AU6775774A - Improvements relating to reactive sputtering apparatus and cathode elements therefor - Google Patents
Improvements relating to reactive sputtering apparatus and cathode elements thereforInfo
- Publication number
- AU6775774A AU6775774A AU67757/74A AU6775774A AU6775774A AU 6775774 A AU6775774 A AU 6775774A AU 67757/74 A AU67757/74 A AU 67757/74A AU 6775774 A AU6775774 A AU 6775774A AU 6775774 A AU6775774 A AU 6775774A
- Authority
- AU
- Australia
- Prior art keywords
- sputtering apparatus
- reactive sputtering
- improvements relating
- cathode elements
- elements therefor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB20184/73 | 1973-04-27 | ||
GB2018473A GB1443827A (en) | 1973-04-27 | 1973-04-27 | Reactive sputtering apparatus and cathode units therefor |
Publications (2)
Publication Number | Publication Date |
---|---|
AU482170B2 AU482170B2 (en) | 1975-10-16 |
AU6775774A true AU6775774A (en) | 1975-10-16 |
Family
ID=
Also Published As
Publication number | Publication date |
---|---|
ZA742375B (en) | 1975-11-26 |
US3890217A (en) | 1975-06-17 |
CA1024937A (en) | 1978-01-24 |
FR2227345A1 (en) | 1974-11-22 |
NL7404891A (en) | 1974-10-29 |
CH590936A5 (en) | 1977-08-31 |
BE814286A (en) | 1974-10-28 |
SE408913B (en) | 1979-07-16 |
FR2227345B1 (en) | 1977-10-14 |
JPS5013275A (en) | 1975-02-12 |
JPS539594B2 (en) | 1978-04-06 |
IT1010755B (en) | 1977-01-20 |
DE2418008A1 (en) | 1974-11-21 |
GB1443827A (en) | 1976-07-28 |
SU764619A3 (en) | 1980-09-15 |
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