CA1005176A - Method and apparatus for electron beam alignment with a semiconductor member - Google Patents

Method and apparatus for electron beam alignment with a semiconductor member

Info

Publication number
CA1005176A
CA1005176A CA202,059A CA202059A CA1005176A CA 1005176 A CA1005176 A CA 1005176A CA 202059 A CA202059 A CA 202059A CA 1005176 A CA1005176 A CA 1005176A
Authority
CA
Canada
Prior art keywords
electron beam
semiconductor member
beam alignment
alignment
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA202,059A
Other versions
CA202059S (en
Inventor
Alan J. Simon
Terence W. O'keeffe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CBS Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Application granted granted Critical
Publication of CA1005176A publication Critical patent/CA1005176A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
CA202,059A 1973-06-19 1974-06-10 Method and apparatus for electron beam alignment with a semiconductor member Expired CA1005176A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37144773A 1973-06-19 1973-06-19
US00402250A US3840749A (en) 1973-06-19 1973-10-01 Method and apparatus for electron beam alignment with a semiconductor member

Publications (1)

Publication Number Publication Date
CA1005176A true CA1005176A (en) 1977-02-08

Family

ID=27005390

Family Applications (1)

Application Number Title Priority Date Filing Date
CA202,059A Expired CA1005176A (en) 1973-06-19 1974-06-10 Method and apparatus for electron beam alignment with a semiconductor member

Country Status (6)

Country Link
US (1) US3840749A (en)
JP (1) JPS583372B2 (en)
CA (1) CA1005176A (en)
DE (1) DE2428303A1 (en)
FR (1) FR2234659B1 (en)
GB (1) GB1477871A (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3895234A (en) * 1973-06-15 1975-07-15 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a member
US4008402A (en) * 1974-07-18 1977-02-15 Westinghouse Electric Corporation Method and apparatus for electron beam alignment with a member by detecting X-rays
JPS6041360B2 (en) * 1977-05-18 1985-09-17 株式会社東芝 Cursor display method
US4310743A (en) * 1979-09-24 1982-01-12 Hughes Aircraft Company Ion beam lithography process and apparatus using step-and-repeat exposure
JPS57119380U (en) * 1981-01-19 1982-07-24
GB2109538A (en) * 1981-11-02 1983-06-02 Philips Electronic Associated Electron beam alignment
US4968894A (en) * 1989-06-29 1990-11-06 Texas Instruments Incorporated Electrical field enhanced electron image projector
US6061606A (en) 1998-08-25 2000-05-09 International Business Machines Corporation Geometric phase analysis for mask alignment
US6476401B1 (en) * 1999-09-16 2002-11-05 Applied Materials, Inc. Moving photocathode with continuous regeneration for image conversion in electron beam lithography
FR2943456A1 (en) * 2009-03-19 2010-09-24 Centre Nat Rech Scient ELECTRONIC LITHOGRAPHY METHOD FOR IMAGING CATHODOLUMINESCENCE.
JP7007152B2 (en) * 2017-10-19 2022-01-24 株式会社アドバンテスト Three-dimensional laminated modeling equipment and laminated modeling method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT301620B (en) * 1967-10-23 1972-08-15 Siemens Ag METHOD OF MANUFACTURING A PHOTO-LACQUER MASK FOR SEMICONDUCTIVE PURPOSES
US3710101A (en) * 1970-10-06 1973-01-09 Westinghouse Electric Corp Apparatus and method for alignment of members to electron beams

Also Published As

Publication number Publication date
FR2234659B1 (en) 1978-10-20
GB1477871A (en) 1977-06-29
JPS583372B2 (en) 1983-01-21
US3840749A (en) 1974-10-08
DE2428303A1 (en) 1975-03-27
JPS5037096A (en) 1975-04-07
FR2234659A1 (en) 1975-01-17

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