JPS57168944A - Photocurable resin composition - Google Patents

Photocurable resin composition

Info

Publication number
JPS57168944A
JPS57168944A JP4038782A JP4038782A JPS57168944A JP S57168944 A JPS57168944 A JP S57168944A JP 4038782 A JP4038782 A JP 4038782A JP 4038782 A JP4038782 A JP 4038782A JP S57168944 A JPS57168944 A JP S57168944A
Authority
JP
Japan
Prior art keywords
prepolymer
group
aromatic
photosensitizer
photopolymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4038782A
Other languages
Japanese (ja)
Inventor
Satoshi Ayano
Morio Take
Nobuyuki Ikeguchi
Hidenori Kanehara
Yasunari Osaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP4038782A priority Critical patent/JPS57168944A/en
Publication of JPS57168944A publication Critical patent/JPS57168944A/en
Pending legal-status Critical Current

Links

Landscapes

  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

PURPOSE: To provide the titled composition excellent in heat resistance which comprises an ester of cyanic acid, maleimide, a photopolymerizable or photocrosslinkable compound, a photosensitizer or photopolymerization initiator, and a thermocuring catalyst or curing agent.
CONSTITUTION: The titled composition is prepared by compounding (A) a polyfunctional cyanate ester of formulaI(wherein m is 2W5; R1 is an aromatic group and the cyanate group is connected to the aromatic ring of this aromatic group) or a cyanate ester prepolymer, (B) a prepolymer prepared from a polyfunctional maleimide of formula II (wherein R2 is H 2W5-valent aromatic or alicyclic group; n is generaly 2W5) and an amine, (C) a photopolymerizable or photocrosslinkable monomer or its prepolymer, (D) a photosensitizer or photopolymerization initiator, and (E) a thermocuring catalyst or curing agent.
COPYRIGHT: (C)1982,JPO&Japio
JP4038782A 1982-03-15 1982-03-15 Photocurable resin composition Pending JPS57168944A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4038782A JPS57168944A (en) 1982-03-15 1982-03-15 Photocurable resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4038782A JPS57168944A (en) 1982-03-15 1982-03-15 Photocurable resin composition

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP4588280A Division JPS56141321A (en) 1980-04-08 1980-04-08 Photosetting resin composition

Publications (1)

Publication Number Publication Date
JPS57168944A true JPS57168944A (en) 1982-10-18

Family

ID=12579237

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4038782A Pending JPS57168944A (en) 1982-03-15 1982-03-15 Photocurable resin composition

Country Status (1)

Country Link
JP (1) JPS57168944A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01203464A (en) * 1988-02-09 1989-08-16 Shin Etsu Chem Co Ltd Maleimide resin composition, its cured product and semiconductor device using same
KR100479686B1 (en) * 2002-02-25 2005-03-30 한국과학기술연구원 A thermally stable polymer containing n-hydroxyphenylmaleimide, and an anti-reflective coating compositon for photolithography comprising the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53149300A (en) * 1977-06-01 1978-12-26 Ciba Geigy Ag Thermal setting composite material and its manufacture
JPS5473900A (en) * 1977-11-25 1979-06-13 Mitsubishi Gas Chem Co Inc Curable resin composition
JPS56141321A (en) * 1980-04-08 1981-11-05 Mitsubishi Gas Chem Co Inc Photosetting resin composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53149300A (en) * 1977-06-01 1978-12-26 Ciba Geigy Ag Thermal setting composite material and its manufacture
JPS5473900A (en) * 1977-11-25 1979-06-13 Mitsubishi Gas Chem Co Inc Curable resin composition
JPS56141321A (en) * 1980-04-08 1981-11-05 Mitsubishi Gas Chem Co Inc Photosetting resin composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01203464A (en) * 1988-02-09 1989-08-16 Shin Etsu Chem Co Ltd Maleimide resin composition, its cured product and semiconductor device using same
KR100479686B1 (en) * 2002-02-25 2005-03-30 한국과학기술연구원 A thermally stable polymer containing n-hydroxyphenylmaleimide, and an anti-reflective coating compositon for photolithography comprising the same

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