GB1476582A - Method of fabrication of semiconductor pressure transducer sensor units - Google Patents

Method of fabrication of semiconductor pressure transducer sensor units

Info

Publication number
GB1476582A
GB1476582A GB1013175A GB1013175A GB1476582A GB 1476582 A GB1476582 A GB 1476582A GB 1013175 A GB1013175 A GB 1013175A GB 1013175 A GB1013175 A GB 1013175A GB 1476582 A GB1476582 A GB 1476582A
Authority
GB
United Kingdom
Prior art keywords
cavities
semi
pressure transducer
conductor
ports
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1013175A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Semiconductor Corp
Original Assignee
National Semiconductor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Semiconductor Corp filed Critical National Semiconductor Corp
Publication of GB1476582A publication Critical patent/GB1476582A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W99/00—Subject matter not provided for in other groups of this subclass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/60—Wet etching
    • H10P50/64—Wet etching of semiconductor materials
    • H10P50/642—Chemical etching
    • H10P50/644—Anisotropic liquid etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/42—Piezoelectric device making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49103—Strain gauge making

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measuring Fluid Pressure (AREA)
  • Pressure Sensors (AREA)
GB1013175A 1974-03-27 1975-03-11 Method of fabrication of semiconductor pressure transducer sensor units Expired GB1476582A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US455050A US3909924A (en) 1974-03-27 1974-03-27 Method of fabrication of silicon pressure transducer sensor units

Publications (1)

Publication Number Publication Date
GB1476582A true GB1476582A (en) 1977-06-16

Family

ID=23807177

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1013175A Expired GB1476582A (en) 1974-03-27 1975-03-11 Method of fabrication of semiconductor pressure transducer sensor units

Country Status (6)

Country Link
US (1) US3909924A (enExample)
JP (1) JPS5759675B2 (enExample)
CA (1) CA1016668A (enExample)
DE (1) DE2503781C2 (enExample)
FR (1) FR2266314B1 (enExample)
GB (1) GB1476582A (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4121334A (en) * 1974-12-17 1978-10-24 P. R. Mallory & Co. Inc. Application of field-assisted bonding to the mass production of silicon type pressure transducers
US4023562A (en) * 1975-09-02 1977-05-17 Case Western Reserve University Miniature pressure transducer for medical use and assembly method
US4144516A (en) * 1976-03-29 1979-03-13 Aine Harry E Solid state transducer and method of making same
US4133100A (en) * 1976-12-27 1979-01-09 Myhre Kjell E Method of making diaphragm of optimized stress and strain distribution
US4376929A (en) * 1976-12-27 1983-03-15 Myhre Kjell E Optimized stress and strain distribution diaphragms
US4317126A (en) * 1980-04-14 1982-02-23 Motorola, Inc. Silicon pressure sensor
US4790192A (en) * 1987-09-24 1988-12-13 Rosemount Inc. Silicon side by side coplanar pressure sensors
US4987780A (en) * 1987-11-16 1991-01-29 Litton Systems, Inc. Integrated accelerometer assembly
US5006487A (en) * 1989-07-27 1991-04-09 Honeywell Inc. Method of making an electrostatic silicon accelerometer
JPH0352186U (enExample) * 1989-09-28 1991-05-21
US6903084B2 (en) 1991-08-28 2005-06-07 Sterix Limited Steroid sulphatase inhibitors
US5616514A (en) * 1993-06-03 1997-04-01 Robert Bosch Gmbh Method of fabricating a micromechanical sensor
US5736430A (en) * 1995-06-07 1998-04-07 Ssi Technologies, Inc. Transducer having a silicon diaphragm and method for forming same
US6021675A (en) * 1995-06-07 2000-02-08 Ssi Technologies, Inc. Resonating structure and method for forming the resonating structure
CA2176052A1 (en) * 1995-06-07 1996-12-08 James D. Seefeldt Transducer having a resonating silicon beam and method for forming same
US5636729A (en) * 1995-06-12 1997-06-10 Wiciel; Richard Piezo switch
DE69706213T2 (de) * 1996-04-04 2002-05-16 Ssi Technologies, Inc. Druckmessgerät und Verfahren zu seiner Herstellung
US5874679A (en) * 1996-04-04 1999-02-23 Ssi Technologies, Inc. Pressure sensor package and method of making the same
US5831170A (en) * 1996-04-04 1998-11-03 Ssi Technologies, Inc. Pressure sensor package and method of making the same
US5999082A (en) * 1998-03-25 1999-12-07 Kulite Semiconductor Products, Inc. Compensated oil-filled pressure transducers
US7273763B1 (en) * 1998-12-15 2007-09-25 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Method of producing a micro-electromechanical element
US7335650B2 (en) * 2000-01-14 2008-02-26 Sterix Limited Composition
JP2006237118A (ja) * 2005-02-23 2006-09-07 Matsushita Electric Ind Co Ltd 圧電素子の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3160539A (en) * 1958-09-08 1964-12-08 Trw Semiconductors Inc Surface treatment of silicon
US3757414A (en) * 1971-03-26 1973-09-11 Honeywell Inc Method for batch fabricating semiconductor devices

Also Published As

Publication number Publication date
FR2266314B1 (enExample) 1980-11-07
JPS5759675B2 (enExample) 1982-12-15
US3909924A (en) 1975-10-07
FR2266314A1 (enExample) 1975-10-24
JPS50129187A (enExample) 1975-10-13
DE2503781A1 (de) 1976-02-05
CA1016668A (en) 1977-08-30
DE2503781C2 (de) 1984-06-28

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee