GB1484873A - Delineating a pattern in a negative resist composition - Google Patents
Delineating a pattern in a negative resist compositionInfo
- Publication number
- GB1484873A GB1484873A GB45812/74A GB4581274A GB1484873A GB 1484873 A GB1484873 A GB 1484873A GB 45812/74 A GB45812/74 A GB 45812/74A GB 4581274 A GB4581274 A GB 4581274A GB 1484873 A GB1484873 A GB 1484873A
- Authority
- GB
- United Kingdom
- Prior art keywords
- polymers
- oct
- average molecular
- main chain
- molecular weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 2
- 229920000642 polymer Polymers 0.000 abstract 4
- 125000003700 epoxy group Chemical group 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 239000006096 absorbing agent Substances 0.000 abstract 1
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 238000004132 cross linking Methods 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 abstract 1
- 230000009477 glass transition Effects 0.000 abstract 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 abstract 1
- 229920002454 poly(glycidyl methacrylate) polymer Polymers 0.000 abstract 1
- -1 vinyl ferrocene Chemical compound 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electrophotography Using Other Than Carlson'S Method (AREA)
- Epoxy Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US40892773A | 1973-10-23 | 1973-10-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1484873A true GB1484873A (en) | 1977-09-08 |
Family
ID=23618345
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB45812/74A Expired GB1484873A (en) | 1973-10-23 | 1974-10-23 | Delineating a pattern in a negative resist composition |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS5929852B2 (enrdf_load_stackoverflow) |
| BE (1) | BE821326A (enrdf_load_stackoverflow) |
| CA (1) | CA1032392A (enrdf_load_stackoverflow) |
| DE (1) | DE2450381C3 (enrdf_load_stackoverflow) |
| FR (1) | FR2248289B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1484873A (enrdf_load_stackoverflow) |
| IT (1) | IT1024658B (enrdf_load_stackoverflow) |
| NL (1) | NL163633C (enrdf_load_stackoverflow) |
| SE (1) | SE419907B (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4485166A (en) * | 1981-04-13 | 1984-11-27 | Hoechst Aktiengesellschaft | Radiation-polymerizable mixture and photopolymerizable copying material prepared therefrom |
| GB2285141A (en) * | 1993-12-23 | 1995-06-28 | Motorola Ltd | Method of removing photo resist |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4130424A (en) * | 1976-08-06 | 1978-12-19 | Bell Telephone Laboratories, Incorporated | Process using radiation curable epoxy containing resist and resultant product |
| JPS5786830A (en) * | 1980-11-20 | 1982-05-31 | Fujitsu Ltd | Pattern forming material |
| JPS5786831A (en) * | 1980-11-20 | 1982-05-31 | Fujitsu Ltd | Pattern forming material |
| JPS57109943A (en) * | 1980-12-26 | 1982-07-08 | Nippon Telegr & Teleph Corp <Ntt> | Formation of submicron pattern using radiation sensitive resist |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3770433A (en) * | 1972-03-22 | 1973-11-06 | Bell Telephone Labor Inc | High sensitivity negative electron resist |
-
1974
- 1974-07-18 CA CA205,002A patent/CA1032392A/en not_active Expired
- 1974-10-15 SE SE7412962A patent/SE419907B/xx not_active IP Right Cessation
- 1974-10-21 FR FR7435316A patent/FR2248289B1/fr not_active Expired
- 1974-10-22 NL NL7413817.A patent/NL163633C/xx not_active IP Right Cessation
- 1974-10-22 BE BE149750A patent/BE821326A/xx not_active IP Right Cessation
- 1974-10-22 IT IT70139/74A patent/IT1024658B/it active
- 1974-10-23 DE DE2450381A patent/DE2450381C3/de not_active Expired
- 1974-10-23 GB GB45812/74A patent/GB1484873A/en not_active Expired
- 1974-10-23 JP JP49121557A patent/JPS5929852B2/ja not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4485166A (en) * | 1981-04-13 | 1984-11-27 | Hoechst Aktiengesellschaft | Radiation-polymerizable mixture and photopolymerizable copying material prepared therefrom |
| GB2285141A (en) * | 1993-12-23 | 1995-06-28 | Motorola Ltd | Method of removing photo resist |
| US5496438A (en) * | 1993-12-23 | 1996-03-05 | Motorola, Inc. | Method of removing photo resist |
| GB2285141B (en) * | 1993-12-23 | 1998-03-11 | Motorola Ltd | Method of removing photo resist |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5074427A (enrdf_load_stackoverflow) | 1975-06-19 |
| BE821326A (fr) | 1975-02-17 |
| FR2248289B1 (enrdf_load_stackoverflow) | 1979-03-16 |
| FR2248289A1 (enrdf_load_stackoverflow) | 1975-05-16 |
| NL163633C (nl) | 1980-09-15 |
| DE2450381A1 (de) | 1975-04-24 |
| SE419907B (sv) | 1981-08-31 |
| DE2450381B2 (de) | 1979-07-19 |
| JPS5929852B2 (ja) | 1984-07-24 |
| SE7412962L (enrdf_load_stackoverflow) | 1975-04-24 |
| IT1024658B (it) | 1978-07-20 |
| CA1032392A (en) | 1978-06-06 |
| DE2450381C3 (de) | 1984-09-20 |
| NL7413817A (nl) | 1975-04-25 |
| NL163633B (nl) | 1980-04-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PE20 | Patent expired after termination of 20 years |
Effective date: 19941022 |