BE821326A - Procede d'obtention d'un dessin sur une matiere de reserve durcissable sous l'effet d'un rayonnement a grande energie - Google Patents

Procede d'obtention d'un dessin sur une matiere de reserve durcissable sous l'effet d'un rayonnement a grande energie

Info

Publication number
BE821326A
BE821326A BE149750A BE149750A BE821326A BE 821326 A BE821326 A BE 821326A BE 149750 A BE149750 A BE 149750A BE 149750 A BE149750 A BE 149750A BE 821326 A BE821326 A BE 821326A
Authority
BE
Belgium
Prior art keywords
procedure
obtaining
effect
high energy
energy radiation
Prior art date
Application number
BE149750A
Other languages
English (en)
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE821326A publication Critical patent/BE821326A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
BE149750A 1973-10-23 1974-10-22 Procede d'obtention d'un dessin sur une matiere de reserve durcissable sous l'effet d'un rayonnement a grande energie BE821326A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40892773A 1973-10-23 1973-10-23

Publications (1)

Publication Number Publication Date
BE821326A true BE821326A (fr) 1975-02-17

Family

ID=23618345

Family Applications (1)

Application Number Title Priority Date Filing Date
BE149750A BE821326A (fr) 1973-10-23 1974-10-22 Procede d'obtention d'un dessin sur une matiere de reserve durcissable sous l'effet d'un rayonnement a grande energie

Country Status (9)

Country Link
JP (1) JPS5929852B2 (enrdf_load_stackoverflow)
BE (1) BE821326A (enrdf_load_stackoverflow)
CA (1) CA1032392A (enrdf_load_stackoverflow)
DE (1) DE2450381C3 (enrdf_load_stackoverflow)
FR (1) FR2248289B1 (enrdf_load_stackoverflow)
GB (1) GB1484873A (enrdf_load_stackoverflow)
IT (1) IT1024658B (enrdf_load_stackoverflow)
NL (1) NL163633C (enrdf_load_stackoverflow)
SE (1) SE419907B (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product
JPS5786830A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS5786831A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS57109943A (en) * 1980-12-26 1982-07-08 Nippon Telegr & Teleph Corp <Ntt> Formation of submicron pattern using radiation sensitive resist
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
GB2285141B (en) * 1993-12-23 1998-03-11 Motorola Ltd Method of removing photo resist

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3770433A (en) * 1972-03-22 1973-11-06 Bell Telephone Labor Inc High sensitivity negative electron resist

Also Published As

Publication number Publication date
GB1484873A (en) 1977-09-08
JPS5074427A (enrdf_load_stackoverflow) 1975-06-19
FR2248289B1 (enrdf_load_stackoverflow) 1979-03-16
FR2248289A1 (enrdf_load_stackoverflow) 1975-05-16
NL163633C (nl) 1980-09-15
DE2450381A1 (de) 1975-04-24
SE419907B (sv) 1981-08-31
DE2450381B2 (de) 1979-07-19
JPS5929852B2 (ja) 1984-07-24
SE7412962L (enrdf_load_stackoverflow) 1975-04-24
IT1024658B (it) 1978-07-20
CA1032392A (en) 1978-06-06
DE2450381C3 (de) 1984-09-20
NL7413817A (nl) 1975-04-25
NL163633B (nl) 1980-04-15

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Legal Events

Date Code Title Description
RE20 Patent expired

Owner name: WESTERN ELECTRIC CY INC.

Effective date: 19941022