IT1010755B - Unita catodica schermata perfezio nata atta ad essere usata in un apparato per depositare su un oggetto mediante sublimazione reattiva di un ossido metallico una pellicola trasparente elettri camente conduttrice - Google Patents

Unita catodica schermata perfezio nata atta ad essere usata in un apparato per depositare su un oggetto mediante sublimazione reattiva di un ossido metallico una pellicola trasparente elettri camente conduttrice

Info

Publication number
IT1010755B
IT1010755B IT12736/74A IT1273674A IT1010755B IT 1010755 B IT1010755 B IT 1010755B IT 12736/74 A IT12736/74 A IT 12736/74A IT 1273674 A IT1273674 A IT 1273674A IT 1010755 B IT1010755 B IT 1010755B
Authority
IT
Italy
Prior art keywords
deposit
transparent film
metallic oxide
cathode unit
electric chamber
Prior art date
Application number
IT12736/74A
Other languages
English (en)
Italian (it)
Original Assignee
Triplex Safety Glass Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Triplex Safety Glass Co filed Critical Triplex Safety Glass Co
Application granted granted Critical
Publication of IT1010755B publication Critical patent/IT1010755B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
IT12736/74A 1973-04-27 1974-04-12 Unita catodica schermata perfezio nata atta ad essere usata in un apparato per depositare su un oggetto mediante sublimazione reattiva di un ossido metallico una pellicola trasparente elettri camente conduttrice IT1010755B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2018473A GB1443827A (en) 1973-04-27 1973-04-27 Reactive sputtering apparatus and cathode units therefor

Publications (1)

Publication Number Publication Date
IT1010755B true IT1010755B (it) 1977-01-20

Family

ID=10141798

Family Applications (1)

Application Number Title Priority Date Filing Date
IT12736/74A IT1010755B (it) 1973-04-27 1974-04-12 Unita catodica schermata perfezio nata atta ad essere usata in un apparato per depositare su un oggetto mediante sublimazione reattiva di un ossido metallico una pellicola trasparente elettri camente conduttrice

Country Status (13)

Country Link
US (1) US3890217A (enrdf_load_stackoverflow)
JP (1) JPS539594B2 (enrdf_load_stackoverflow)
BE (1) BE814286A (enrdf_load_stackoverflow)
CA (1) CA1024937A (enrdf_load_stackoverflow)
CH (1) CH590936A5 (enrdf_load_stackoverflow)
DE (1) DE2418008A1 (enrdf_load_stackoverflow)
FR (1) FR2227345B1 (enrdf_load_stackoverflow)
GB (1) GB1443827A (enrdf_load_stackoverflow)
IT (1) IT1010755B (enrdf_load_stackoverflow)
NL (1) NL7404891A (enrdf_load_stackoverflow)
SE (1) SE408913B (enrdf_load_stackoverflow)
SU (1) SU764619A3 (enrdf_load_stackoverflow)
ZA (1) ZA742375B (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3945911A (en) * 1974-08-28 1976-03-23 Shatterproof Glass Corporation Cathodes for sputter-coating glass sheets or other substrates
US3976555A (en) * 1975-03-20 1976-08-24 Coulter Information Systems, Inc. Method and apparatus for supplying background gas in a sputtering chamber
US4009090A (en) * 1975-12-03 1977-02-22 Shatterproof Glass Corporation Sputter-coating of glass sheets or other substrates
FR2403645A2 (fr) * 1977-09-14 1979-04-13 Vide & Traitement Sa Four pour le traitement thermochimique, en continu, de pieces metalliques, par bombardement ionique
US4116806A (en) * 1977-12-08 1978-09-26 Battelle Development Corporation Two-sided planar magnetron sputtering apparatus
US4175030A (en) * 1977-12-08 1979-11-20 Battelle Development Corporation Two-sided planar magnetron sputtering apparatus
JPS57111031A (en) * 1980-12-27 1982-07-10 Clarion Co Ltd Sputtering device
US4362611A (en) * 1981-07-27 1982-12-07 International Business Machines Corporation Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield
US4420385A (en) * 1983-04-15 1983-12-13 Gryphon Products Apparatus and process for sputter deposition of reacted thin films
US4526670A (en) * 1983-05-20 1985-07-02 Lfe Corporation Automatically loadable multifaceted electrode with load lock mechanism
US20050211544A1 (en) * 2004-03-29 2005-09-29 Seagate Technology Llc Electrical biasing of gas introduction means of plasma apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3325394A (en) * 1963-07-01 1967-06-13 Ibm Magnetic control of film deposition
US3526584A (en) * 1964-09-25 1970-09-01 Western Electric Co Method of providing a field free region above a substrate during sputter-depositing thereon
US3369991A (en) * 1965-01-28 1968-02-20 Ibm Apparatus for cathode sputtering including a shielded rf electrode
US3361659A (en) * 1967-08-14 1968-01-02 Ibm Process of depositing thin films by cathode sputtering using a controlled grid
US3595775A (en) * 1969-05-15 1971-07-27 United Aircraft Corp Sputtering apparatus with sealed cathode-shield chamber

Also Published As

Publication number Publication date
AU6775774A (en) 1975-10-16
DE2418008A1 (de) 1974-11-21
FR2227345B1 (enrdf_load_stackoverflow) 1977-10-14
GB1443827A (en) 1976-07-28
JPS539594B2 (enrdf_load_stackoverflow) 1978-04-06
SE408913B (sv) 1979-07-16
ZA742375B (en) 1975-11-26
BE814286A (fr) 1974-10-28
US3890217A (en) 1975-06-17
NL7404891A (enrdf_load_stackoverflow) 1974-10-29
JPS5013275A (enrdf_load_stackoverflow) 1975-02-12
SU764619A3 (ru) 1980-09-15
CA1024937A (en) 1978-01-24
FR2227345A1 (enrdf_load_stackoverflow) 1974-11-22
CH590936A5 (enrdf_load_stackoverflow) 1977-08-31

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