BE790383A - Matière sensibles à la lumière - Google Patents

Matière sensibles à la lumière

Info

Publication number
BE790383A
BE790383A BE790383DA BE790383A BE 790383 A BE790383 A BE 790383A BE 790383D A BE790383D A BE 790383DA BE 790383 A BE790383 A BE 790383A
Authority
BE
Belgium
Prior art keywords
sensitive material
light sensitive
light
sensitive
Prior art date
Application number
Other languages
English (en)
French (fr)
Original Assignee
Howson Algraphy Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE790383A publication Critical patent/BE790383A/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00Compounds containing azido groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00Carboxylic acid nitriles
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/14Esterification
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1433Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1477Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing nitrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00General processes for preparing compounds provided for in this subclass
    • C08G85/004Modification of polymers by chemical after-treatment
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides
    • G03F7/012Macromolecular azides; Macromolecular additives, e.g. binders
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00Chemical modification of a polymer
    • C08F2810/30Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00Chemical modification of a polymer
    • C08F2810/40Chemical modification of a polymer taking place solely at one end or both ends of the polymer backbone, i.e. not in the side or lateral chains

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Epoxy Compounds (AREA)
BE790383D 1971-10-22 Matière sensibles à la lumière BE790383A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4929771A GB1377747A (en) 1971-10-22 1971-10-22 Light sensitive materials

Publications (1)

Publication Number Publication Date
BE790383A true BE790383A (fr) 1973-02-15

Family

ID=10451864

Family Applications (1)

Application Number Title Priority Date Filing Date
BE790383D BE790383A (fr) 1971-10-22 Matière sensibles à la lumière

Country Status (20)

Country Link
JP (1) JPS578126B2 (enrdf_load_stackoverflow)
AT (1) AT322977B (enrdf_load_stackoverflow)
AU (1) AU473438B2 (enrdf_load_stackoverflow)
BE (1) BE790383A (enrdf_load_stackoverflow)
CA (1) CA986638A (enrdf_load_stackoverflow)
CH (1) CH558400A (enrdf_load_stackoverflow)
CS (1) CS171174B2 (enrdf_load_stackoverflow)
DD (1) DD102222A5 (enrdf_load_stackoverflow)
DE (1) DE2251828C2 (enrdf_load_stackoverflow)
ES (1) ES408109A1 (enrdf_load_stackoverflow)
FI (1) FI57183C (enrdf_load_stackoverflow)
FR (1) FR2156906B1 (enrdf_load_stackoverflow)
GB (1) GB1377747A (enrdf_load_stackoverflow)
IN (1) IN137774B (enrdf_load_stackoverflow)
IT (1) IT975318B (enrdf_load_stackoverflow)
NL (1) NL189626C (enrdf_load_stackoverflow)
NO (1) NO137104C (enrdf_load_stackoverflow)
SE (1) SE393621B (enrdf_load_stackoverflow)
SU (1) SU493984A3 (enrdf_load_stackoverflow)
ZA (1) ZA727353B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2420372A1 (de) * 1973-04-26 1974-11-07 Vickers Ltd Lichtempfindliches material und verfahren zu dessen herstellung

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5312984A (en) * 1976-07-21 1978-02-06 Konishiroku Photo Ind Photosensitive composition
GB8802314D0 (en) * 1988-02-03 1988-03-02 Vickers Plc Improvements in/relating to radiation-sensitive compounds
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
US7629016B2 (en) * 2002-06-10 2009-12-08 Council of Industrial and Scientific Research Process for photochemical activation of polymer surface and immobilization of biomolecules onto the activated surface

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2420372A1 (de) * 1973-04-26 1974-11-07 Vickers Ltd Lichtempfindliches material und verfahren zu dessen herstellung

Also Published As

Publication number Publication date
IN137774B (enrdf_load_stackoverflow) 1975-09-20
FI57183B (fi) 1980-02-29
FR2156906B1 (enrdf_load_stackoverflow) 1979-03-16
NL189626C (nl) 1993-06-01
GB1377747A (en) 1974-12-18
CA986638A (en) 1976-03-30
AU473438B2 (en) 1976-06-24
NL189626B (nl) 1993-01-04
NL7214212A (enrdf_load_stackoverflow) 1973-04-25
NO137104B (no) 1977-09-19
ZA727353B (en) 1973-06-27
SU493984A3 (ru) 1975-11-28
IT975318B (it) 1974-07-20
AT322977B (de) 1975-06-25
CS171174B2 (enrdf_load_stackoverflow) 1976-10-29
SE393621B (sv) 1977-05-16
FR2156906A1 (enrdf_load_stackoverflow) 1973-06-01
NO137104C (no) 1977-12-28
DE2251828A1 (de) 1973-04-26
JPS4850801A (enrdf_load_stackoverflow) 1973-07-17
DD102222A5 (enrdf_load_stackoverflow) 1973-12-05
FI57183C (fi) 1980-06-10
ES408109A1 (es) 1975-10-01
JPS578126B2 (enrdf_load_stackoverflow) 1982-02-15
CH558400A (fr) 1975-01-31
DE2251828C2 (de) 1983-01-27
AU4795272A (en) 1974-04-26

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Legal Events

Date Code Title Description
RE20 Patent expired

Owner name: EI DU PONT DE NEMOURS AND CY

Effective date: 19921020