GB1257015A - - Google Patents

Info

Publication number
GB1257015A
GB1257015A GB1257015DA GB1257015A GB 1257015 A GB1257015 A GB 1257015A GB 1257015D A GB1257015D A GB 1257015DA GB 1257015 A GB1257015 A GB 1257015A
Authority
GB
United Kingdom
Prior art keywords
evaporant
discharge
plasma
electrode
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1257015A publication Critical patent/GB1257015A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB1257015D 1967-11-03 1967-11-03 Expired GB1257015A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5005167 1967-11-03

Publications (1)

Publication Number Publication Date
GB1257015A true GB1257015A (enrdf_load_stackoverflow) 1971-12-15

Family

ID=10454465

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1257015D Expired GB1257015A (enrdf_load_stackoverflow) 1967-11-03 1967-11-03

Country Status (1)

Country Link
GB (1) GB1257015A (enrdf_load_stackoverflow)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4351855A (en) * 1981-02-24 1982-09-28 Eduard Pinkhasov Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum
US4438153A (en) 1981-02-24 1984-03-20 Welbilt Electronics Die Corporation Method of and apparatus for the vapor deposition of material upon a substrate
GB2139648A (en) * 1983-05-13 1984-11-14 Wedtech Corp Method of and apparatus for the coating of a substrate with material electrically transformed into a vapour phase
GB2159540A (en) * 1984-05-25 1985-12-04 Wedtech Corp Apparatus and methods for coating substrates
GB2202237A (en) * 1987-03-12 1988-09-21 Vac Tec Syst Cathodic arc plasma deposition of hard coatings
GB2223032A (en) * 1988-09-27 1990-03-28 Leybold Ag Apparatus for applying dielectric or metallic materials to a substrate
GB2261226A (en) * 1991-11-08 1993-05-12 Univ Hull Deposition of non-conductive material using D.C. biased, thermionically enhanced, plasma assisted PVD
US5216690A (en) * 1992-03-11 1993-06-01 Hanks Charles W Electron beam gun with grounded shield to prevent arc down
EP1372897A4 (en) * 2001-03-28 2007-04-25 Cpfilms Inc BIPOLAR PLASMA SOURCE, PLASMA SHEET SOURCE, AND EFFUSION CELL USING A BIPOLAR PLASMA SOURCE
US20140216343A1 (en) 2008-08-04 2014-08-07 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
US10586685B2 (en) 2014-12-05 2020-03-10 Agc Glass Europe Hollow cathode plasma source
US10755901B2 (en) 2014-12-05 2020-08-25 Agc Flat Glass North America, Inc. Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces

Cited By (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4351855A (en) * 1981-02-24 1982-09-28 Eduard Pinkhasov Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum
US4438153A (en) 1981-02-24 1984-03-20 Welbilt Electronics Die Corporation Method of and apparatus for the vapor deposition of material upon a substrate
GB2156384A (en) * 1981-02-24 1985-10-09 Wedtech Corp Apparatus for vapour deposition by arc discharge
US4609564A (en) * 1981-02-24 1986-09-02 Wedtech Corp. Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
GB2139648A (en) * 1983-05-13 1984-11-14 Wedtech Corp Method of and apparatus for the coating of a substrate with material electrically transformed into a vapour phase
FR2545839A1 (fr) * 1983-05-13 1984-11-16 Wedtech Corp Procede et appareillage pour le revetement d'un substrat avec une matiere transformee electriquement en phase gazeuse
GB2159540A (en) * 1984-05-25 1985-12-04 Wedtech Corp Apparatus and methods for coating substrates
GB2167774A (en) * 1984-05-25 1986-06-04 Wedtech Corp Apparatus and methods for coating substrates with metal coatings
GB2202237A (en) * 1987-03-12 1988-09-21 Vac Tec Syst Cathodic arc plasma deposition of hard coatings
GB2223032A (en) * 1988-09-27 1990-03-28 Leybold Ag Apparatus for applying dielectric or metallic materials to a substrate
US5070811A (en) * 1988-09-27 1991-12-10 Albert Feuerstein Apparatus for applying dielectric or metallic materials
GB2261226A (en) * 1991-11-08 1993-05-12 Univ Hull Deposition of non-conductive material using D.C. biased, thermionically enhanced, plasma assisted PVD
GB2261226B (en) * 1991-11-08 1994-10-26 Univ Hull Deposition of non-conductive material
US5216690A (en) * 1992-03-11 1993-06-01 Hanks Charles W Electron beam gun with grounded shield to prevent arc down
USRE35024E (en) * 1992-03-11 1995-08-22 Hanks; Charles W. Electron beam gun with grounded shield to prevent arc down
DE4391006C2 (de) * 1992-03-11 2002-10-17 Charles W Hanks Elektronenstrahlkanone
EP1372897A4 (en) * 2001-03-28 2007-04-25 Cpfilms Inc BIPOLAR PLASMA SOURCE, PLASMA SHEET SOURCE, AND EFFUSION CELL USING A BIPOLAR PLASMA SOURCE
US10580624B2 (en) 2008-08-04 2020-03-03 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US10580625B2 (en) 2008-08-04 2020-03-03 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US20150002021A1 (en) 2008-08-04 2015-01-01 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US9478401B2 (en) 2008-08-04 2016-10-25 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US20150004330A1 (en) 2008-08-04 2015-01-01 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US10438778B2 (en) 2008-08-04 2019-10-08 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US20140216343A1 (en) 2008-08-04 2014-08-07 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US11875976B2 (en) 2014-12-05 2024-01-16 Agc Flat Glass North America, Inc. Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
US10755901B2 (en) 2014-12-05 2020-08-25 Agc Flat Glass North America, Inc. Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
US10586685B2 (en) 2014-12-05 2020-03-10 Agc Glass Europe Hollow cathode plasma source
US10559452B2 (en) 2015-11-16 2020-02-11 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US20170309458A1 (en) 2015-11-16 2017-10-26 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees