GB1427014A - Semiconductor devices - Google Patents

Semiconductor devices

Info

Publication number
GB1427014A
GB1427014A GB1869073A GB1869073A GB1427014A GB 1427014 A GB1427014 A GB 1427014A GB 1869073 A GB1869073 A GB 1869073A GB 1869073 A GB1869073 A GB 1869073A GB 1427014 A GB1427014 A GB 1427014A
Authority
GB
United Kingdom
Prior art keywords
region
auxiliary
junction
guard
protected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1869073A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of GB1427014A publication Critical patent/GB1427014A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/105Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] 
    • H10D62/106Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]  having supplementary regions doped oppositely to or in rectifying contact with regions of the semiconductor bodies, e.g. guard rings with PN or Schottky junctions
    • H10D62/107Buried supplementary regions, e.g. buried guard rings 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/105Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] 
    • H10D62/106Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]  having supplementary regions doped oppositely to or in rectifying contact with regions of the semiconductor bodies, e.g. guard rings with PN or Schottky junctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass

Landscapes

  • Bipolar Transistors (AREA)
  • Thyristors (AREA)
  • Element Separation (AREA)
GB1869073A 1972-04-20 1973-04-18 Semiconductor devices Expired GB1427014A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3975972A JPS5320194B2 (enrdf_load_stackoverflow) 1972-04-20 1972-04-20

Publications (1)

Publication Number Publication Date
GB1427014A true GB1427014A (en) 1976-03-03

Family

ID=12561864

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1869073A Expired GB1427014A (en) 1972-04-20 1973-04-18 Semiconductor devices

Country Status (7)

Country Link
JP (1) JPS5320194B2 (enrdf_load_stackoverflow)
CA (1) CA985794A (enrdf_load_stackoverflow)
DE (1) DE2320579C3 (enrdf_load_stackoverflow)
FR (1) FR2181075B1 (enrdf_load_stackoverflow)
GB (1) GB1427014A (enrdf_load_stackoverflow)
IT (1) IT1049525B (enrdf_load_stackoverflow)
NL (1) NL7305642A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2644654A1 (de) * 1976-09-03 1978-03-09 Bbc Brown Boveri & Cie Halbleiterbauelement
EP0851505A3 (en) * 1996-12-31 1998-07-15 STMicroelectronics, Inc. semiconductor device having a high voltage termination structure with buried field-shaping region
GB2373634B (en) * 2000-10-31 2004-12-08 Fuji Electric Co Ltd Semiconductor device
GB2403346A (en) * 2000-10-31 2004-12-29 Fuji Electric Co Ltd Semiconductor device
US6943410B2 (en) 2001-06-12 2005-09-13 Fuji Electric Holdings Co., Ltd. High power vertical semiconductor device
CN106505092A (zh) * 2016-08-18 2017-03-15 全球能源互联网研究院 一种垂直型半导体器件的双面终端结构

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH633907A5 (de) * 1978-10-10 1982-12-31 Bbc Brown Boveri & Cie Leistungshalbleiterbauelement mit zonen-guard-ringen.
DE3832709A1 (de) * 1988-09-27 1990-03-29 Asea Brown Boveri Thyristor
DE3832750A1 (de) * 1988-09-27 1990-03-29 Asea Brown Boveri Leistungshalbleiterbauelement
GB2237930A (en) * 1989-11-01 1991-05-15 Philips Electronic Associated A semiconductor device and method of manufacturing a semiconductor device
DE19930783A1 (de) * 1999-07-03 2001-01-04 Bosch Gmbh Robert Halbleiterbauelement
US9236458B2 (en) * 2013-07-11 2016-01-12 Infineon Technologies Ag Bipolar transistor and a method for manufacturing a bipolar transistor

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1030050A (en) * 1963-11-13 1966-05-18 Motorola Inc Punchthrough breakdown rectifier
GB1078273A (en) * 1964-10-19 1967-08-09 Sony Corp Semiconductor device
US3391287A (en) * 1965-07-30 1968-07-02 Westinghouse Electric Corp Guard junctions for p-nu junction semiconductor devices
DE1614751A1 (de) * 1967-01-07 1970-12-03 Telefunken Patent Halbleiteranordnung
DE1789043A1 (de) * 1967-10-14 1972-01-05 Sgs Sa Mit Schutzringen versehene Planar-Halbleitervorrichtungen

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2644654A1 (de) * 1976-09-03 1978-03-09 Bbc Brown Boveri & Cie Halbleiterbauelement
US4150391A (en) * 1976-09-03 1979-04-17 Bbc Brown, Boveri & Company, Limited Gate-controlled reverse conducting thyristor
EP0851505A3 (en) * 1996-12-31 1998-07-15 STMicroelectronics, Inc. semiconductor device having a high voltage termination structure with buried field-shaping region
US6011298A (en) * 1996-12-31 2000-01-04 Stmicroelectronics, Inc. High voltage termination with buried field-shaping region
GB2373634B (en) * 2000-10-31 2004-12-08 Fuji Electric Co Ltd Semiconductor device
GB2403346A (en) * 2000-10-31 2004-12-29 Fuji Electric Co Ltd Semiconductor device
GB2403850A (en) * 2000-10-31 2005-01-12 Fuji Electric Co Ltd Semiconductor device
GB2403346B (en) * 2000-10-31 2005-05-11 Fuji Electric Co Ltd Semiconductor device
GB2403850B (en) * 2000-10-31 2005-05-11 Fuji Electric Co Ltd Semiconductor device
US6911692B2 (en) 2000-10-31 2005-06-28 Fuji Electric Device Technology Co., Ltd Semiconductor device
US6943410B2 (en) 2001-06-12 2005-09-13 Fuji Electric Holdings Co., Ltd. High power vertical semiconductor device
CN106505092A (zh) * 2016-08-18 2017-03-15 全球能源互联网研究院 一种垂直型半导体器件的双面终端结构
CN106505092B (zh) * 2016-08-18 2024-05-14 全球能源互联网研究院 一种垂直型半导体器件的双面终端结构

Also Published As

Publication number Publication date
FR2181075A1 (enrdf_load_stackoverflow) 1973-11-30
DE2320579A1 (de) 1973-11-08
DE2320579C3 (de) 1983-11-10
NL7305642A (enrdf_load_stackoverflow) 1973-10-23
DE2320579B2 (de) 1976-10-28
FR2181075B1 (enrdf_load_stackoverflow) 1977-12-30
CA985794A (en) 1976-03-16
IT1049525B (it) 1981-02-10
JPS5320194B2 (enrdf_load_stackoverflow) 1978-06-24
JPS493580A (enrdf_load_stackoverflow) 1974-01-12

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee