GB1442374A - Method of making presensitized dry planographic printing plate precursors - Google Patents
Method of making presensitized dry planographic printing plate precursorsInfo
- Publication number
- GB1442374A GB1442374A GB4649073A GB4649073A GB1442374A GB 1442374 A GB1442374 A GB 1442374A GB 4649073 A GB4649073 A GB 4649073A GB 4649073 A GB4649073 A GB 4649073A GB 1442374 A GB1442374 A GB 1442374A
- Authority
- GB
- United Kingdom
- Prior art keywords
- shot
- gum
- silicone
- coated
- photosensitive material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000002243 precursor Substances 0.000 title 1
- 229920001296 polysiloxane Polymers 0.000 abstract 5
- 239000000463 material Substances 0.000 abstract 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 abstract 2
- 239000003054 catalyst Substances 0.000 abstract 2
- 239000008199 coating composition Substances 0.000 abstract 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 239000003960 organic solvent Substances 0.000 abstract 2
- 229920002379 silicone rubber Polymers 0.000 abstract 2
- 239000004945 silicone rubber Substances 0.000 abstract 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 abstract 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 abstract 1
- 235000010724 Wisteria floribunda Nutrition 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 238000007259 addition reaction Methods 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 238000010073 coating (rubber) Methods 0.000 abstract 1
- 230000020176 deacylation Effects 0.000 abstract 1
- 238000005947 deacylation reaction Methods 0.000 abstract 1
- 150000008049 diazo compounds Chemical class 0.000 abstract 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 229910052763 palladium Inorganic materials 0.000 abstract 1
- 239000000123 paper Substances 0.000 abstract 1
- 150000003058 platinum compounds Chemical class 0.000 abstract 1
- -1 polyethylene terephthalate Polymers 0.000 abstract 1
- 229920000139 polyethylene terephthalate Polymers 0.000 abstract 1
- 239000005020 polyethylene terephthalate Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10008272A JPS5612860B2 (enrdf_load_stackoverflow) | 1972-10-05 | 1972-10-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1442374A true GB1442374A (en) | 1976-07-14 |
Family
ID=14264505
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4649073A Expired GB1442374A (en) | 1972-10-05 | 1973-10-04 | Method of making presensitized dry planographic printing plate precursors |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS5612860B2 (enrdf_load_stackoverflow) |
| DE (1) | DE2350211A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1442374A (enrdf_load_stackoverflow) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3045979A1 (de) * | 1979-12-05 | 1981-09-03 | Toray Industries, Inc., Tokyo | Vorsensibilisierte negativ-flachdruckform fuer den trocken-flachdruck |
| US4496647A (en) * | 1982-07-21 | 1985-01-29 | Toray Industries, Inc. | Treatment of image-forming laminated plate |
| US4775607A (en) * | 1985-12-20 | 1988-10-04 | Hoechst Aktiengesellschaft | Light-sensitive mixed diazonium condensate printing plate for waterless offset printing |
| US4842988A (en) * | 1986-08-23 | 1989-06-27 | Hoechst Aktiengesellschaft | Presensitized waterless planographic printing plate with amorphous silicic acid interlayer and process of making and using |
| US4874686A (en) * | 1988-03-18 | 1989-10-17 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic plate necessitating no dampening water |
| US5773187A (en) * | 1995-05-04 | 1998-06-30 | Agfa-Gevaert Ag | Water developable diazonium and mineral acid containing recording material for producing water-free offset printing plates |
| US5888696A (en) * | 1996-03-08 | 1999-03-30 | Fuji Photo Film Co., Ltd. | Planographic original plate requiring no fountain solution |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1499024A (en) * | 1974-05-30 | 1978-01-25 | Xerox Corp | Process for making printing masters |
| JPS55110249A (en) * | 1979-02-19 | 1980-08-25 | Toray Ind Inc | Lithographic printing plate requiring no wetting water |
| GB2034911B (en) * | 1978-10-26 | 1983-02-09 | Toray Industries | Dry planographic printing plate |
| DE3731438A1 (de) * | 1987-09-18 | 1989-03-30 | Hoechst Ag | Lichtempfindliche druckplatte fuer den wasserlosen flachdruck |
| DE3738863A1 (de) * | 1987-11-16 | 1989-05-24 | Hoechst Ag | Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck |
-
1972
- 1972-10-05 JP JP10008272A patent/JPS5612860B2/ja not_active Expired
-
1973
- 1973-10-04 GB GB4649073A patent/GB1442374A/en not_active Expired
- 1973-10-05 DE DE19732350211 patent/DE2350211A1/de active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3045979A1 (de) * | 1979-12-05 | 1981-09-03 | Toray Industries, Inc., Tokyo | Vorsensibilisierte negativ-flachdruckform fuer den trocken-flachdruck |
| US4496647A (en) * | 1982-07-21 | 1985-01-29 | Toray Industries, Inc. | Treatment of image-forming laminated plate |
| US4775607A (en) * | 1985-12-20 | 1988-10-04 | Hoechst Aktiengesellschaft | Light-sensitive mixed diazonium condensate printing plate for waterless offset printing |
| US4842988A (en) * | 1986-08-23 | 1989-06-27 | Hoechst Aktiengesellschaft | Presensitized waterless planographic printing plate with amorphous silicic acid interlayer and process of making and using |
| US4874686A (en) * | 1988-03-18 | 1989-10-17 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic plate necessitating no dampening water |
| US5773187A (en) * | 1995-05-04 | 1998-06-30 | Agfa-Gevaert Ag | Water developable diazonium and mineral acid containing recording material for producing water-free offset printing plates |
| US5888696A (en) * | 1996-03-08 | 1999-03-30 | Fuji Photo Film Co., Ltd. | Planographic original plate requiring no fountain solution |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5612860B2 (enrdf_load_stackoverflow) | 1981-03-25 |
| JPS4957903A (enrdf_load_stackoverflow) | 1974-06-05 |
| DE2350211A1 (de) | 1974-04-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1442374A (en) | Method of making presensitized dry planographic printing plate precursors | |
| EP1699889B1 (en) | Silicone compositions and their use in controlling the release or transfer of printed or molded patterns and transferring processes therefore | |
| US4511620A (en) | Method for prevention of bubble formation in polyorganosiloxane gels | |
| US3945830A (en) | Dry pre-sensitized azide and silicone rubber containing planographic plates and methods of preparation | |
| KR900016417A (ko) | 부가 경화성 실리콘 감압 접착제 | |
| GB1400337A (en) | Pre-sensitized lithoprinting plate | |
| EP0764702A3 (en) | Liquid silicone rubber coating composition | |
| US4770942A (en) | Silicone-coated release paper and a method for the preparation thereof | |
| KR920007795A (ko) | 실리콘 고무적층체 및 그의 제조방법 | |
| US4080897A (en) | Selective tack imaging and printing | |
| US3909265A (en) | Process for producing presensitized planographic printing plate requiring no fountain solution | |
| GB1444381A (en) | Dry presensitized planographic printing precursors | |
| EP3490769B1 (en) | Polyorganosiloxane-based stamp and method for manufacturing thereof | |
| US2801919A (en) | Photographic method for making templates | |
| US4179295A (en) | Organopolysiloxane containing planographic masters | |
| JPS6350371B2 (enrdf_load_stackoverflow) | ||
| JPH0753432B2 (ja) | 弾性ロール | |
| KR900000725A (ko) | 티올기를 갖는 감광성 중합체 | |
| SU537852A1 (ru) | Состав дл покрыти печатающих элементов формы | |
| JPH0311461B2 (enrdf_load_stackoverflow) | ||
| DE2359102A1 (de) | Vorsensibilisierte planographische platte, bei der keine hydrophilisierungsloesung erforderlich ist | |
| JPS57176043A (en) | Base for use in lithographic correction | |
| JP3001939B2 (ja) | 離型用シリコーン組成物 | |
| JPS5653150A (en) | Organopolysiloxane composition for release paper | |
| CN115960547A (zh) | 一种用于扩散膜的保护膜及其制备方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |