JPS5612860B2 - - Google Patents

Info

Publication number
JPS5612860B2
JPS5612860B2 JP10008272A JP10008272A JPS5612860B2 JP S5612860 B2 JPS5612860 B2 JP S5612860B2 JP 10008272 A JP10008272 A JP 10008272A JP 10008272 A JP10008272 A JP 10008272A JP S5612860 B2 JPS5612860 B2 JP S5612860B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10008272A
Other languages
Japanese (ja)
Other versions
JPS4957903A (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10008272A priority Critical patent/JPS5612860B2/ja
Priority to GB4649073A priority patent/GB1442374A/en
Priority to DE19732350211 priority patent/DE2350211A1/de
Publication of JPS4957903A publication Critical patent/JPS4957903A/ja
Publication of JPS5612860B2 publication Critical patent/JPS5612860B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP10008272A 1972-10-05 1972-10-05 Expired JPS5612860B2 (enrdf_load_stackoverflow)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP10008272A JPS5612860B2 (enrdf_load_stackoverflow) 1972-10-05 1972-10-05
GB4649073A GB1442374A (en) 1972-10-05 1973-10-04 Method of making presensitized dry planographic printing plate precursors
DE19732350211 DE2350211A1 (de) 1972-10-05 1973-10-05 Verfahren zur herstellung einer vorsensibilisierten trockenen flachdruckplatte

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10008272A JPS5612860B2 (enrdf_load_stackoverflow) 1972-10-05 1972-10-05

Publications (2)

Publication Number Publication Date
JPS4957903A JPS4957903A (enrdf_load_stackoverflow) 1974-06-05
JPS5612860B2 true JPS5612860B2 (enrdf_load_stackoverflow) 1981-03-25

Family

ID=14264505

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10008272A Expired JPS5612860B2 (enrdf_load_stackoverflow) 1972-10-05 1972-10-05

Country Status (3)

Country Link
JP (1) JPS5612860B2 (enrdf_load_stackoverflow)
DE (1) DE2350211A1 (enrdf_load_stackoverflow)
GB (1) GB1442374A (enrdf_load_stackoverflow)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1499024A (en) * 1974-05-30 1978-01-25 Xerox Corp Process for making printing masters
JPS55110249A (en) * 1979-02-19 1980-08-25 Toray Ind Inc Lithographic printing plate requiring no wetting water
GB2034911B (en) * 1978-10-26 1983-02-09 Toray Industries Dry planographic printing plate
JPS5680046A (en) * 1979-12-05 1981-07-01 Toray Ind Inc Lithographic plate requiring no dampening water and its manufacture
JPS5917552A (ja) * 1982-07-21 1984-01-28 Toray Ind Inc 画像形成用積層体の処理方法
DE3545204A1 (de) * 1985-12-20 1987-06-25 Hoechst Ag Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck
DE3628719A1 (de) * 1986-08-23 1988-02-25 Hoechst Ag Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck
DE3731438A1 (de) * 1987-09-18 1989-03-30 Hoechst Ag Lichtempfindliche druckplatte fuer den wasserlosen flachdruck
DE3738863A1 (de) * 1987-11-16 1989-05-24 Hoechst Ag Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck
JP2520686B2 (ja) * 1988-03-18 1996-07-31 富士写真フイルム株式会社 湿し水不要感光性平版印刷板
DE19515804A1 (de) * 1995-05-04 1996-11-07 Hoechst Ag Mit Wasser entschichtbares Aufzeichnungsmaterial zur Herstellung von Wasserlos-Offsetdruckplatten
JPH09239943A (ja) * 1996-03-08 1997-09-16 Fuji Photo Film Co Ltd 湿し水不要平版原版

Also Published As

Publication number Publication date
JPS4957903A (enrdf_load_stackoverflow) 1974-06-05
GB1442374A (en) 1976-07-14
DE2350211A1 (de) 1974-04-18

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