KR920008536A - Positive photosensitive composition - Google Patents

Positive photosensitive composition Download PDF

Info

Publication number
KR920008536A
KR920008536A KR1019910017423A KR910017423A KR920008536A KR 920008536 A KR920008536 A KR 920008536A KR 1019910017423 A KR1019910017423 A KR 1019910017423A KR 910017423 A KR910017423 A KR 910017423A KR 920008536 A KR920008536 A KR 920008536A
Authority
KR
South Korea
Prior art keywords
photosensitive composition
positive photosensitive
soluble resin
developer
alkaline
Prior art date
Application number
KR1019910017423A
Other languages
Korean (ko)
Other versions
KR950001723B1 (en
Inventor
신지 기시무라
이지시 나가다
기히고 구마다
시게루 구보다
유시 히쓰가
Original Assignee
시기 모리야
미쓰비시 뎅끼 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 시기 모리야, 미쓰비시 뎅끼 가부시끼가이샤 filed Critical 시기 모리야
Publication of KR920008536A publication Critical patent/KR920008536A/en
Application granted granted Critical
Publication of KR950001723B1 publication Critical patent/KR950001723B1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

내용 없음No content

Description

포지티브형 감광성 조성물Positive photosensitive composition

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

Claims (1)

알칼리성 현상액에 용해하는 알카리가용성수지와, 감광성산 발생제와, 산의 작용으로 분해하여 상기 알카리가용성수지의 상기 현상액에 대한 용해억제기능을 상실하는 용해억제제와를 포함하는 포지티브형 감광성조성물.A positive photosensitive composition comprising an alkali soluble resin dissolved in an alkaline developer, a photosensitive acid generator, and a dissolution inhibitor which decomposes under the action of an acid and loses the dissolution inhibiting function of the alkaline soluble resin in the developer. ※ 참고사항 : 최초출원 내용에 의하여 공개되는 것임.※ Note: This is to be disclosed by the original application.
KR1019910017423A 1990-10-12 1991-10-04 Positive photosensitive composition KR950001723B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2274361A JPH04149445A (en) 1990-10-12 1990-10-12 Positive type photosensitive composition
JP90-274361 1990-10-12

Publications (2)

Publication Number Publication Date
KR920008536A true KR920008536A (en) 1992-05-28
KR950001723B1 KR950001723B1 (en) 1995-02-28

Family

ID=17540590

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910017423A KR950001723B1 (en) 1990-10-12 1991-10-04 Positive photosensitive composition

Country Status (3)

Country Link
JP (1) JPH04149445A (en)
KR (1) KR950001723B1 (en)
DE (1) DE4133770C2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100419336B1 (en) * 2001-12-12 2004-02-21 도레이새한 주식회사 Manufacturing method of highly brightend and soften polyester shaped fiber and raising warp kitting fabric knitted up thereof

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2956387B2 (en) * 1992-05-25 1999-10-04 三菱電機株式会社 Resist coating film material, method of forming the same, pattern forming method using the same, and semiconductor device
EP1035441A1 (en) * 1999-03-09 2000-09-13 Matsushita Electric Industrial Co., Ltd. Pattern formation method

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0617991B2 (en) * 1983-06-22 1994-03-09 富士写真フイルム株式会社 Photosolubilizing composition
JPS60162249A (en) * 1984-02-01 1985-08-24 Japan Synthetic Rubber Co Ltd Positive type resist composition
DE3750275T3 (en) * 1986-06-13 1998-10-01 Microsi Inc Lacquer composition and application.
JPS6336240A (en) * 1986-07-28 1988-02-16 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン Resist material
DE3751745T2 (en) * 1986-10-23 1996-09-26 Ibm Highly sensitive resists with self-decomposition temperature greater than about 160 degrees Celsius
MY103006A (en) * 1987-03-30 1993-03-31 Microsi Inc Photoresist compositions
DE3817009A1 (en) * 1988-05-19 1989-11-30 Basf Ag RADIATION SENSITIVE MIXTURE AND METHOD FOR PRODUCING RELIEF PATTERNS
DE3817011A1 (en) * 1988-05-19 1989-11-30 Basf Ag RADIATION-SENSITIVE MIXTURE AND METHOD FOR PRODUCING RELIEF PATTERNS
DE3837438A1 (en) * 1988-11-04 1990-05-10 Basf Ag RADIATION-SENSITIVE MIXTURE
JP2568431B2 (en) * 1988-11-18 1997-01-08 日本ゼオン株式会社 Resist composition
DE3930087A1 (en) * 1989-09-09 1991-03-14 Hoechst Ag POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL THEREOF
JP2632066B2 (en) * 1990-04-06 1997-07-16 富士写真フイルム株式会社 Positive image forming method
JP2849666B2 (en) * 1990-08-01 1999-01-20 和光純薬工業株式会社 New resist material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100419336B1 (en) * 2001-12-12 2004-02-21 도레이새한 주식회사 Manufacturing method of highly brightend and soften polyester shaped fiber and raising warp kitting fabric knitted up thereof

Also Published As

Publication number Publication date
KR950001723B1 (en) 1995-02-28
JPH04149445A (en) 1992-05-22
DE4133770C2 (en) 1996-07-11
DE4133770A1 (en) 1992-04-16

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