AR205345A1 - Composicion organofilica fotosensible y placa litografica preparada con la misma - Google Patents

Composicion organofilica fotosensible y placa litografica preparada con la misma

Info

Publication number
AR205345A1
AR205345A1 AR254272A AR25427274A AR205345A1 AR 205345 A1 AR205345 A1 AR 205345A1 AR 254272 A AR254272 A AR 254272A AR 25427274 A AR25427274 A AR 25427274A AR 205345 A1 AR205345 A1 AR 205345A1
Authority
AR
Argentina
Prior art keywords
photosensitive
same
lithographic plate
plate prepared
organophilic
Prior art date
Application number
AR254272A
Other languages
English (en)
Spanish (es)
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Application granted granted Critical
Publication of AR205345A1 publication Critical patent/AR205345A1/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
AR254272A 1973-06-20 1974-01-01 Composicion organofilica fotosensible y placa litografica preparada con la misma AR205345A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US37157873A 1973-06-20 1973-06-20

Publications (1)

Publication Number Publication Date
AR205345A1 true AR205345A1 (es) 1976-04-30

Family

ID=23464533

Family Applications (1)

Application Number Title Priority Date Filing Date
AR254272A AR205345A1 (es) 1973-06-20 1974-01-01 Composicion organofilica fotosensible y placa litografica preparada con la misma

Country Status (12)

Country Link
JP (1) JPS5036210A (xx)
AR (1) AR205345A1 (xx)
AU (1) AU470155B2 (xx)
BR (1) BR7405009D0 (xx)
CA (1) CA1024803A (xx)
CH (1) CH607095A5 (xx)
DE (1) DE2429251A1 (xx)
FR (1) FR2234583A1 (xx)
GB (1) GB1474073A (xx)
IT (1) IT1015190B (xx)
SE (1) SE7407618L (xx)
ZA (1) ZA743952B (xx)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2617088A1 (de) * 1975-04-29 1976-11-11 Hoechst Co American Lichtempfindliche kopiermasse
US4189320A (en) * 1975-04-29 1980-02-19 American Hoechst Corporation Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures
CA1119447A (en) * 1978-09-06 1982-03-09 John P. Vikesland Positive-acting photoresist composition containing a crosslinked urethane resin, a cured epoxy resin and a photosensitizer
JPS6043892B2 (ja) * 1980-11-08 1985-10-01 住友金属工業株式会社 高張力線の製造方法
JPS601931B2 (ja) * 1980-11-08 1985-01-18 住友金属工業株式会社 高張力線の製造方法
JPS5811932A (ja) * 1981-07-15 1983-01-22 Konishiroku Photo Ind Co Ltd 感光性組成物
DE3404366A1 (de) * 1984-02-08 1985-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3528309A1 (de) * 1985-08-07 1987-02-12 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
CA1308595C (en) * 1985-11-22 1992-10-13 Toshiaki Aoai Photosensitive composition
DE3617499A1 (de) * 1986-05-24 1987-11-26 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3644163A1 (de) * 1986-12-23 1988-07-07 Hoechst Ag Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3644161A1 (de) * 1986-12-23 1988-07-07 Hoechst Ag Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3811242A1 (de) * 1988-04-02 1989-10-19 Hoechst Ag Im waessrigem alkali loesliche, silanylgruppen in der seitenkette enthaltende bindemittel, verfahren zu deren herstellung sowie lichtempfindliches gemisch, enthaltend diese verbindungen
DE3920230A1 (de) * 1989-06-21 1991-01-24 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof
EP2233288A1 (en) * 2009-03-23 2010-09-29 Founder Fine Chemical Industry Co., Ltd. Radiation sensitive composition and method for preparing radiation sensitive composition

Also Published As

Publication number Publication date
AU7023974A (en) 1976-01-08
SE7407618L (xx) 1974-12-23
FR2234583A1 (xx) 1975-01-17
DE2429251A1 (de) 1975-01-02
JPS5036210A (xx) 1975-04-05
CA1024803A (en) 1978-01-24
GB1474073A (en) 1977-05-18
BR7405009D0 (pt) 1975-09-30
ZA743952B (en) 1975-06-25
CH607095A5 (xx) 1978-11-30
AU470155B2 (en) 1976-03-04
IT1015190B (it) 1977-05-10

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