5852578B2 (enExample) |
| AU (1) | AU7687074A (enExample) |
| CA (1) | CA1024867A (enExample) |
| DE (1) | DE2501187C2 (enExample) |
| FR (1) | FR2259128B3 (enExample) |
| GB (1) | GB1485545A (enExample) |
| HK (1) | HK33378A (enExample) |
| IT (1) | IT1027234B (enExample) |
| MY (1) | MY8100095A (enExample) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2447225C2 (de) * | 1974-10-03 | 1983-12-22 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren zum Ablösen von positiven Photolack |
| JPS5241002A (en) * | 1975-09-29 | 1977-03-30 | Chubu Rika Kk | Regeneration method of ps plate material and regenerated plate |
| US4042387A (en) * | 1976-05-05 | 1977-08-16 | Rockwell International Corp | Photolithographic method of making microcircuits using glycerine in photoresist stripping solution |
| US4169068A (en) * | 1976-08-20 | 1979-09-25 | Japan Synthetic Rubber Company Limited | Stripping liquor composition for removing photoresists comprising hydrogen peroxide |
| US4140572A (en) * | 1976-09-07 | 1979-02-20 | General Electric Company | Process for selective etching of polymeric materials embodying silicones therein |
| US4165295A (en) * | 1976-10-04 | 1979-08-21 | Allied Chemical Corporation | Organic stripping compositions and method for using same |
| US4078102A (en) * | 1976-10-29 | 1978-03-07 | International Business Machines Corporation | Process for stripping resist layers from substrates |
| US4165294A (en) * | 1976-11-08 | 1979-08-21 | Allied Chemical Corporation | Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids |
| US4242218A (en) * | 1976-11-08 | 1980-12-30 | Allied Chemical Corporation | Phenol-free photoresist stripper |
| US4215005A (en) * | 1978-01-30 | 1980-07-29 | Allied Chemical Corporation | Organic stripping compositions and method for using same |
| US4187191A (en) * | 1978-07-26 | 1980-02-05 | General Motors Corporation | Photoresist stripper with dodecylsulfonic acid and chlorinated solvents |
| US4386175A (en) * | 1979-02-08 | 1983-05-31 | Kokoku Rubber Industrial Company Limited | Resin composition |
| FR2455075A1 (fr) * | 1979-04-24 | 1980-11-21 | Rhone Poulenc Ind | Composition a base de solvants chlores pour l'elimination de resines photoresistantes |
| US4345022A (en) * | 1979-11-13 | 1982-08-17 | Matrix Unlimited, Inc. | Process of recovering unpolymerized photopolymer from printing plates |
| JPS58204100A (ja) * | 1982-05-24 | 1983-11-28 | ダイキン工業株式会社 | 表面清浄化用組成物 |
| US4608086A (en) * | 1983-01-19 | 1986-08-26 | Tennant Company | Membrane remover/etchant |
| US4469525A (en) * | 1983-01-19 | 1984-09-04 | Tennant Company | Membrane remover/etchant |
| US4617251A (en) * | 1985-04-11 | 1986-10-14 | Olin Hunt Specialty Products, Inc. | Stripping composition and method of using the same |
| JPS6235357A (ja) * | 1985-08-09 | 1987-02-16 | Tokyo Ohka Kogyo Co Ltd | ホトレジスト用剥離液 |
| US4971715A (en) * | 1988-11-18 | 1990-11-20 | International Business Machines Corporation | Phenolic-free stripping composition and use thereof |
| US5417802A (en) * | 1994-03-18 | 1995-05-23 | At&T Corp. | Integrated circuit manufacturing |
| US5728664A (en) * | 1996-04-15 | 1998-03-17 | Ashland, Inc. | Photoresist stripping compositions |
| US6348100B1 (en) * | 1999-07-01 | 2002-02-19 | International Business Machines Corporation | Resist bowl cleaning |
| US6403286B1 (en) | 1999-11-04 | 2002-06-11 | Corning Incorporated | High aspect ratio patterning of glass film |
| US6422246B1 (en) * | 2000-02-29 | 2002-07-23 | United Microelectronics Corp. | Method removing residual photoresist |
| US6475292B1 (en) | 2000-07-31 | 2002-11-05 | Shipley Company, L.L.C. | Photoresist stripping method |
| JP2013534909A (ja) | 2010-05-21 | 2013-09-09 | シーメンス・ヘルスケア・ダイアグノスティックス・インコーポレーテッド | 両性イオン性試薬 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3582401A (en) * | 1967-11-15 | 1971-06-01 | Mallinckrodt Chemical Works | Photosensitive resist remover compositions and methods |
| US3813309A (en) * | 1969-12-23 | 1974-05-28 | Ibm | Method for stripping resists from substrates |
| FR2109127A5 (en) * | 1970-10-02 | 1972-05-26 | Radiotechnique Compelec | Solvent for photopolymerised acrylics -used eg in printed - circuit mfr contains methylene chloride and phenolics in emulsion |
-
1974
- 1974-01-30 US US438127A patent/US3871929A/en not_active Expired - Lifetime
- 1974-11-05 CA CA212,977A patent/CA1024867A/en not_active Expired
- 1974-12-11 FR FR7440833A patent/FR2259128B3/fr not_active Expired
- 1974-12-24 AU AU76870/74A patent/AU7687074A/en not_active Expired
-
1975
- 1975-01-02 IT IT67005/75A patent/IT1027234B/it active
- 1975-01-14 DE DE2501187A patent/DE2501187C2/de not_active Expired
- 1975-01-29 JP JP50011492A patent/JPS5852578B2/ja not_active Expired
- 1975-01-30 GB GB4135/75A patent/GB1485545A/en not_active Expired
-
1978
- 1978-06-29 HK HK333/78A patent/HK33378A/xx unknown
-
1981
- 1981-12-30 MY MY95/81A patent/MY8100095A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE2501187A1 (de) | 1975-07-31 |
| FR2259128A1 (enExample) | 1975-08-22 |
| FR2259128B3 (enExample) | 1977-09-16 |
| US3871929A (en) | 1975-03-18 |
| CA1024867A (en) | 1978-01-24 |
| JPS5852578B2 (ja) | 1983-11-24 |
| IT1027234B (it) | 1978-11-20 |
| DE2501187C2 (de) | 1984-04-19 |
| MY8100095A (en) | 1981-12-31 |
| JPS50109730A (enExample) | 1975-08-29 |
| AU7687074A (en) | 1976-06-24 |
| HK33378A (en) | 1978-07-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19930130 |