IT1024658B - Composizione mascherante negativa, particolarmente per incisione di circuiti stampati - Google Patents

Composizione mascherante negativa, particolarmente per incisione di circuiti stampati

Info

Publication number
IT1024658B
IT1024658B IT70139/74A IT7013974A IT1024658B IT 1024658 B IT1024658 B IT 1024658B IT 70139/74 A IT70139/74 A IT 70139/74A IT 7013974 A IT7013974 A IT 7013974A IT 1024658 B IT1024658 B IT 1024658B
Authority
IT
Italy
Prior art keywords
printed circuits
masking composition
negative masking
engraving printed
engraving
Prior art date
Application number
IT70139/74A
Other languages
English (en)
Italian (it)
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Application granted granted Critical
Publication of IT1024658B publication Critical patent/IT1024658B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Epoxy Resins (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
IT70139/74A 1973-10-23 1974-10-22 Composizione mascherante negativa, particolarmente per incisione di circuiti stampati IT1024658B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40892773A 1973-10-23 1973-10-23

Publications (1)

Publication Number Publication Date
IT1024658B true IT1024658B (it) 1978-07-20

Family

ID=23618345

Family Applications (1)

Application Number Title Priority Date Filing Date
IT70139/74A IT1024658B (it) 1973-10-23 1974-10-22 Composizione mascherante negativa, particolarmente per incisione di circuiti stampati

Country Status (9)

Country Link
JP (1) JPS5929852B2 (enrdf_load_stackoverflow)
BE (1) BE821326A (enrdf_load_stackoverflow)
CA (1) CA1032392A (enrdf_load_stackoverflow)
DE (1) DE2450381C3 (enrdf_load_stackoverflow)
FR (1) FR2248289B1 (enrdf_load_stackoverflow)
GB (1) GB1484873A (enrdf_load_stackoverflow)
IT (1) IT1024658B (enrdf_load_stackoverflow)
NL (1) NL163633C (enrdf_load_stackoverflow)
SE (1) SE419907B (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product
JPS5786831A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS5786830A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS57109943A (en) * 1980-12-26 1982-07-08 Nippon Telegr & Teleph Corp <Ntt> Formation of submicron pattern using radiation sensitive resist
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
GB2285141B (en) * 1993-12-23 1998-03-11 Motorola Ltd Method of removing photo resist

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3770433A (en) * 1972-03-22 1973-11-06 Bell Telephone Labor Inc High sensitivity negative electron resist

Also Published As

Publication number Publication date
DE2450381A1 (de) 1975-04-24
DE2450381B2 (de) 1979-07-19
FR2248289A1 (enrdf_load_stackoverflow) 1975-05-16
NL163633C (nl) 1980-09-15
JPS5074427A (enrdf_load_stackoverflow) 1975-06-19
CA1032392A (en) 1978-06-06
BE821326A (fr) 1975-02-17
JPS5929852B2 (ja) 1984-07-24
GB1484873A (en) 1977-09-08
NL163633B (nl) 1980-04-15
SE419907B (sv) 1981-08-31
DE2450381C3 (de) 1984-09-20
FR2248289B1 (enrdf_load_stackoverflow) 1979-03-16
SE7412962L (enrdf_load_stackoverflow) 1975-04-24
NL7413817A (nl) 1975-04-25

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19931028