GB1474073A - Photosensitive compositions and presensitized lithographic plates prepared therewith - Google Patents

Photosensitive compositions and presensitized lithographic plates prepared therewith

Info

Publication number
GB1474073A
GB1474073A GB2727474A GB2727474A GB1474073A GB 1474073 A GB1474073 A GB 1474073A GB 2727474 A GB2727474 A GB 2727474A GB 2727474 A GB2727474 A GB 2727474A GB 1474073 A GB1474073 A GB 1474073A
Authority
GB
United Kingdom
Prior art keywords
resin
specified
resins
phenolic
june
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2727474A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of GB1474073A publication Critical patent/GB1474073A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
GB2727474A 1973-06-20 1974-06-19 Photosensitive compositions and presensitized lithographic plates prepared therewith Expired GB1474073A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US37157873A 1973-06-20 1973-06-20

Publications (1)

Publication Number Publication Date
GB1474073A true GB1474073A (en) 1977-05-18

Family

ID=23464533

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2727474A Expired GB1474073A (en) 1973-06-20 1974-06-19 Photosensitive compositions and presensitized lithographic plates prepared therewith

Country Status (12)

Country Link
JP (1) JPS5036210A (xx)
AR (1) AR205345A1 (xx)
AU (1) AU470155B2 (xx)
BR (1) BR7405009D0 (xx)
CA (1) CA1024803A (xx)
CH (1) CH607095A5 (xx)
DE (1) DE2429251A1 (xx)
FR (1) FR2234583A1 (xx)
GB (1) GB1474073A (xx)
IT (1) IT1015190B (xx)
SE (1) SE7407618L (xx)
ZA (1) ZA743952B (xx)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0070201A1 (en) * 1981-07-15 1983-01-19 Konica Corporation A photosensitive composite
US5045429A (en) * 1985-08-07 1991-09-03 Hoechst Aktiengesellschaft Light-sensitive photopolymerizable and diazonium resin containing composition and recording material including reaction product of anhydride with carboxylic acid and vinyl alcohol
US5187040A (en) * 1989-06-21 1993-02-16 Hoechst Aktiengesellschaft Photocurable mixture and material containing diazonium salt polycondensation product or organic azido compound photosensitizer and polyurethane binder grafted with vinyl alcohol and vinyl acetal units
EP2233288A1 (en) * 2009-03-23 2010-09-29 Founder Fine Chemical Industry Co., Ltd. Radiation sensitive composition and method for preparing radiation sensitive composition

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2617088A1 (de) * 1975-04-29 1976-11-11 Hoechst Co American Lichtempfindliche kopiermasse
US4189320A (en) * 1975-04-29 1980-02-19 American Hoechst Corporation Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures
CA1119447A (en) * 1978-09-06 1982-03-09 John P. Vikesland Positive-acting photoresist composition containing a crosslinked urethane resin, a cured epoxy resin and a photosensitizer
JPS6043892B2 (ja) * 1980-11-08 1985-10-01 住友金属工業株式会社 高張力線の製造方法
JPS601931B2 (ja) * 1980-11-08 1985-01-18 住友金属工業株式会社 高張力線の製造方法
DE3404366A1 (de) * 1984-02-08 1985-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
CA1308595C (en) * 1985-11-22 1992-10-13 Toshiaki Aoai Photosensitive composition
DE3617499A1 (de) * 1986-05-24 1987-11-26 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3644163A1 (de) * 1986-12-23 1988-07-07 Hoechst Ag Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3644161A1 (de) * 1986-12-23 1988-07-07 Hoechst Ag Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3811242A1 (de) * 1988-04-02 1989-10-19 Hoechst Ag Im waessrigem alkali loesliche, silanylgruppen in der seitenkette enthaltende bindemittel, verfahren zu deren herstellung sowie lichtempfindliches gemisch, enthaltend diese verbindungen
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0070201A1 (en) * 1981-07-15 1983-01-19 Konica Corporation A photosensitive composite
US5045429A (en) * 1985-08-07 1991-09-03 Hoechst Aktiengesellschaft Light-sensitive photopolymerizable and diazonium resin containing composition and recording material including reaction product of anhydride with carboxylic acid and vinyl alcohol
US5187040A (en) * 1989-06-21 1993-02-16 Hoechst Aktiengesellschaft Photocurable mixture and material containing diazonium salt polycondensation product or organic azido compound photosensitizer and polyurethane binder grafted with vinyl alcohol and vinyl acetal units
EP2233288A1 (en) * 2009-03-23 2010-09-29 Founder Fine Chemical Industry Co., Ltd. Radiation sensitive composition and method for preparing radiation sensitive composition

Also Published As

Publication number Publication date
AU7023974A (en) 1976-01-08
SE7407618L (xx) 1974-12-23
FR2234583A1 (xx) 1975-01-17
DE2429251A1 (de) 1975-01-02
JPS5036210A (xx) 1975-04-05
CA1024803A (en) 1978-01-24
AR205345A1 (es) 1976-04-30
BR7405009D0 (pt) 1975-09-30
ZA743952B (en) 1975-06-25
CH607095A5 (xx) 1978-11-30
AU470155B2 (en) 1976-03-04
IT1015190B (it) 1977-05-10

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee