JPS5074427A - - Google Patents
Info
- Publication number
- JPS5074427A JPS5074427A JP49121557A JP12155774A JPS5074427A JP S5074427 A JPS5074427 A JP S5074427A JP 49121557 A JP49121557 A JP 49121557A JP 12155774 A JP12155774 A JP 12155774A JP S5074427 A JPS5074427 A JP S5074427A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electrophotography Using Other Than Carlson'S Method (AREA)
- Epoxy Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US40892773A | 1973-10-23 | 1973-10-23 | |
| US408927 | 1973-10-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5074427A true JPS5074427A (enrdf_load_stackoverflow) | 1975-06-19 |
| JPS5929852B2 JPS5929852B2 (ja) | 1984-07-24 |
Family
ID=23618345
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49121557A Expired JPS5929852B2 (ja) | 1973-10-23 | 1974-10-23 | 高エネルギ−照射硬化性レジストとその前処理法 |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS5929852B2 (enrdf_load_stackoverflow) |
| BE (1) | BE821326A (enrdf_load_stackoverflow) |
| CA (1) | CA1032392A (enrdf_load_stackoverflow) |
| DE (1) | DE2450381C3 (enrdf_load_stackoverflow) |
| FR (1) | FR2248289B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1484873A (enrdf_load_stackoverflow) |
| IT (1) | IT1024658B (enrdf_load_stackoverflow) |
| NL (1) | NL163633C (enrdf_load_stackoverflow) |
| SE (1) | SE419907B (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5786830A (en) * | 1980-11-20 | 1982-05-31 | Fujitsu Ltd | Pattern forming material |
| JPS5786831A (en) * | 1980-11-20 | 1982-05-31 | Fujitsu Ltd | Pattern forming material |
| JPS57109943A (en) * | 1980-12-26 | 1982-07-08 | Nippon Telegr & Teleph Corp <Ntt> | Formation of submicron pattern using radiation sensitive resist |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4130424A (en) * | 1976-08-06 | 1978-12-19 | Bell Telephone Laboratories, Incorporated | Process using radiation curable epoxy containing resist and resultant product |
| DE3114931A1 (de) * | 1981-04-13 | 1982-10-28 | Hoechst Ag, 6000 Frankfurt | Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial |
| GB2285141B (en) * | 1993-12-23 | 1998-03-11 | Motorola Ltd | Method of removing photo resist |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3770433A (en) * | 1972-03-22 | 1973-11-06 | Bell Telephone Labor Inc | High sensitivity negative electron resist |
-
1974
- 1974-07-18 CA CA205,002A patent/CA1032392A/en not_active Expired
- 1974-10-15 SE SE7412962A patent/SE419907B/xx not_active IP Right Cessation
- 1974-10-21 FR FR7435316A patent/FR2248289B1/fr not_active Expired
- 1974-10-22 NL NL7413817.A patent/NL163633C/xx not_active IP Right Cessation
- 1974-10-22 BE BE149750A patent/BE821326A/xx not_active IP Right Cessation
- 1974-10-22 IT IT70139/74A patent/IT1024658B/it active
- 1974-10-23 DE DE2450381A patent/DE2450381C3/de not_active Expired
- 1974-10-23 GB GB45812/74A patent/GB1484873A/en not_active Expired
- 1974-10-23 JP JP49121557A patent/JPS5929852B2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5786830A (en) * | 1980-11-20 | 1982-05-31 | Fujitsu Ltd | Pattern forming material |
| JPS5786831A (en) * | 1980-11-20 | 1982-05-31 | Fujitsu Ltd | Pattern forming material |
| JPS57109943A (en) * | 1980-12-26 | 1982-07-08 | Nippon Telegr & Teleph Corp <Ntt> | Formation of submicron pattern using radiation sensitive resist |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1484873A (en) | 1977-09-08 |
| BE821326A (fr) | 1975-02-17 |
| FR2248289B1 (enrdf_load_stackoverflow) | 1979-03-16 |
| FR2248289A1 (enrdf_load_stackoverflow) | 1975-05-16 |
| NL163633C (nl) | 1980-09-15 |
| DE2450381A1 (de) | 1975-04-24 |
| SE419907B (sv) | 1981-08-31 |
| DE2450381B2 (de) | 1979-07-19 |
| JPS5929852B2 (ja) | 1984-07-24 |
| SE7412962L (enrdf_load_stackoverflow) | 1975-04-24 |
| IT1024658B (it) | 1978-07-20 |
| CA1032392A (en) | 1978-06-06 |
| DE2450381C3 (de) | 1984-09-20 |
| NL7413817A (nl) | 1975-04-25 |
| NL163633B (nl) | 1980-04-15 |