JPS56122028A - Alkali-soluble photosensitive resin composition - Google Patents
Alkali-soluble photosensitive resin compositionInfo
- Publication number
- JPS56122028A JPS56122028A JP2475580A JP2475580A JPS56122028A JP S56122028 A JPS56122028 A JP S56122028A JP 2475580 A JP2475580 A JP 2475580A JP 2475580 A JP2475580 A JP 2475580A JP S56122028 A JPS56122028 A JP S56122028A
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- photosensitive
- photosensitive resin
- polymer
- vinylphenol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
PURPOSE:To obtain the titled composition with superior film strength, shelf stability and resolution by adding a photosensitive polymer having specified two repeating units in the same molecule. CONSTITUTION:This photosensitive resin composition contains a photosensitive polymer having both repeating units represented by formulae A, B in the same molecule. The polymer is prepared as follows: for example, p-vinylphenol is thermally polymerized, and the hydroxyl groups of the resulting poly-p-vinylphenol with 3,000-8,000wt. average mole weight are partially esterified by reaction with acid chloride having a photosensitive group. An aqueous soln. of sodium metasilicate, sodium hydroxide, sodium tertiary phosphate or a mixture thereof may be used as a developer for the composition.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2475580A JPS56122028A (en) | 1980-02-29 | 1980-02-29 | Alkali-soluble photosensitive resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2475580A JPS56122028A (en) | 1980-02-29 | 1980-02-29 | Alkali-soluble photosensitive resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56122028A true JPS56122028A (en) | 1981-09-25 |
Family
ID=12146955
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2475580A Pending JPS56122028A (en) | 1980-02-29 | 1980-02-29 | Alkali-soluble photosensitive resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56122028A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0226009A2 (en) * | 1985-12-17 | 1987-06-24 | International Business Machines Corporation | Photoresist compositions of controlled dissolution rate in alkaline developers |
JPS63200626A (en) * | 1987-02-16 | 1988-08-18 | Toyo Commun Equip Co Ltd | Inductive communication system |
JPH0311351A (en) * | 1989-06-09 | 1991-01-18 | Tosoh Corp | Negative type photosensitive resin composition |
US5712022A (en) * | 1992-09-14 | 1998-01-27 | Yoshino Kogyosho Co., Ltd. | Printed thermoplastic resin products and method for printing such products |
US6258507B1 (en) | 1998-03-26 | 2001-07-10 | Sumitomo Chemical Company, Limited | Photoresist compositions |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4887902A (en) * | 1972-02-24 | 1973-11-19 | ||
JPS49103619A (en) * | 1973-02-02 | 1974-10-01 |
-
1980
- 1980-02-29 JP JP2475580A patent/JPS56122028A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4887902A (en) * | 1972-02-24 | 1973-11-19 | ||
JPS49103619A (en) * | 1973-02-02 | 1974-10-01 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0226009A2 (en) * | 1985-12-17 | 1987-06-24 | International Business Machines Corporation | Photoresist compositions of controlled dissolution rate in alkaline developers |
JPS63200626A (en) * | 1987-02-16 | 1988-08-18 | Toyo Commun Equip Co Ltd | Inductive communication system |
JPH0311351A (en) * | 1989-06-09 | 1991-01-18 | Tosoh Corp | Negative type photosensitive resin composition |
US5712022A (en) * | 1992-09-14 | 1998-01-27 | Yoshino Kogyosho Co., Ltd. | Printed thermoplastic resin products and method for printing such products |
US6258507B1 (en) | 1998-03-26 | 2001-07-10 | Sumitomo Chemical Company, Limited | Photoresist compositions |
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