JPS56122028A - Alkali-soluble photosensitive resin composition - Google Patents

Alkali-soluble photosensitive resin composition

Info

Publication number
JPS56122028A
JPS56122028A JP2475580A JP2475580A JPS56122028A JP S56122028 A JPS56122028 A JP S56122028A JP 2475580 A JP2475580 A JP 2475580A JP 2475580 A JP2475580 A JP 2475580A JP S56122028 A JPS56122028 A JP S56122028A
Authority
JP
Japan
Prior art keywords
resin composition
photosensitive
photosensitive resin
polymer
vinylphenol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2475580A
Other languages
Japanese (ja)
Inventor
Koichiro Arita
Keiji Kubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Corp
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Corp, Daicel Chemical Industries Ltd filed Critical Daicel Corp
Priority to JP2475580A priority Critical patent/JPS56122028A/en
Publication of JPS56122028A publication Critical patent/JPS56122028A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE:To obtain the titled composition with superior film strength, shelf stability and resolution by adding a photosensitive polymer having specified two repeating units in the same molecule. CONSTITUTION:This photosensitive resin composition contains a photosensitive polymer having both repeating units represented by formulae A, B in the same molecule. The polymer is prepared as follows: for example, p-vinylphenol is thermally polymerized, and the hydroxyl groups of the resulting poly-p-vinylphenol with 3,000-8,000wt. average mole weight are partially esterified by reaction with acid chloride having a photosensitive group. An aqueous soln. of sodium metasilicate, sodium hydroxide, sodium tertiary phosphate or a mixture thereof may be used as a developer for the composition.
JP2475580A 1980-02-29 1980-02-29 Alkali-soluble photosensitive resin composition Pending JPS56122028A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2475580A JPS56122028A (en) 1980-02-29 1980-02-29 Alkali-soluble photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2475580A JPS56122028A (en) 1980-02-29 1980-02-29 Alkali-soluble photosensitive resin composition

Publications (1)

Publication Number Publication Date
JPS56122028A true JPS56122028A (en) 1981-09-25

Family

ID=12146955

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2475580A Pending JPS56122028A (en) 1980-02-29 1980-02-29 Alkali-soluble photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS56122028A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0226009A2 (en) * 1985-12-17 1987-06-24 International Business Machines Corporation Photoresist compositions of controlled dissolution rate in alkaline developers
JPS63200626A (en) * 1987-02-16 1988-08-18 Toyo Commun Equip Co Ltd Inductive communication system
JPH0311351A (en) * 1989-06-09 1991-01-18 Tosoh Corp Negative type photosensitive resin composition
US5712022A (en) * 1992-09-14 1998-01-27 Yoshino Kogyosho Co., Ltd. Printed thermoplastic resin products and method for printing such products
US6258507B1 (en) 1998-03-26 2001-07-10 Sumitomo Chemical Company, Limited Photoresist compositions

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4887902A (en) * 1972-02-24 1973-11-19
JPS49103619A (en) * 1973-02-02 1974-10-01

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4887902A (en) * 1972-02-24 1973-11-19
JPS49103619A (en) * 1973-02-02 1974-10-01

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0226009A2 (en) * 1985-12-17 1987-06-24 International Business Machines Corporation Photoresist compositions of controlled dissolution rate in alkaline developers
JPS63200626A (en) * 1987-02-16 1988-08-18 Toyo Commun Equip Co Ltd Inductive communication system
JPH0311351A (en) * 1989-06-09 1991-01-18 Tosoh Corp Negative type photosensitive resin composition
US5712022A (en) * 1992-09-14 1998-01-27 Yoshino Kogyosho Co., Ltd. Printed thermoplastic resin products and method for printing such products
US6258507B1 (en) 1998-03-26 2001-07-10 Sumitomo Chemical Company, Limited Photoresist compositions

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