GB1477871A - Method and apparatus for making a pattern by electron beam alignment on a semiconductor member - Google Patents

Method and apparatus for making a pattern by electron beam alignment on a semiconductor member

Info

Publication number
GB1477871A
GB1477871A GB2665774A GB2665774A GB1477871A GB 1477871 A GB1477871 A GB 1477871A GB 2665774 A GB2665774 A GB 2665774A GB 2665774 A GB2665774 A GB 2665774A GB 1477871 A GB1477871 A GB 1477871A
Authority
GB
United Kingdom
Prior art keywords
alignment
electron beam
detection areas
cathodo
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2665774A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CBS Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of GB1477871A publication Critical patent/GB1477871A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

1477871 Electron beam apparatus WESTINGHOUSE ELECTRIC CORP 17 June 1974 [19 June 1973 1 Oct 1973] 26657/74 Heading H1D [Also in Division G3] For the alignment of an electron beam(scanning or patterned) with a substrate, in the fabrication of (integrated) circuit patterns, (see Specifications 1,467,521 and 1,477,872 for disclosures of the methods and apparatus used), the alignment is achieved by detection of cathodo-luminescence from detection areas having "well", or "mesa" type configurations, of the semiconductor substrate (of SiC, Ge, GaAs or silicon). Detection area constructions, Figs. 3, 4 (not shown).-The substrate is locally thinner, or thicker in the detection areas (Figs. 3, 4), photodetectors (43, 44) detecting a relative increase, or decrease, resp. in the cathodo-luminescence occurring as the electron beam, or alignment portions thereof, approaches alignment. For a silicon substrate, the cathodo-luminescence is in the infra-red. The detection areas, subsequent to the alignment, may themselves be used as part of the circuit pattern. The detection areas may comprise circular, square or triangular shapes. Reference has been directed by the Comptroller to Specifications 1,330,502 and 1,291,575.
GB2665774A 1973-06-19 1974-06-17 Method and apparatus for making a pattern by electron beam alignment on a semiconductor member Expired GB1477871A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37144773A 1973-06-19 1973-06-19
US00402250A US3840749A (en) 1973-06-19 1973-10-01 Method and apparatus for electron beam alignment with a semiconductor member

Publications (1)

Publication Number Publication Date
GB1477871A true GB1477871A (en) 1977-06-29

Family

ID=27005390

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2665774A Expired GB1477871A (en) 1973-06-19 1974-06-17 Method and apparatus for making a pattern by electron beam alignment on a semiconductor member

Country Status (6)

Country Link
US (1) US3840749A (en)
JP (1) JPS583372B2 (en)
CA (1) CA1005176A (en)
DE (1) DE2428303A1 (en)
FR (1) FR2234659B1 (en)
GB (1) GB1477871A (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3895234A (en) * 1973-06-15 1975-07-15 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a member
US4008402A (en) * 1974-07-18 1977-02-15 Westinghouse Electric Corporation Method and apparatus for electron beam alignment with a member by detecting X-rays
JPS6041360B2 (en) * 1977-05-18 1985-09-17 株式会社東芝 Cursor display method
US4310743A (en) * 1979-09-24 1982-01-12 Hughes Aircraft Company Ion beam lithography process and apparatus using step-and-repeat exposure
JPS57119380U (en) * 1981-01-19 1982-07-24
GB2109538A (en) * 1981-11-02 1983-06-02 Philips Electronic Associated Electron beam alignment
US4968894A (en) * 1989-06-29 1990-11-06 Texas Instruments Incorporated Electrical field enhanced electron image projector
US6061606A (en) 1998-08-25 2000-05-09 International Business Machines Corporation Geometric phase analysis for mask alignment
US6476401B1 (en) * 1999-09-16 2002-11-05 Applied Materials, Inc. Moving photocathode with continuous regeneration for image conversion in electron beam lithography
FR2943456A1 (en) * 2009-03-19 2010-09-24 Centre Nat Rech Scient ELECTRONIC LITHOGRAPHY METHOD FOR IMAGING CATHODOLUMINESCENCE.
JP7007152B2 (en) * 2017-10-19 2022-01-24 株式会社アドバンテスト Three-dimensional laminated modeling equipment and laminated modeling method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1614635A1 (en) * 1967-10-23 1970-03-26 Siemens Ag Process for the production of photoresist masks for semiconductor purposes
US3710101A (en) * 1970-10-06 1973-01-09 Westinghouse Electric Corp Apparatus and method for alignment of members to electron beams

Also Published As

Publication number Publication date
CA1005176A (en) 1977-02-08
US3840749A (en) 1974-10-08
JPS583372B2 (en) 1983-01-21
FR2234659A1 (en) 1975-01-17
FR2234659B1 (en) 1978-10-20
JPS5037096A (en) 1975-04-07
DE2428303A1 (en) 1975-03-27

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee