SU764619A3 - Cathode block - Google Patents

Abstract

1443827 Cathode arrangement for reactive sputtering TRIPLEX SAFETY GLASS CO Ltd 4 April 1974 [27 April 1973] 20184/73 Heading C7F A cathode unit comprises a metal cathode 271 and a shield surrounding the cathode on all sides except that facing the substrate, the shield having spaced inner and outer walls 281, 282 between which a sputtering atmosphere is fed into the working space between cathode and substrate. The cathode may be of elongate rectangular form, and have means 52, 51, to pass cooling liquid therethrough; working gas is supplied at 331 and baffles 283, tallest immediately adjacent 331 and reducing in height with distance therefrom, control distribution of the gas along the cathode. Since no gas passes between 271 and 281, the breakdown voltage is higher than the applied cathode potential, e.g. a spacing of 2 to 6 mm. at 5 x 10<SP>-2</SP> Torr enables a working voltage of -2 to -5 KV to be used. The cathode may be In/Sn used in O 2 /Ar to deposit a mixed oxide on a sheet substrate using several parallel cathodes which are reciprocated to give a uniform coating; the substrate is electrically heated and its temperature measured by a thermocouple.

Description

(54) CATHODE UNIT

one

The invention relates to the field of vacuum coating and can be used, for example, in the preparation of metal oxide coatings on various substrates.

A cathode block is known predominantly for sputtering devices for applying electrically conductive films, containing a metal cathode, a multilayer electrostatic screen surrounding the cathode from all sides, with the exception of the working portion of the cathode surface 1.

However, this unit has a low reliability of operation due to the return of electrical breakdown between the cathode and the electrostatic screen.

The purpose of the invention is to increase the reliability of the cathode by preventing the possibility of electrical breakdown between the cathode and the electrostatic screen. x ,,

For this, the cathode block is mainly used for devices for sputtering electrically conductive films containing a metal cathode, a multi-layer electrostatic shield surrounding the cathode from all sides, except for the working surface of the cathode surface; pipeline, one end of which is introduced into the gap between the walls of the electrostatic screen, and the other end is connected to the supply system of neutral gas.

FIG. 1 is a diagram of the structure of the cathode block; FIG. 2 is a section through the cathode block; FIG. 3 10 layout of the pipeline and cathode blocks.

The cathode block, preferably for sputtering devices for applying electrically conductive films, comprises a conduit 1 ,. one end of which is inserted into the gap between walls 2 and 3, forming a multi-layer electrostatic screen surrounding the metal cathode 4

20 from all sides except the worker

the surface of the cathode 4. The second end of the pipeline 1 is connected to the supply system, neutral gas.

The cathode block functions as follows.

Several cathode block placed in a vacuum chamber (not shown). Pipeline 1 is connected to all cathode blocks. The metal is sprayed onto the substrate 5,

This is located in a vacuum chamber and located above the cathode blocks. When the metal is sprayed, the cathode 4 is heated. In order to cool the cathode 4, its internal cavity is filled with water supplied through pipe b or 7. However, of these pipes is the filling and the second is the cooling water discharging.

Pipeline 1 supplies neutral gas. Pipelines may be several. To achieve greater uniformity of flow in the cavity between walls 2 and 3, additional baffles may be located. birth 8.9.

For a rectangular cathode 4 with dimensions of 7.5 to 60 cm, the total gas flow rate of the electrostatic screen is approximately 15 l / s at a pressure of 0.05 mm Hg. The gap between walls 2 and 3 can be selected from 3 to 5 mm. The operating voltage of the cathode block is selected from 2 to 5 kV.

-2 Pressure in vacuum chamber 5x10 mm

Hg

The presence of a neutral gas between walls 2 and 3 eliminates the possibility

sample between the cathode 4 and the walls 2 and 3, forming an electrostatic screen.

Claims (1)

1. For the application of the Federal Republic of Germany No. 2149606, cl. C 23 C 15/00, 1971 (prototype).