GB1377747A - Light sensitive materials - Google Patents
Light sensitive materialsInfo
- Publication number
- GB1377747A GB1377747A GB4929771A GB4929771A GB1377747A GB 1377747 A GB1377747 A GB 1377747A GB 4929771 A GB4929771 A GB 4929771A GB 4929771 A GB4929771 A GB 4929771A GB 1377747 A GB1377747 A GB 1377747A
- Authority
- GB
- United Kingdom
- Prior art keywords
- azido
- acetic acid
- cyano
- acid
- benzylidene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 5
- 229960000583 acetic acid Drugs 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 2
- MLIREBYILWEBDM-UHFFFAOYSA-N cyanoacetic acid Chemical compound OC(=O)CC#N MLIREBYILWEBDM-UHFFFAOYSA-N 0.000 abstract 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 abstract 2
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 abstract 1
- FILYYLWGKPQFRQ-UHFFFAOYSA-N 3-(3-azido-4-methoxyphenyl)-2-cyanoprop-2-enoic acid Chemical compound N(=[N+]=[N-])C=1C=C(C=C(C(=O)O)C#N)C=CC=1OC FILYYLWGKPQFRQ-UHFFFAOYSA-N 0.000 abstract 1
- OHPPCDUJNKPVDE-UHFFFAOYSA-N 3-(3-azido-4-methylphenyl)-2-cyanoprop-2-enoic acid Chemical compound CC1=CC=C(C=C(C#N)C(O)=O)C=C1N=[N+]=[N-] OHPPCDUJNKPVDE-UHFFFAOYSA-N 0.000 abstract 1
- COSCIPFXCZGMTJ-UHFFFAOYSA-N 3-(3-azidophenyl)-2-cyanoprop-2-enoic acid Chemical compound OC(=O)C(C#N)=CC1=CC=CC(N=[N+]=[N-])=C1 COSCIPFXCZGMTJ-UHFFFAOYSA-N 0.000 abstract 1
- VOPNXNXVSOVBJM-UHFFFAOYSA-N 3-(4-azido-2-chlorophenyl)-2-cyanoprop-2-enoic acid Chemical compound OC(=O)C(C#N)=CC1=CC=C(N=[N+]=[N-])C=C1Cl VOPNXNXVSOVBJM-UHFFFAOYSA-N 0.000 abstract 1
- WNPUUUNFCZEBAI-UHFFFAOYSA-N 3-(4-azido-3,5-dibromophenyl)-2-cyanoprop-2-enoic acid Chemical compound OC(=O)C(C#N)=CC1=CC(Br)=C(N=[N+]=[N-])C(Br)=C1 WNPUUUNFCZEBAI-UHFFFAOYSA-N 0.000 abstract 1
- -1 4 - azido - benzylidene Chemical group 0.000 abstract 1
- PCORREDFEJUDER-UHFFFAOYSA-N N(=[N+]=[N-])C1=CC=C(C=CC=C(C(=O)O)C#N)C=C1 Chemical compound N(=[N+]=[N-])C1=CC=C(C=CC=C(C(=O)O)C#N)C=C1 PCORREDFEJUDER-UHFFFAOYSA-N 0.000 abstract 1
- 150000007513 acids Chemical class 0.000 abstract 1
- 125000000852 azido group Chemical group *N=[N+]=[N-] 0.000 abstract 1
- 150000001735 carboxylic acids Chemical class 0.000 abstract 1
- 150000001805 chlorine compounds Chemical class 0.000 abstract 1
- 239000012362 glacial acetic acid Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C247/00—Compounds containing azido groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1477—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
- C08G85/004—Modification of polymers by chemical after-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/40—Chemical modification of a polymer taking place solely at one end or both ends of the polymer backbone, i.e. not in the side or lateral chains
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
- Polysaccharides And Polysaccharide Derivatives (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Epoxy Compounds (AREA)
Priority Applications (20)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| BE790383D BE790383A (fr) | 1971-10-22 | Matière sensibles à la lumière | |
| GB4929771A GB1377747A (en) | 1971-10-22 | 1971-10-22 | Light sensitive materials |
| ZA727353A ZA727353B (en) | 1971-10-22 | 1972-10-16 | Light-sensitive materials |
| CA154519A CA986638A (en) | 1971-10-22 | 1972-10-18 | Light-sensitive polymeric esters |
| FI2886/72A FI57183C (fi) | 1971-10-22 | 1972-10-18 | Ljuskaenslig polymer laemplig att anvaendas foer framstaellning av tryckplattor |
| AU47952/72A AU473438B2 (en) | 1971-10-22 | 1972-10-19 | Light-sensitive materials |
| CH1539172A CH558400A (fr) | 1971-10-22 | 1972-10-20 | Procede de preparation d'un ester polymere photosensible. |
| IT70312/72A IT975318B (it) | 1971-10-22 | 1972-10-20 | Materiale fotosensibile particolar mente per fototecnica |
| NLAANVRAGE7214212,A NL189626C (nl) | 1971-10-22 | 1972-10-20 | Werkwijze voor de bereiding van nieuwe lichtgevoelige materialen en lichtgevoelig orgaan vervaardigd daaruit. |
| SU1845296A SU493984A3 (ru) | 1971-10-22 | 1972-10-20 | Светочувствительный элемент |
| FR7237376A FR2156906B1 (enrdf_load_stackoverflow) | 1971-10-22 | 1972-10-20 | |
| SE7213552A SE393621B (sv) | 1971-10-22 | 1972-10-20 | Ljuskenslig polymer ester innehallande azidosubstituerade estergrupper |
| NO3785/72A NO137104C (no) | 1971-10-22 | 1972-10-20 | Lysf¦lsomme polymerestere. |
| IN1703/1972A IN137774B (enrdf_load_stackoverflow) | 1971-10-22 | 1972-10-21 | |
| ES408109A ES408109A1 (es) | 1971-10-22 | 1972-10-21 | Unos perfeccionamientos en la fabricacion de materiales sensibles a la luz. |
| DE2251828A DE2251828C2 (de) | 1971-10-22 | 1972-10-21 | Lichtempfindliche polymere Ester und ihre Verwendung |
| DD162944A DD102222A5 (enrdf_load_stackoverflow) | 1971-10-22 | 1972-10-23 | |
| CS7107A CS171174B2 (enrdf_load_stackoverflow) | 1971-10-22 | 1972-10-23 | |
| JP10765872A JPS578126B2 (enrdf_load_stackoverflow) | 1971-10-22 | 1972-10-23 | |
| AT903672A AT322977B (de) | 1971-10-22 | 1972-10-23 | Lichtempfindliches material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB4929771A GB1377747A (en) | 1971-10-22 | 1971-10-22 | Light sensitive materials |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1377747A true GB1377747A (en) | 1974-12-18 |
Family
ID=10451864
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4929771A Expired GB1377747A (en) | 1971-10-22 | 1971-10-22 | Light sensitive materials |
Country Status (20)
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
| US7629016B2 (en) * | 2002-06-10 | 2009-12-08 | Council of Industrial and Scientific Research | Process for photochemical activation of polymer surface and immobilization of biomolecules onto the activated surface |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1466252A (en) * | 1973-04-26 | 1977-03-02 | Vickers Ltd | Light-sensitive material |
| JPS5312984A (en) * | 1976-07-21 | 1978-02-06 | Konishiroku Photo Ind | Photosensitive composition |
| GB8802314D0 (en) * | 1988-02-03 | 1988-03-02 | Vickers Plc | Improvements in/relating to radiation-sensitive compounds |
-
0
- BE BE790383D patent/BE790383A/xx not_active IP Right Cessation
-
1971
- 1971-10-22 GB GB4929771A patent/GB1377747A/en not_active Expired
-
1972
- 1972-10-16 ZA ZA727353A patent/ZA727353B/xx unknown
- 1972-10-18 CA CA154519A patent/CA986638A/en not_active Expired
- 1972-10-18 FI FI2886/72A patent/FI57183C/fi active
- 1972-10-19 AU AU47952/72A patent/AU473438B2/en not_active Expired
- 1972-10-20 NL NLAANVRAGE7214212,A patent/NL189626C/xx active Search and Examination
- 1972-10-20 CH CH1539172A patent/CH558400A/fr not_active IP Right Cessation
- 1972-10-20 SU SU1845296A patent/SU493984A3/ru active
- 1972-10-20 FR FR7237376A patent/FR2156906B1/fr not_active Expired
- 1972-10-20 NO NO3785/72A patent/NO137104C/no unknown
- 1972-10-20 SE SE7213552A patent/SE393621B/xx unknown
- 1972-10-20 IT IT70312/72A patent/IT975318B/it active
- 1972-10-21 DE DE2251828A patent/DE2251828C2/de not_active Expired
- 1972-10-21 IN IN1703/1972A patent/IN137774B/en unknown
- 1972-10-21 ES ES408109A patent/ES408109A1/es not_active Expired
- 1972-10-23 DD DD162944A patent/DD102222A5/xx unknown
- 1972-10-23 CS CS7107A patent/CS171174B2/cs unknown
- 1972-10-23 JP JP10765872A patent/JPS578126B2/ja not_active Expired
- 1972-10-23 AT AT903672A patent/AT322977B/de not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
| US7629016B2 (en) * | 2002-06-10 | 2009-12-08 | Council of Industrial and Scientific Research | Process for photochemical activation of polymer surface and immobilization of biomolecules onto the activated surface |
Also Published As
| Publication number | Publication date |
|---|---|
| IN137774B (enrdf_load_stackoverflow) | 1975-09-20 |
| FI57183B (fi) | 1980-02-29 |
| FR2156906B1 (enrdf_load_stackoverflow) | 1979-03-16 |
| NL189626C (nl) | 1993-06-01 |
| CA986638A (en) | 1976-03-30 |
| AU473438B2 (en) | 1976-06-24 |
| NL189626B (nl) | 1993-01-04 |
| NL7214212A (enrdf_load_stackoverflow) | 1973-04-25 |
| NO137104B (no) | 1977-09-19 |
| BE790383A (fr) | 1973-02-15 |
| ZA727353B (en) | 1973-06-27 |
| SU493984A3 (ru) | 1975-11-28 |
| IT975318B (it) | 1974-07-20 |
| AT322977B (de) | 1975-06-25 |
| CS171174B2 (enrdf_load_stackoverflow) | 1976-10-29 |
| SE393621B (sv) | 1977-05-16 |
| FR2156906A1 (enrdf_load_stackoverflow) | 1973-06-01 |
| NO137104C (no) | 1977-12-28 |
| DE2251828A1 (de) | 1973-04-26 |
| JPS4850801A (enrdf_load_stackoverflow) | 1973-07-17 |
| DD102222A5 (enrdf_load_stackoverflow) | 1973-12-05 |
| FI57183C (fi) | 1980-06-10 |
| ES408109A1 (es) | 1975-10-01 |
| JPS578126B2 (enrdf_load_stackoverflow) | 1982-02-15 |
| CH558400A (fr) | 1975-01-31 |
| DE2251828C2 (de) | 1983-01-27 |
| AU4795272A (en) | 1974-04-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| 732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
| PE20 | Patent expired after termination of 20 years |