FR2109127A5 - Solvent for photopolymerised acrylics -used eg in printed - circuit mfr contains methylene chloride and phenolics in emulsion - Google Patents

Solvent for photopolymerised acrylics -used eg in printed - circuit mfr contains methylene chloride and phenolics in emulsion

Info

Publication number
FR2109127A5
FR2109127A5 FR7035685A FR7035685A FR2109127A5 FR 2109127 A5 FR2109127 A5 FR 2109127A5 FR 7035685 A FR7035685 A FR 7035685A FR 7035685 A FR7035685 A FR 7035685A FR 2109127 A5 FR2109127 A5 FR 2109127A5
Authority
FR
France
Prior art keywords
emulsion
methylene chloride
printed
photopolymerised
phenolics
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7035685A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Radiotechnique Compelec RTC SA
Original Assignee
Radiotechnique Compelec RTC SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Radiotechnique Compelec RTC SA filed Critical Radiotechnique Compelec RTC SA
Priority to FR7035685A priority Critical patent/FR2109127A5/en
Application granted granted Critical
Publication of FR2109127A5 publication Critical patent/FR2109127A5/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

A compsn. for dissolving polymerised acrylic resins contg. photosensitive cross-linking agents comprises methylene chloride, and >=1 phenolic cpd(s) emulsified in water in presence of a surfactant. Used for removal of photoresist, e.g. in prepn. of printed circuits. No brushing off of residual resin fragments is required as the resin completely dissolves in the emulsion.
FR7035685A 1970-10-02 1970-10-02 Solvent for photopolymerised acrylics -used eg in printed - circuit mfr contains methylene chloride and phenolics in emulsion Expired FR2109127A5 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7035685A FR2109127A5 (en) 1970-10-02 1970-10-02 Solvent for photopolymerised acrylics -used eg in printed - circuit mfr contains methylene chloride and phenolics in emulsion

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7035685A FR2109127A5 (en) 1970-10-02 1970-10-02 Solvent for photopolymerised acrylics -used eg in printed - circuit mfr contains methylene chloride and phenolics in emulsion

Publications (1)

Publication Number Publication Date
FR2109127A5 true FR2109127A5 (en) 1972-05-26

Family

ID=9062198

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7035685A Expired FR2109127A5 (en) 1970-10-02 1970-10-02 Solvent for photopolymerised acrylics -used eg in printed - circuit mfr contains methylene chloride and phenolics in emulsion

Country Status (1)

Country Link
FR (1) FR2109127A5 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2501187A1 (en) * 1974-01-30 1975-07-31 Allied Chem STRIPPING AGENTS AND THEIR USE
EP0119337A1 (en) * 1981-11-23 1984-09-26 Ekc Technology, Inc. Photoresist stripping composition and method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2501187A1 (en) * 1974-01-30 1975-07-31 Allied Chem STRIPPING AGENTS AND THEIR USE
EP0119337A1 (en) * 1981-11-23 1984-09-26 Ekc Technology, Inc. Photoresist stripping composition and method

Similar Documents

Publication Publication Date Title
BR8405909A (en) POSITIVE PHOTO-RESISTOR, SURFACE FILM, MULTI-LAYER PHOTO-RESISTOR, PROCESS FOR FORMING A PICTURE ON A SURFACE AND VIABLE PHOTO-RESISTOR SOLVENT
CH476673A (en) Process for the preparation of salts of adamantane and tricyclo (4,3,1,13,8) undecane compounds
GB1493833A (en) Photosensitive films
KR840004589A (en) Positive type photoresist composition
DK113756B (en) A process for providing a magenta image in an exposed photographic silver halide emulsion layer as well as aqueous alkaline magenta-forming color developer solution for use in the process.
IT7924680A0 (en) SOLVENT USEFUL IN THE FIXING DEVICE OF A PRINTING OR REPRODUCTION EQUIPMENT.
FR2109127A5 (en) Solvent for photopolymerised acrylics -used eg in printed - circuit mfr contains methylene chloride and phenolics in emulsion
ATE185000T1 (en) IMAGE GENERATION METHOD
KR910006782A (en) Manufacturing Method of Semiconductor Device
JPS5738141A (en) Manufacture of printing plate
GB1297171A (en)
JPS5212830A (en) Exposure warning circuit
ATE29036T1 (en) EPOXY RESIN POLYAMMONIUM SALT EMULSION AND PROCESS FOR ITS PRODUCTION.
KR930006502A (en) How to make floor resist
JPS5230773A (en) Treating method of waste fluid containing photosensitive resin
ATE199187T1 (en) PHOTOSENSITIVE COMPOSITION
CH448742A (en) Apparatus for the production of photographic copies by reflex exposure
JPS5264877A (en) Production of semiconductor device
JPS525969A (en) Sewage disposal method
JPS5230774A (en) Treating method of waste fluid containing photosensitive resin
JPS5368577A (en) Removing method of positive type photo resist
JPS5226224A (en) Amending fluid
JPS51135169A (en) Agent of removing residual chlorine
FR2102876A5 (en) Direct positive photocopies/photoresists - from azide polymer by dyeing or dissolving uncrosslinked parts
KR920008536A (en) Positive photosensitive composition

Legal Events

Date Code Title Description
ST Notification of lapse