GB1443827A - Reactive sputtering apparatus and cathode units therefor - Google Patents

Reactive sputtering apparatus and cathode units therefor

Info

Publication number
GB1443827A
GB1443827A GB2018473A GB2018473A GB1443827A GB 1443827 A GB1443827 A GB 1443827A GB 2018473 A GB2018473 A GB 2018473A GB 2018473 A GB2018473 A GB 2018473A GB 1443827 A GB1443827 A GB 1443827A
Authority
GB
United Kingdom
Prior art keywords
cathode
substrate
april
working
reactive sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2018473A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pilkington Automotive Ltd
Original Assignee
Triplex Safety Glass Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Triplex Safety Glass Co filed Critical Triplex Safety Glass Co
Priority to GB2018473A priority Critical patent/GB1443827A/en
Priority to CA197,030A priority patent/CA1024937A/en
Priority to DE2418008A priority patent/DE2418008A1/de
Priority to AU67757/74A priority patent/AU482170B2/en
Priority to NL7404891A priority patent/NL7404891A/xx
Priority to US459988A priority patent/US3890217A/en
Priority to IT12736/74A priority patent/IT1010755B/it
Priority to ZA00742375A priority patent/ZA742375B/xx
Priority to FR7413485A priority patent/FR2227345B1/fr
Priority to CH551774A priority patent/CH590936A5/xx
Priority to SE7405594A priority patent/SE408913B/xx
Priority to SU2023934A priority patent/SU764619A3/ru
Priority to BE143706A priority patent/BE814286A/xx
Priority to JP4715974A priority patent/JPS539594B2/ja
Publication of GB1443827A publication Critical patent/GB1443827A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB2018473A 1973-04-27 1973-04-27 Reactive sputtering apparatus and cathode units therefor Expired GB1443827A (en)

Priority Applications (14)

Application Number Priority Date Filing Date Title
GB2018473A GB1443827A (en) 1973-04-27 1973-04-27 Reactive sputtering apparatus and cathode units therefor
CA197,030A CA1024937A (en) 1973-04-27 1974-04-08 Reactive sputtering apparatus and cathode elements therefor
DE2418008A DE2418008A1 (de) 1973-04-27 1974-04-09 Kathode fuer kathodenzerstaeubungsgeraete sowie mit derartigen kathoden ausgeruestete kathodenzerstaeubungsgeraete
AU67757/74A AU482170B2 (en) 1973-04-27 1974-04-10 Improvements relating to reactive sputtering apparatus and cathode elements therefor
NL7404891A NL7404891A (enrdf_load_stackoverflow) 1973-04-27 1974-04-10
US459988A US3890217A (en) 1973-04-27 1974-04-11 Reactive sputtering apparatus and cathode elements therefor
IT12736/74A IT1010755B (it) 1973-04-27 1974-04-12 Unita catodica schermata perfezio nata atta ad essere usata in un apparato per depositare su un oggetto mediante sublimazione reattiva di un ossido metallico una pellicola trasparente elettri camente conduttrice
ZA00742375A ZA742375B (en) 1973-04-27 1974-04-16 Improvements relating to reactive sputtering apparatus and cathode elements therefor
FR7413485A FR2227345B1 (enrdf_load_stackoverflow) 1973-04-27 1974-04-18
CH551774A CH590936A5 (enrdf_load_stackoverflow) 1973-04-27 1974-04-22
SE7405594A SE408913B (sv) 1973-04-27 1974-04-25 Katod for anvendning vid reaktiv katodforstoftning
SU2023934A SU764619A3 (ru) 1973-04-27 1974-04-26 Катодный блок
BE143706A BE814286A (fr) 1973-04-27 1974-04-26 Perfectionnements aux appareils de pulverisation reactive et elements de cathodes pour cet appareil
JP4715974A JPS539594B2 (enrdf_load_stackoverflow) 1973-04-27 1974-04-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2018473A GB1443827A (en) 1973-04-27 1973-04-27 Reactive sputtering apparatus and cathode units therefor

Publications (1)

Publication Number Publication Date
GB1443827A true GB1443827A (en) 1976-07-28

Family

ID=10141798

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2018473A Expired GB1443827A (en) 1973-04-27 1973-04-27 Reactive sputtering apparatus and cathode units therefor

Country Status (13)

Country Link
US (1) US3890217A (enrdf_load_stackoverflow)
JP (1) JPS539594B2 (enrdf_load_stackoverflow)
BE (1) BE814286A (enrdf_load_stackoverflow)
CA (1) CA1024937A (enrdf_load_stackoverflow)
CH (1) CH590936A5 (enrdf_load_stackoverflow)
DE (1) DE2418008A1 (enrdf_load_stackoverflow)
FR (1) FR2227345B1 (enrdf_load_stackoverflow)
GB (1) GB1443827A (enrdf_load_stackoverflow)
IT (1) IT1010755B (enrdf_load_stackoverflow)
NL (1) NL7404891A (enrdf_load_stackoverflow)
SE (1) SE408913B (enrdf_load_stackoverflow)
SU (1) SU764619A3 (enrdf_load_stackoverflow)
ZA (1) ZA742375B (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3945911A (en) * 1974-08-28 1976-03-23 Shatterproof Glass Corporation Cathodes for sputter-coating glass sheets or other substrates
US3976555A (en) * 1975-03-20 1976-08-24 Coulter Information Systems, Inc. Method and apparatus for supplying background gas in a sputtering chamber
US4009090A (en) * 1975-12-03 1977-02-22 Shatterproof Glass Corporation Sputter-coating of glass sheets or other substrates
FR2403645A2 (fr) * 1977-09-14 1979-04-13 Vide & Traitement Sa Four pour le traitement thermochimique, en continu, de pieces metalliques, par bombardement ionique
US4116806A (en) * 1977-12-08 1978-09-26 Battelle Development Corporation Two-sided planar magnetron sputtering apparatus
US4175030A (en) * 1977-12-08 1979-11-20 Battelle Development Corporation Two-sided planar magnetron sputtering apparatus
JPS57111031A (en) * 1980-12-27 1982-07-10 Clarion Co Ltd Sputtering device
US4362611A (en) * 1981-07-27 1982-12-07 International Business Machines Corporation Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield
US4420385A (en) * 1983-04-15 1983-12-13 Gryphon Products Apparatus and process for sputter deposition of reacted thin films
US4526670A (en) * 1983-05-20 1985-07-02 Lfe Corporation Automatically loadable multifaceted electrode with load lock mechanism
US20050211544A1 (en) * 2004-03-29 2005-09-29 Seagate Technology Llc Electrical biasing of gas introduction means of plasma apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3325394A (en) * 1963-07-01 1967-06-13 Ibm Magnetic control of film deposition
US3526584A (en) * 1964-09-25 1970-09-01 Western Electric Co Method of providing a field free region above a substrate during sputter-depositing thereon
US3369991A (en) * 1965-01-28 1968-02-20 Ibm Apparatus for cathode sputtering including a shielded rf electrode
US3361659A (en) * 1967-08-14 1968-01-02 Ibm Process of depositing thin films by cathode sputtering using a controlled grid
US3595775A (en) * 1969-05-15 1971-07-27 United Aircraft Corp Sputtering apparatus with sealed cathode-shield chamber

Also Published As

Publication number Publication date
IT1010755B (it) 1977-01-20
SU764619A3 (ru) 1980-09-15
CH590936A5 (enrdf_load_stackoverflow) 1977-08-31
FR2227345B1 (enrdf_load_stackoverflow) 1977-10-14
BE814286A (fr) 1974-10-28
US3890217A (en) 1975-06-17
FR2227345A1 (enrdf_load_stackoverflow) 1974-11-22
CA1024937A (en) 1978-01-24
ZA742375B (en) 1975-11-26
JPS5013275A (enrdf_load_stackoverflow) 1975-02-12
DE2418008A1 (de) 1974-11-21
JPS539594B2 (enrdf_load_stackoverflow) 1978-04-06
NL7404891A (enrdf_load_stackoverflow) 1974-10-29
AU6775774A (en) 1975-10-16
SE408913B (sv) 1979-07-16

Similar Documents

Publication Publication Date Title
GB1443827A (en) Reactive sputtering apparatus and cathode units therefor
EP0205028B1 (de) Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat
DE69426003T2 (de) Verfahren und Vorrichtung zur Kathodenzerstäubung
DE2463431C2 (enrdf_load_stackoverflow)
US4112137A (en) Process for coating insulating substrates by reactive ion plating
EP0014819B1 (en) Sputtering cathode and system for sputter-coating large area substrates
GB1465745A (en) Sputtering apparatus
GB1404640A (en) Gas discharge panel display apparatus
ES399506A1 (es) Un metodo para depositar una pelicula transparente y elec- tricamente conductora de un oxido metalico.
MY112448A (en) Use of multiple anodes in a magnetron for improving the uniformity of its plasma
EP0755461A1 (de) Verfahren und einrichtung für die ionengestützte vakuumbeschichtung
DE3634710C2 (enrdf_load_stackoverflow)
JPS57106513A (en) Formation of carbon film
GB1242492A (en) Improvements relating to the coating of a substrate by r.f. sputtering
GB1257015A (enrdf_load_stackoverflow)
GB1132867A (en) Improvements in or relating to apparatus for depositing thin films
GB976678A (en) Improvements in or relating to electron beam furnaces
US3693582A (en) Apparatus for applying a metal coating to an elongated metal article
DE68917588T2 (de) Verfahren und Vorrichtung zum kontinuierlichen Ätzen und Beschichten von rostfreien Stahlbändern mit Aluminium.
GB1446848A (en) Sputtered metal oxide coatings articles comprising transparent electrically-conductive coatings on non-conducting substrates
JPS57194254A (en) Cathode for insulator target in rf sputtering
US3594238A (en) Method for treating aluminum surfaces to prevent discoloration
EP0794014B1 (de) Verfahren und Einrichtung zur Hochfrequenz-Plasmapolymerisation
DE1521175B2 (de) Vorrichtung zur verdampfung von werkstoffen im vakuum
DE4225352C1 (de) Vorrichtung zum reaktiven Aufdampfen von Metallverbindungen und Verfahren

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee