JPS5929852B2 - 高エネルギ−照射硬化性レジストとその前処理法 - Google Patents

高エネルギ−照射硬化性レジストとその前処理法

Info

Publication number
JPS5929852B2
JPS5929852B2 JP49121557A JP12155774A JPS5929852B2 JP S5929852 B2 JPS5929852 B2 JP S5929852B2 JP 49121557 A JP49121557 A JP 49121557A JP 12155774 A JP12155774 A JP 12155774A JP S5929852 B2 JPS5929852 B2 JP S5929852B2
Authority
JP
Japan
Prior art keywords
molecular weight
resist
polymer
radiation
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49121557A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5074427A (enrdf_load_stackoverflow
Inventor
ダビツド フエイト ユ−ジン
フラツク トンプソン ラリ−
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of JPS5074427A publication Critical patent/JPS5074427A/ja
Publication of JPS5929852B2 publication Critical patent/JPS5929852B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP49121557A 1973-10-23 1974-10-23 高エネルギ−照射硬化性レジストとその前処理法 Expired JPS5929852B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US40892773A 1973-10-23 1973-10-23
US408927 1973-10-23

Publications (2)

Publication Number Publication Date
JPS5074427A JPS5074427A (enrdf_load_stackoverflow) 1975-06-19
JPS5929852B2 true JPS5929852B2 (ja) 1984-07-24

Family

ID=23618345

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49121557A Expired JPS5929852B2 (ja) 1973-10-23 1974-10-23 高エネルギ−照射硬化性レジストとその前処理法

Country Status (9)

Country Link
JP (1) JPS5929852B2 (enrdf_load_stackoverflow)
BE (1) BE821326A (enrdf_load_stackoverflow)
CA (1) CA1032392A (enrdf_load_stackoverflow)
DE (1) DE2450381C3 (enrdf_load_stackoverflow)
FR (1) FR2248289B1 (enrdf_load_stackoverflow)
GB (1) GB1484873A (enrdf_load_stackoverflow)
IT (1) IT1024658B (enrdf_load_stackoverflow)
NL (1) NL163633C (enrdf_load_stackoverflow)
SE (1) SE419907B (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product
JPS5786830A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS5786831A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS57109943A (en) * 1980-12-26 1982-07-08 Nippon Telegr & Teleph Corp <Ntt> Formation of submicron pattern using radiation sensitive resist
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
GB2285141B (en) * 1993-12-23 1998-03-11 Motorola Ltd Method of removing photo resist

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3770433A (en) * 1972-03-22 1973-11-06 Bell Telephone Labor Inc High sensitivity negative electron resist

Also Published As

Publication number Publication date
GB1484873A (en) 1977-09-08
JPS5074427A (enrdf_load_stackoverflow) 1975-06-19
BE821326A (fr) 1975-02-17
FR2248289B1 (enrdf_load_stackoverflow) 1979-03-16
FR2248289A1 (enrdf_load_stackoverflow) 1975-05-16
NL163633C (nl) 1980-09-15
DE2450381A1 (de) 1975-04-24
SE419907B (sv) 1981-08-31
DE2450381B2 (de) 1979-07-19
SE7412962L (enrdf_load_stackoverflow) 1975-04-24
IT1024658B (it) 1978-07-20
CA1032392A (en) 1978-06-06
DE2450381C3 (de) 1984-09-20
NL7413817A (nl) 1975-04-25
NL163633B (nl) 1980-04-15

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